Abstract:
The invention is a method for detecting both surface topography and defect presence using an AC interferometer. Surface topography measurements are maximized by adjusting the signal voltage of the light modulator to a relative phase-sensitive value. Defect detection is maximized by adjusting the signal voltage of the light modulator to a relatively phase-insensitive value. This method not only allows for heretofore unknown defect detection by an AC interferometer but, because the signal voltage can be switched electronically, permits both observations to be taken at a high speed and for many points of a specimen, thereby making the method suitable for the manufacturing environment. More specifically, the method would be applicable to both optical disk and microchip manufacturing.
Abstract:
A point diffraction interferometric wavefront aberration measuring device comprising an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. The center distance between the first output port and the second output port of the ideal wavefront generator is smaller than the diameter of the isoplanatic region of the measured optical system and is greater than the ratio of the diameter of the image point dispersion speckle of the measured optical system over the amplification factor thereof. A method for detecting wavefront aberration of the optical system is also provided by using the device.
Abstract:
Apparatus, method and storage medium which can provide at least one first electro-magnetic radiation to a sample 130 and at least one second electro-magnetic radiation to a reference, such that the first and/or second electro-magnetic radiations have a spectrum which changes over time. In addition, a first polarization component of at least one third radiation 405 associated with the first radiation can be combined with a second polarization component of at least one fourth radiation 400 associated with the second radiation with one another. The first and second polarizations may be specifically controlled to be at least approximately orthogonal to one another. Apparatus and method are used for quadrature detection of swept source Fourier domain optical coherence tomography.