公开(公告)号：DE69804252T2

公开(公告)日：2002-11-21

申请号：DE69804252

申请日：1998-11-06

Applicant: UNITED TECHNOLOGIES CORP

Inventor： MCCLUSKEY H ,  EATON E ,  GODIN R ,  FOSTER E ,  HARTER DAVID ,  CHIN STEPHEN ,  COTNOIR A ,  ELLIS A

IPC: C04B41/87 ,  C23C4/10 ,  C23C4/12

Abstract: Coatings containing at least 85% by volume crystalline mullite with less than 15% by volume of amorphous material and mullite dissociation phases are plasma sprayed onto the surface of a silicon based ceramic substrate by closely controlling the plasma spray parameters including the mullite feed stock and its particle size, the nozzle outlet stand-off distance, movement of the substrate past the plasma flow, back side heating of the substrate and the powder feed rate through the plasma spray gun.

公开(公告)号：DE69804252D1

公开(公告)日：2002-04-18

申请号：DE69804252

申请日：1998-11-06

Applicant: UNITED TECHNOLOGIES CORP

Inventor： MCCLUSKEY H ,  EATON E ,  GODIN R ,  FOSTER E ,  HARTER DAVID ,  CHIN STEPHEN ,  COTNOIR A ,  ELLIS A

IPC: C04B41/87 ,  C23C4/10 ,  C23C4/12

Abstract: Coatings containing at least 85% by volume crystalline mullite with less than 15% by volume of amorphous material and mullite dissociation phases are plasma sprayed onto the surface of a silicon based ceramic substrate by closely controlling the plasma spray parameters including the mullite feed stock and its particle size, the nozzle outlet stand-off distance, movement of the substrate past the plasma flow, back side heating of the substrate and the powder feed rate through the plasma spray gun.