公开(公告)号：WO9924379A2

公开(公告)日：1999-05-20

申请号：PCT/US9823668

申请日：1998-11-06

Applicant: UNITED TECHNOLOGIES CORP

Inventor： MCCLUSKEY PHILIP H ,  EATON HARRY E JR ,  GODIN DANIEL R ,  FOSTER GEORGE E ,  HARTER H DAVID ,  CHIN STEPHEN ,  COTNOIR GLENN A ,  ELLIS CHARLES A

IPC: C04B41/87 ,  C23C4/10 ,  C23C4/12 ,  C04B41/00

CPC classification number: C04B41/5037 ,  C04B41/009 ,  C04B41/87 ,  C23C4/11 ,  C23C4/134 ,  F01D5/288 ,  F05D2230/312 ,  F05D2240/55 ,  F05D2300/2261 ,  Y10T428/252 ,  C04B41/0072 ,  C04B41/4527 ,  C04B35/565 ,  C04B35/584 ,  C04B35/806

Abstract: Coatings containing at least 85 % by volume crystalline mullite with less than 15 % by volume of amorphous material and mullite dissociation phases are plasma sprayed onto the surface of a silicon based ceramic substrate by closely controlling the plasma spray parameters including the mullite feed stock and its particle size, the nozzle outlet stand-off distance, movement of the substrate past the plasma flow, back side heating of the substrate and the powder feed rate through the plasma spray gun.

Abstract translation: 含有至少85体积％的具有小于15体积％的非晶材料和莫来石解离相的结晶莫来石的涂层通过密切控制包括莫来石原料及其莫来石原料的等离子体喷涂参数而被等离子体喷涂到硅基陶瓷基板的表面上 颗粒尺寸，喷嘴出口间隔距离，基板通过等离子体流动的运动，基板的背面加热和通过等离子体喷枪的粉末进给速率。