THIN-FILM LID MEMS DEVICES AND METHODS
    1.
    发明申请
    THIN-FILM LID MEMS DEVICES AND METHODS 审中-公开
    薄膜盖MEMS装置和方法

    公开(公告)号:WO2010006065A3

    公开(公告)日:2010-05-06

    申请号:PCT/US2009049959

    申请日:2009-07-08

    CPC classification number: B81C1/00333 B81C2203/0145

    Abstract: Thin film encapsulation devices and methods for MEMS devices and packaging are provided. For a MEMS device encapsulated by a sacrificial layer, a lid layer can be deposited over the MEMS device without touching the MEMS device. The lid layer can be patterned and etched with a distribution of release etch holes, which provide access to the sacrificial layer encapsulating the MEMS device. The sacrificial material can be removed through the release etch holes, and the release etch holes can be filled with a seal layer. The seal layer can be removed from the substrate except where it seals the etch holes, leaving a series of plugs that can prevent other materials from entering the MEMS device cavity. In addition, a seal metal layer can be deposited and patterned so that it covers and encloses the plugged etch holes, and a barrier layer can cover the entire encapsulation structure.

    Abstract translation: 提供了用于MEMS器件和封装的薄膜封装装置和方法。 对于由牺牲层封装的MEMS器件,盖层可以沉积在MEMS器件上而不接触MEMS器件。 盖层可以通过释放蚀刻孔的分布来图案化和蚀刻,这释放蚀刻孔提供了对封装MEMS器件的牺牲层的访问。 可以通过释放蚀刻孔移除牺牲材料,并且释放蚀刻孔可以用密封层填充。 除了密封蚀刻孔的地方以外,密封层可以从衬底上去除,留下一系列可以防止其他材料进入MEMS器件腔的塞子。 另外,可以沉积并图案化密封金属层,使得其覆盖和封闭堵塞的蚀刻孔,并且阻挡层可以覆盖整个封装结构。

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