公开(公告)号：EP2252545A2

公开(公告)日：2010-11-24

申请号：EP09719665.3

申请日：2009-03-10

Applicant: Yeda Research And Development Company Ltd.

Inventor： NAAMAN, Ron ,  GOLAN, Ben ,  FRADKIN, Zeev ,  WINKLEMAN, Adam ,  ORON, Dan

IPC: B81C1/00

CPC classification number: B81C1/00206 ,  B81C1/00031 ,  B81C2201/0132 ,  B81C2201/115 ,  G03F7/40

Abstract: A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super- hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.