公开(公告)号：US20210200058A1

公开(公告)日：2021-07-01

申请号：US16492261

申请日：2018-03-09

Applicant: University of Houston System

Inventor： P. Shiv Halasyamani ,  Hongwei Yu ,  Hongping Wu ,  Weiguo Zhang

IPC: G02F1/355 ,  C30B29/12 ,  C01F7/54

Abstract: A device comprising a nonlinear optical (NLO) material according to the formula XLi2Al4B6O20F. A device comprising a nonlinear optical material (NLO) according to the formula KSrCO3F, wherein the NLO comprises at least one single crystal. A nonlinear optical material selected from the group consisting of KSrCO3F Rb3Ba3Li2Al4B6O20F and K3Sr3Li2Al4B6O20F.

公开(公告)号：US20180120671A1

公开(公告)日：2018-05-03

申请号：US15563903

申请日：2016-04-13

Applicant: University of Houston System

Inventor： P. Shiv Halasyamani ,  Hongwei Yu

IPC: G02F1/355 ,  C30B29/10 ,  H01S5/00

CPC classification number: G02F1/3551 ,  C30B1/00 ,  C30B17/00 ,  C30B29/10 ,  G02F1/35 ,  G02F1/37 ,  H01S5/0092

Abstract: Disclosed is a nonlinear optical material (NLO) for use in deep-UV applications, and methods of fabrication thereof. The NLO is fabricated from a plurality of components according to the formula AqByCz and a crystallographic non-centrosymmetric (NCS) structure. The NLO material may be fabricated as a polycrystalline or a single crystal material. In an embodiment, the material may be according to a formula Ba3ZnB5PO14.

公开(公告)号：US10133148B2

公开(公告)日：2018-11-20

申请号：US15563903

申请日：2016-04-13

Applicant: University of Houston System

Inventor： P. Shiv Halasyamani ,  Hongwei Yu

IPC: G02F1/355 ,  C30B1/00 ,  C30B17/00 ,  C30B29/10 ,  G02F1/35 ,  G02F1/37 ,  H01S5/00

Abstract: Disclosed is a nonlinear optical material (NLO) for use in deep-UV applications, and methods of fabrication thereof. The NLO is fabricated from a plurality of components according to the formula AqByCz and a crystallographic non-centrosymmetric (NCS) structure. The NLO material may be fabricated as a polycrystalline or a single crystal material. In an embodiment, the material may be according to a formula Ba3ZnB5PO14.

公开(公告)号：US10409138B2

公开(公告)日：2019-09-10

申请号：US16357640

申请日：2019-03-19

Applicant: University of Houston System

Inventor： P. Shiv Halasyamani ,  Hongwei Yu

IPC: G02F1/355 ,  G02F1/37 ,  G02F1/35 ,  C30B29/10 ,  C30B17/00 ,  C30B1/00 ,  H01S5/00

Abstract: Disclosed is a nonlinear optical (NLO) material for use in deep-UV applications, and methods of fabrication thereof. The NLO is fabricated from a plurality of components according to the formula AqByCz and a crystallographic non-centrosymmetric (NCS) structure. The NLO material may be fabricated as a polycrystalline or a single crystal material. In an embodiment, the material may be according to a formula Ba3ZnB5PO14.

公开(公告)号：US10281796B2

公开(公告)日：2019-05-07

申请号：US16120366

申请日：2018-09-03

Applicant: University of Houston System

Inventor： P. Shiv Halasyamani ,  Hongwei Yu

IPC: G02F1/355 ,  C30B1/00 ,  C30B17/00 ,  C30B29/10 ,  G02F1/35 ,  G02F1/37 ,  H01S5/00

Abstract: Disclosed is a nonlinear optical (NLO) material for use in deep-UV applications, and methods of fabrication thereof. The NLO is fabricated from a plurality of components according to the formula AqByCz and a crystallographic non-centrosymmetric (NCS) structure. The NLO material may be fabricated as a polycrystalline or a single crystal material. In an embodiment, the material may be according to a formula Ba3ZnB5PO14.

公开(公告)号：US11262640B2

公开(公告)日：2022-03-01

申请号：US16492261

申请日：2018-03-09

Applicant: University of Houston System

Inventor： P. Shiv Halasyamani ,  Hongwei Yu ,  Hongping Wu ,  Weiguo Zhang

IPC: G02F1/355 ,  C01F7/54 ,  C30B29/12

Abstract: A device comprising a nonlinear optical (NLO) material according to the formula XLi2Al4B6O20F. A device comprising a nonlinear optical material (NLO) according to the formula KSrCO3F, wherein the NLO comprises at least one single crystal. A nonlinear optical material selected from the group consisting of KSrCO3F Rb3Ba3Li2Al4B6O20F and K3Sr3Li2Al4B6O20F.

公开(公告)号：US20190212630A1

公开(公告)日：2019-07-11

申请号：US16357640

申请日：2019-03-19

Applicant: University of Houston System

Inventor： P. Shiv Halasyamani ,  Hongwei Yu

IPC: G02F1/355 ,  G02F1/37 ,  G02F1/35 ,  H01S5/00 ,  C30B17/00 ,  C30B1/00 ,  C30B29/10

CPC classification number: G02F1/3551 ,  C30B1/00 ,  C30B1/02 ,  C30B11/00 ,  C30B17/00 ,  C30B19/02 ,  C30B29/10 ,  C30B29/14 ,  G02F1/35 ,  G02F1/37 ,  H01S5/0092

Abstract: Disclosed is a nonlinear optical (NLO) material for use in deep-UV applications, and methods of fabrication thereof. The NLO is fabricated from a plurality of components according to the formula AqByCz and a crystallographic non-centrosymmetric (NCS) structure. The NLO material may be fabricated as a polycrystalline or a single crystal material. In an embodiment, the material may be according to a formula Ba3ZnB5PO14.

公开(公告)号：US20180373120A1

公开(公告)日：2018-12-27

申请号：US16120366

申请日：2018-09-03

Applicant: University of Houston System

Inventor： P. Shiv Halasyamani ,  Hongwei Yu

IPC: G02F1/355 ,  G02F1/37 ,  G02F1/35 ,  H01S5/00 ,  C30B17/00 ,  C30B1/00 ,  C30B29/10

Abstract: Disclosed is a nonlinear optical (NLO) material for use in deep-UV applications, and methods of fabrication thereof. The NLO is fabricated from a plurality of components according to the formula AqByCz and a crystallographic non-centrosymmetric (NCS) structure. The NLO material may be fabricated as a polycrystalline or a single crystal material. In an embodiment, the material may be according to a formula Ba3ZnB5PO14.