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    LITHOGRAPHIC PATTERNING DEVICE MULTICHANNEL POSITION AND LEVEL GAUGE
    1.
    发明申请
    LITHOGRAPHIC PATTERNING DEVICE MULTICHANNEL POSITION AND LEVEL GAUGE 有权

    公开(公告)号：US20220299893A1

    公开(公告)日：2022-09-22

    申请号：US17616081

    申请日：2020-05-26

    Applicant: ASML HOLDING N.V.

    Inventor： Yuli VLADIMIRSKY ,  Lev RYZHIKOV

    IPC: G03F9/00 ,  G03F7/20

    Abstract: A patterning device alignment system including a multipath sensory array including a first collimating light path and one or more other light paths, a first detector positioned at a first end of the first collimating light path, and a second detector positioned at a first end of the one or more other light paths, the first detector configured to receive a reflected illumination beam from an illuminated patterning device and calculate a tilt parameter of the patterning device, and the second detector configured to receive a second reflected illumination beam from a beam splitter and calculate an X-Y planar location position and a rotation position of the patterning device.

    LITHOGRAPHIC PRE-ALIGNMENT IMAGING SENSOR WITH BUILD-IN COAXIAL ILLUMINATION
    2.
    发明公开
    LITHOGRAPHIC PRE-ALIGNMENT IMAGING SENSOR WITH BUILD-IN COAXIAL ILLUMINATION 审中-公开

    公开(公告)号：US20230236519A1

    公开(公告)日：2023-07-27

    申请号：US18001258

    申请日：2021-05-20

    Applicant: ASML Holding N.V.

    Inventor： Yuli VLADIMIRSKY ,  Lev RYZHIKOV

    IPC: G03F9/00 ,  G02B3/00

    CPC classification number: G03F9/7011 ,  G03F9/7065 ,  G03F9/7042 ,  G02B3/005

    Abstract: A patterning device pre-alignment sensor system is disclosed. The system comprises at least one illumination source configured to provide an incident beam along a normal direction towards a patterning device. The system further comprises an object lens group channel along the normal direction configured to receive a 0th order refracted beam from the patterning device. The system further comprises a first light reflector configured to redirect the 0th order refracted beam to form a first retroreflected beam. The system further comprises a first image lens group channel configured to transmit the first retroreflected beam to a first light sensor. The first light sensor is configured to detect the first retroreflected beam to determine a location feature of the patterning device.

    High Numerical Aperture Objective Lens System
    4.
    发明申请
    High Numerical Aperture Objective Lens System 有权
    高数值孔径物镜系统

    公开(公告)号：US20160091797A1

    公开(公告)日：2016-03-31

    申请号：US14819335

    申请日：2015-08-05

    Applicant: ASML Holding N.V.

    Inventor： Lev RYZHIKOV

    IPC: G03F7/20 ,  G01N21/95 ,  G01N21/88 ,  G02B13/14

    CPC classification number: G01N21/474 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2201/0638 ,  G02B9/64 ,  G02B13/143 ,  G02B13/16 ,  G02B13/18 ,  G02B21/02 ,  G02B27/0025 ,  G03F7/70 ,  G03F7/70058

    Abstract: An objective lens system having a high numerical aperture, a large working distance, and low optical aberrations over a wide spectral band of wavelengths is disclosed. The objective lens system includes a first lens group, a second lens group, and a third lens group. The first lens group includes first and second positive meniscus lenses that are positioned at a distance from each other along an optical axis of the objective lens system. The distance may be dependent on a focal length of the objective lens system. The second lens group includes first and second meniscus lenses and a bi-convex lens. The third lens group includes a bi-concave lens and a doublet lens.

    Abstract translation: 公开了一种具有高数值孔径，大工作距离以及宽波段波长频带下的低光学像差的物镜系统。 物镜系统包括第一透镜组，第二透镜组和第三透镜组。 第一透镜组包括沿着物镜系统的光轴相互间隔一定距离的第一和第二正弯月透镜。 距离可以取决于物镜系统的焦距。 第二透镜组包括第一和第二弯月透镜和双凸透镜。 第三透镜组包括双凹透镜和双透镜。

    OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD
    6.
    发明申请
    OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD 有权
    光学系统，检测系统和制造方法

    公开(公告)号：US20140098356A1

    公开(公告)日：2014-04-10

    申请号：US14107819

    申请日：2013-12-16

    Applicant: ASML HOLDING N.V.

    Inventor： Lev RYZHIKOV ,  Yuli VLADIMIRSKY ,  James H. WALSH

    IPC: G03F7/20 ,  G01N21/94 ,  G02B13/18

    CPC classification number: G03F7/7015 ,  G01N21/94 ,  G02B13/04 ,  G02B13/18 ,  G03F1/84 ,  G03F7/7085 ,  G03F7/70908

    Abstract: Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more, from an object surface, and produce imageable radiation. The wide angle input lens group is arranged such that no intermediate focused image is formed within or after the wide angle input lens group. The output lens group is configured to receive the imageable radiation from the wide angle input lens group and focus the imageable radiation onto an image plane to image at least part of the object surface. A detector receives the image of the at least part of the object surface and, based on the received image, detects, for example, contamination on the object surface.

    Abstract translation: 使用广角光学系统来提供用于检查的系统和方法。 光学系统包括广角输入透镜组和输出透镜组。 广角输入透镜组被配置为从物体表面接收例如具有60度或更大角度扩展的广角辐射，并且产生可成像的辐射。 广角输入透镜组被布置成使得在广角输入透镜组之内或之后不形成中间聚焦图像。 输出透镜组被配置为从广角输入透镜组接收可成像的辐射，并将可成像的辐射聚焦到图像平面上以对物体表面的至少一部分进行成像。 检测器接收对象表面的至少一部分的图像，并且基于接收到的图像来检测例如物体表面上的污染物。

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