公开(公告)号：US20220299893A1

公开(公告)日：2022-09-22

申请号：US17616081

申请日：2020-05-26

Applicant: ASML HOLDING N.V.

Inventor： Yuli VLADIMIRSKY ,  Lev RYZHIKOV

IPC: G03F9/00 ,  G03F7/20

Abstract: A patterning device alignment system including a multipath sensory array including a first collimating light path and one or more other light paths, a first detector positioned at a first end of the first collimating light path, and a second detector positioned at a first end of the one or more other light paths, the first detector configured to receive a reflected illumination beam from an illuminated patterning device and calculate a tilt parameter of the patterning device, and the second detector configured to receive a second reflected illumination beam from a beam splitter and calculate an X-Y planar location position and a rotation position of the patterning device.

公开(公告)号：US20230236519A1

公开(公告)日：2023-07-27

申请号：US18001258

申请日：2021-05-20

Applicant: ASML Holding N.V.

Inventor： Yuli VLADIMIRSKY ,  Lev RYZHIKOV

IPC: G03F9/00 ,  G02B3/00

CPC classification number: G03F9/7011 ,  G03F9/7065 ,  G03F9/7042 ,  G02B3/005

Abstract: A patterning device pre-alignment sensor system is disclosed. The system comprises at least one illumination source configured to provide an incident beam along a normal direction towards a patterning device. The system further comprises an object lens group channel along the normal direction configured to receive a 0th order refracted beam from the patterning device. The system further comprises a first light reflector configured to redirect the 0th order refracted beam to form a first retroreflected beam. The system further comprises a first image lens group channel configured to transmit the first retroreflected beam to a first light sensor. The first light sensor is configured to detect the first retroreflected beam to determine a location feature of the patterning device.

公开(公告)号：US20170212057A1

公开(公告)日：2017-07-27

申请号：US15120154

申请日：2015-03-05

Applicant: ASML HOLDING N.V.

Inventor： Stanley G. JANIK ,  Yuli VLADIMIRSKY ,  James H. WALSH

IPC: G01N21/94 ,  G03F7/20 ,  G01N21/956

CPC classification number: G01N21/94 ,  G01N21/95607 ,  G01N2021/95676 ,  G01N2201/0612 ,  G01N2201/062 ,  G01N2201/12 ,  G03F1/84 ,  G03F7/70591

Abstract: An apparatus and method is provided to efficiently and more precisely inspect reticles for contamination. The inspection system is used to image the reticle back-side and pellicle-side separately by transferring the reticle while maintaining desired demagnification. An inspection system is disclosed that includes a reticle support to support the reticle at a first position and an illumination source to illuminate a first surface of the reticle at the first position. The inspection system further includes a first sensor to receive light from the illuminated first surface of the reticle when the reticle is at the first position and a second sensor to receive light from an illuminated second surface of the reticle when the reticle is at a second position.

公开(公告)号：US20240053688A1

公开(公告)日：2024-02-15

申请号：US17641212

申请日：2020-08-25

Applicant: ASML Holding N.V.

Inventor： Lev RYZHIKOV ,  Yuli VLADIMIRSKY

IPC: G03F9/00

CPC classification number: G03F9/7011 ,  G03F9/7088 ,  G03F9/7046 ,  G03F9/7096 ,  G03F9/7049

Abstract: A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pre-alignment system. The pre-alignment system also includes a multipath sensory array having at least one image lens system, wherein the at least one image lens system includes a telecentric converter lens configured to produce telecentricity in an image space of the pre-alignment system.

公开(公告)号：US20140098356A1

公开(公告)日：2014-04-10

申请号：US14107819

申请日：2013-12-16

Applicant: ASML HOLDING N.V.

Inventor： Lev RYZHIKOV ,  Yuli VLADIMIRSKY ,  James H. WALSH

IPC: G03F7/20 ,  G01N21/94 ,  G02B13/18

CPC classification number: G03F7/7015 ,  G01N21/94 ,  G02B13/04 ,  G02B13/18 ,  G03F1/84 ,  G03F7/7085 ,  G03F7/70908

Abstract: Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more, from an object surface, and produce imageable radiation. The wide angle input lens group is arranged such that no intermediate focused image is formed within or after the wide angle input lens group. The output lens group is configured to receive the imageable radiation from the wide angle input lens group and focus the imageable radiation onto an image plane to image at least part of the object surface. A detector receives the image of the at least part of the object surface and, based on the received image, detects, for example, contamination on the object surface.

Abstract translation: 使用广角光学系统来提供用于检查的系统和方法。 光学系统包括广角输入透镜组和输出透镜组。 广角输入透镜组被配置为从物体表面接收例如具有60度或更大角度扩展的广角辐射，并且产生可成像的辐射。 广角输入透镜组被布置成使得在广角输入透镜组之内或之后不形成中间聚焦图像。 输出透镜组被配置为从广角输入透镜组接收可成像的辐射，并将可成像的辐射聚焦到图像平面上以对物体表面的至少一部分进行成像。 检测器接收对象表面的至少一部分的图像，并且基于接收到的图像来检测例如物体表面上的污染物。