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公开(公告)号:WO03006561A3
公开(公告)日:2003-05-01
申请号:PCT/EP0207727
申请日:2002-07-11
Applicant: UCB SA , TIELEMANS MICHEL , BONTINCK DIRK , RENARD VINCENT
Inventor: TIELEMANS MICHEL , BONTINCK DIRK , RENARD VINCENT
CPC classification number: C08G18/38 , C08G18/12 , C08G18/6659 , C09D11/32 , C08G18/3228 , C08G18/3234
Abstract: The invention relates to an aqueous ink composition containing a polyurethane polymer and at least one colorant, wherein the colorant is covalently bonded to the polyurethane polymer, and the composition is crosslinkable to form a network containing the polyurethane polymer.
Abstract translation: 本发明涉及含有聚氨酯聚合物和至少一种着色剂的水性油墨组合物,其中着色剂共价键合到聚氨酯聚合物上,并且该组合物是可交联的以形成含有聚氨酯聚合物的网络。
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公开(公告)号:CA2463971A1
公开(公告)日:2003-06-05
申请号:CA2463971
申请日:2002-11-27
Inventor: TIELEMANS MICHEL , RENARD VINCENT , BONTINCK DIRK
IPC: C08F299/06 , C08G18/08 , C08G18/12 , C08G18/66 , C08G18/67 , C08G18/76 , C09D175/16
Abstract: The invention relates to new radiation-curable composition comprising an aqueous dispersion containing an unsaturated polyurethane with repeating uni ts of tetramethylxylylene diisocyanate as the essential diisocyanate compound. The invention also relates to a process for making these dispersions in the absence of solvents. The product and process can meat severe environmental requirements in terms of absence of solvents, absence of amines and absence of irritating materials. The coatings obtained from the dispersions of the invention have all together a good resistance combined with a good cold flexibility. In particular, the coatings are glossy and exhibit a high adhesion, a good chemical resistance to stain, water and solvent and a good mechanical resistance to scratch and abrasion.
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公开(公告)号:AU2002354540A1
公开(公告)日:2003-01-29
申请号:AU2002354540
申请日:2002-07-11
Applicant: UCB SA
Inventor: TIELEMANS MICHEL , RENARD VINCENT , BONTINCK DIRK
Abstract: The invention relates to an aqueous ink composition containing a polyurethane polymer and at least one colorant, wherein the colorant is covalently bonded to the polyurethane polymer, and the composition is crosslinkable to form a network containing the polyurethane polymer.
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公开(公告)号:AU2002358087A1
公开(公告)日:2003-06-10
申请号:AU2002358087
申请日:2002-11-27
Applicant: UCB SA
Inventor: TIELEMANS MICHEL , BONTINCK DIRK , RENARD VINCENT
IPC: C08F299/06 , C08G18/08 , C08G18/12 , C08G18/66 , C08G18/67 , C08G18/76 , C09D175/16
Abstract: The invention relates to new radiation-curable composition comprising an aqueous dispersion containing an unsaturated polyurethane with repeating units of tetramethylxylylene diisocyanate as the essential diisocyanate compound. The invention also relates to a process for making these dispersions in the absence of solvents. The product and process can meat severe environmental requirements in terms of absence of solvents, absence of amines and absence of irritating materials. The coatings obtained from the dispersions of the invention have all together a good resistance combined with a good cold flexibility. In particular, the coatings are glossy and exhibit a high adhesion, a good chemical resistance to stain, water and solvent and a good mechanical resistance to scratch and abrasion.
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公开(公告)号:CA2453185A1
公开(公告)日:2003-01-23
申请号:CA2453185
申请日:2002-07-11
Applicant: UCB SA
Inventor: BONTINCK DIRK , RENARD VINCENT , TIELEMANS MICHEL
Abstract: The invention relates to an aqueous ink composition containing a polyurethan e polymer and at least one colorant, wherein the colorant is covalently bonded to the polyurethane polymer, and the composition is crosslinkable to form a network containing the polyurethane polymer.
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公开(公告)号:CA2454163A1
公开(公告)日:2003-02-06
申请号:CA2454163
申请日:2002-07-11
Applicant: UCB SA
Inventor: BONTINCK DIRK , RENARD VINCENT , TIELEMANS MICHEL
Abstract: The invention relates to an aqueous ink composition containing a polyurethan e polymer and at least one colorant, wherein the colorant is covalently bonded to the polyurethane polymer, and the composition is crosslinkable to form a network containing the polyurethane polymer, wherein the crosslinking reacti on is initiated by UV-irradiation or electron beam.
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