Abstract:
A process is described of forming an electroluminescent (EL) display panel formed from an EL laminate having a phosphor layer (22) sandwiched between a front and a rear set of intersecting address lines (14,24), the rear address lines (12) being formed on a substrate (12) having sufficient rigidity to support the laminate and the phosphor layer being separated from the rear address lines by one or more dielectric layers (18,20); the process comprising the steps of: (a) providing a substrate formed with a plurality of through holes (32) patterned to be proximate the ends of the address lines to be subsequently formed; (b) forming a conductive path through each of the through holes in the substrate to provide for electrical connection of each address line, subsequently formed, to the voltage driving circuit (30); (c) forming the rear spaced address lines (14) on the substrate (12), one end of each line ending adjacent a through hole (32) and being electrically connected with the conductive path therethrough; (d) forming a dielectric layer (18,20) on the rear address lines (14); (e) forming the phosphor layer (22) above the dielectric layer: (f) optionally forming a transparent dielectric layer on the phosphor layer; and then (g) forming the front spaced address lines (24) on the underlying phosphor or transparent dielectric layer, one end of each line ending adjacent a through hole and being electrically connected with the conductive path therethrough. The invention also describes a method for laser scribing a pattern in a planar laminate (preferably an EL panel) having at least one overlying layer (e.g. a transparent layer for forming the front address lines (24)) and at least one underlying layer (e.g. a phosphor layer (22)); the method comprising: applying a focused laser beam on the overlying layer side of the laminate, said laser beam having a wavelength which is substantially unabsorbed by the overlying layer (24) but which is absorbed by the underlying layer (22), such that at least a portion of the underlying layer (22) is directly ablated and the overlying layer (24) is indirectly ablated throughout its thickness (thereby forming individual front address lines (24)).
Abstract:
A process is described of forming an electroluminescent (EL) display panel formed from an EL laminate having a phosphor layer (22) sandwiched between a front and a rear set of intersecting address lines (14,24), the rear address lines (12) being formed on a substrate (12) having sufficient rigidity to support the laminate and the phosphor layer being separated from the rear address lines by one or more dielectric layers (18,20); the process comprising the steps of: (a) providing a substrate formed with a plurality of through holes (32) patterned to be proximate the ends of the address lines to be subsequently formed; (b) forming a conductive path through each of the through holes in the substrate to provide for electrical connection of each address line, subsequently formed, to the voltage driving circuit (30); (c) forming the rear spaced address lines (14) on the substrate (12), one end of each line ending adjacent a through hole (32) and being electrically connected with the conductive path therethrough; (d) forming a dielectric layer (18,20) on the rear address lines (14); (e) forming the phosphor layer (22) above the dielectric layer: (f) optionally forming a transparent dielectric layer on the phosphor layer; and then (g) forming the front spaced address lines (24) on the underlying phosphor or transparent dielectric layer, one end of each line ending adjacent a through hole and being electrically connected with the conductive path therethrough. The invention also describes a method for laser scribing a pattern in a planar laminate (preferably an EL panel) having at least one overlying layer (e.g. a transparent layer for forming the front address lines (24)) and at least one underlying layer (e.g. a phosphor layer (22)); the method comprising: applying a focused laser beam on the overlying layer side of the laminate, said laser beam having a wavelength which is substantially unabsorbed by the overlying layer (24) but which is absorbed by the underlying layer (22), such that at least a portion of the underlying layer (22) is directly ablated and the overlying layer (24) is indirectly ablated throughout its thickness (thereby forming individual front address lines (24)).