A CONTROL SYSTEM FOR NEUROSURGICAL ELECTROSURGICAL UNIT
    1.
    发明申请
    A CONTROL SYSTEM FOR NEUROSURGICAL ELECTROSURGICAL UNIT 审中-公开
    神经外科静脉治疗单元控制系统

    公开(公告)号:WO1996039085A1

    公开(公告)日:1996-12-12

    申请号:PCT/IB1996000547

    申请日:1996-06-03

    Applicant: VALLEYLAB INC.

    CPC classification number: A61B18/1206 A61B18/1442 A61B2018/00875

    Abstract: A control system (10) and method for the operation of neurosurgical bipolar electrodes (11) provides a source of high frequency energy (13') connected to bipolar electrodes (11). Contacting surfaces are on the bipolar electrodes (11) of highly electrically conductive material. A current transducer attached to the source of high frequency energy (13') measures (20) the RMS current applied between the contact surfaces (25). A current transducer attached to the source of high frequency energy (13') provides a signal (26) correlated to the instantaneous values of the RMS voltage between the contacts. A control connects to the source of high frequency energy (13') for initially regulating the RMS current applied by the contacting surfaces in response to the impedance until the signal (19) divided by the measure (20) which is representative of the instantaneous impedance of the load reaches a predetermined value. The control regulates the RMS power applied by the contacting surfaces in accord with the impedance until the signal (19) divided by the measure (20) reaches a predefined value. The control responds to the measure (20) and the signal (19) so that the RMS voltage applied to the load being treated between the contacting surfaces regulated while its impedance is monitored until a prescribed value is reached. The control regulates the RMS voltage applied in accord with the impedance by changing the RMS voltage to a percentage of that applied until the prescribed value is obtained so that the tissues stay moist and are coagulated without drying and carbonizing or turning to eschar.

    Abstract translation: 用于神经外科双极电极(11)的操作的控制系统(10)和方法提供连接到双极电极(11)的高频能量源(13')。 接触表面位于高导电材料的双极电极(11)上。 附接到高频能量源(13')的电流传感器测量施加在接触表面(25)之间的RMS电流(20)。 附接到高频能量源(13')的电流传感器提供与触点之间的RMS电压的瞬时值相关的信号(26)。 控制器连接到高频能量源(13'),用于响应于阻抗来初始调节由接触表面施加的RMS电流,直到信号(19)除以表示瞬时阻抗的测量(20) 的负载达到预定值。 控制根据阻抗调节接触表面施加的RMS功率,直到信号(19)除以测量值(20)达到预定值。 控制器响应于测量(20)和信号(19),使得施加到正在被处理的负载的RMS电压在其阻抗被监测之前被调节,直到达到规定的值。 控制通过将RMS电压改变到所施加的百分比直到获得规定值来调节施加的RMS电压,使得组织保持潮湿并且凝固而不干燥和碳化或转向焦痂。

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