公开(公告)号：US11699581B2

公开(公告)日：2023-07-11

申请号：US17485847

申请日：2021-09-27

Applicant: University of Science and Technology of China

Inventor： Bing Gong ,  Yongfei Zheng

IPC: H01J49/04 ,  G01N30/72

CPC classification number: H01J49/0413 ,  G01N30/7206

Abstract: A sample feed device is provided, including: a body; a sample tray provided on the body; a moving part provided on the body and capable of reciprocating on the body, and the moving part provided with a transfer chamber, the transfer chamber capable of receiving a sample from the sample tray and transferring the sample to an analyzer with the movement of the moving part; a processing system provided on the body, and capable of performing helium gas purging and vacuum processing to the sample. The sample feed device may feed the sample automatically through relay transfer of the sample by the sample tray and the moving part. The processing system may perform the helium gas purging and vacuuming to the sample, which strips adsorbate on the surface of the sample by the helium gas purging, and removes the stripped adsorbate on the surface of the sample by vacuuming.

公开(公告)号：US20220013345A1

公开(公告)日：2022-01-13

申请号：US17485847

申请日：2021-09-27

Applicant: University of Science and Technology of China

Inventor： Bing Gong ,  Yongfei Zheng

IPC: H01J49/04

Abstract: A sample feed device is provided, including: a body; a sample tray provided on the body; a moving part provided on the body and capable of reciprocating on the body, and the moving part provided with a transfer chamber, the transfer chamber capable of receiving a sample from the sample tray and transferring the sample to an analyzer with the movement of the moving part; a processing system provided on the body, and capable of performing helium gas purging and vacuum processing to the sample. The sample feed device may feed the sample automatically through relay transfer of the sample by the sample tray and the moving part. The processing system may perform the helium gas purging and vacuuming to the sample, which strips adsorbate on the surface of the sample by the helium gas purging, and removes the stripped adsorbate on the surface of the sample by vacuuming.