Plasma processing apparatus
    1.
    发明专利

    公开(公告)号:GB2381375A

    公开(公告)日:2003-04-30

    申请号:GB0211307

    申请日:2002-05-17

    Applicant: ULVAC INC

    Abstract: A plasma processing apparatus, e.g. for etching or CVD, is capable of forming highly effective plasma and obtaining a satisfactory vertical etching property without involving a problem concerning interference. In the plasma processing apparatus an electrode 37 provided at a position opposite to a substrate mounting electrode 30 is configured to be a counter electrode, whose potential is in a floating state. Radio frequency power from an RF source 36 is branched from a line supplying a radio frequency antenna coil 34, which generates inductive discharge, into the counter electrode 37 through a capacitor 41 so as to share a part of the radio frequency power used for the inductive discharge, thereby generating a self-bias in the counter electrode. There may be a mechanism for adjusting the capacitor 41 to maintain the radio frequency voltage applied to the floating electrode constant. In a modification, a Faraday shield or an electrostatic field shield electrode, provided inside the antenna coil, is used instead of the opposite electrode 37.

    Plasma processing apparatus
    2.
    发明专利

    公开(公告)号:GB2381375B

    公开(公告)日:2003-10-01

    申请号:GB0211307

    申请日:2002-05-17

    Applicant: ULVAC INC

    Abstract: The present invention is to provide a plasma processing apparatus, whose structure can be simplified, and further, which is capable of forming highly effective plasma and obtaining a satisfactory vertical etching property without involving a problem concerning interference. In the plasma processing apparatus according to the invention, a ground electrode provided at a position opposite to a substrate mounting electrode is configured to be a counter electrode, whose potential is in a floating state, and radio frequency power is branched at an arbitrary position of the radio frequency antenna coil, which generates inductive discharge, into the counter electrode through a capacitor so as to share a part of the radio frequency power used for inductive discharge, thereby generating a self-bias in the counter electrode. In the system, there is provided a mechanism for controlling the radio frequency voltage to be applied to the floating electrode uniformly.

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