公开(公告)号：EP1535712B1

公开(公告)日：2009-01-14

申请号：EP03354086.5

申请日：2003-11-28

Applicant: Xenocs S.A.

Inventor： Hoghoj, Peter ,  Siebrecht, Ralf ,  Rodrigues, Sergio

IPC: B29C33/38 ,  B29C33/56 ,  B29L11/00 ,  G02B5/08 ,  C03B11/08

CPC classification number: B29C33/56 ,  B29C33/3878 ,  B29C33/58 ,  B29C33/62 ,  B29C39/126 ,  B29K2995/0073

公开(公告)号：EP2075569B1

公开(公告)日：2012-02-15

申请号：EP07291646.3

申请日：2007-12-31

Applicant: Xenocs S.A.

Inventor： Lantz, Blandine ,  Hoghoj, Peter

IPC: G01N23/20

CPC classification number: G01N23/20008 ,  G21K2201/062

公开(公告)号：EP1535712A1

公开(公告)日：2005-06-01

申请号：EP03354086.5

申请日：2003-11-28

Applicant: Xenocs S.A.

Inventor： Hoghoj, Peter ,  Siebrecht, Ralf ,  Rodrigues, Sergio

IPC: B29C33/38 ,  B29C33/56 ,  B29L11/00 ,  G02B5/08 ,  C03B11/08

CPC classification number: B29C33/56 ,  B29C33/3878 ,  B29C33/58 ,  B29C33/62 ,  B29C39/126 ,  B29K2995/0073

Abstract: In a method for producing a replication master (10) having a surface with low roughness, comprising the steps of forming said master (10) such as to have a desired external surface shape corresponding to a counterform of a surface of an object (18, 20) to be produced by replication and treating said external surface of said master (10) to obtain a predetermined surface roughness value, it is proposed that said method furthermore comprises the step of coating at least a part of said master (10) with a smoothening layer (16). The invention further relates to a replication master (10) for producing a smooth object (18, 20) having a low surface roughness, wherein at least a part of said master (10) is coated with a smoothening layer (16).

Abstract translation: 在用于制造具有低粗糙度表面的复制母版（10）的方法中，包括以下步骤：形成所述母版（10）以具有与对象（18）的表面的对应形状相对应的期望外表面形状， 20）通过复制和处理所述母模（10）的所述外表面以获得预定的表面粗糙度值而生产，建议所述方法还包括以下步骤：在所述母模（10）的至少一部分上涂覆 平滑层（16）。 本发明还涉及一种用于产生具有低表面粗糙度的光滑物体（18,20）的复制母盘（10），其中所述母盘（10）的至少一部分涂覆有平滑层（16）。

公开(公告)号：EP2075569A1

公开(公告)日：2009-07-01

申请号：EP07291646.3

申请日：2007-12-31

Applicant: Xenocs S.A.

Inventor： Lantz, Blandine ,  Hoghoj, Peter

IPC: G01N23/20

CPC classification number: G01N23/20008 ,  G21K2201/062

Abstract: The invention refers to an X-ray beam device for X-ray analytical applications, comprising an X-ray source designed such as to emit a divergent beam of X-rays; and an optical assembly designed such as to focus said beam onto a focal spot, wherein said optical assembly comprises a first reflecting optical element, a monochromator device and a second reflecting optical element sequentially arranged between said source and said focal spot, wherein said first optical element is designed such as to collimate said beam in two dimensions towards said monochromator device, and wherein said second optical element is designed such as to focus the beam coming from said monochromator device in two dimensions onto said focal spot.

Abstract translation: 本发明涉及用于X射线分析应用的X射线束装置，其包括设计成发射X射线发散束的X射线源; 以及设计成将所述光束聚焦到焦斑上的光学组件，其中所述光学组件包括顺序地布置在所述光源和所述焦点之间的第一反射光学元件，单色器装置和第二反射光学元件，其中所述第一光学 元件被设计成使得所述光束在二维上朝向所述单色仪装置校准，并且其中所述第二光学元件被设计成将来自所述单色仪装置的光束二维聚焦在所述焦斑上。