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    Positive resist composition and pattern forming method
    4.
    发明授权
    Positive resist composition and pattern forming method 失效
    正抗蚀剂组成和图案形成方法

    公开(公告)号：US08088550B2

    公开(公告)日：2012-01-03

    申请号：US12181757

    申请日：2008-07-29

    Applicant: Shinji Tarutani ,  Hideaki Tsubaki ,  Kenji Wada

    Inventor： Shinji Tarutani ,  Hideaki Tsubaki ,  Kenji Wada

    IPC: G03F7/004 ,  G03F7/30

    CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/2022 ,  G03F7/2041 ,  Y10S430/111

    Abstract: A positive resist composition, includes: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under an action of an acid; (C) a compound capable of decomposing under an action of an acid to generate an acid; and (D) a compound which itself acts as a base for the acids generated from the component (A) and the component (C) but decomposes upon irradiation with actinic rays or radiation to lose a basicity for the acids generated from the component (A) and the component (C).

    Abstract translation: 正型抗蚀剂组合物包括：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B）在碱性显影剂中的溶解度在酸的作用下增加的树脂; （C）能够在酸的作用下分解以产生酸的化合物; 和（D）本身作为由组分（A）和组分（C）产生的酸的碱的化合物，但是在用光化射线或辐射照射时分解，以失去由组分（A）产生的酸的碱度 ）和组分（C）。

    COMPOSITION FOR OPTICAL MATERIALS
    5.
    发明申请
    COMPOSITION FOR OPTICAL MATERIALS 有权
    光学材料组成

    公开(公告)号：US20110089385A1

    公开(公告)日：2011-04-21

    申请号：US12904252

    申请日：2010-10-14

    Applicant: Kenji Wada ,  Kyohei Arayama ,  Akiyoshi Goto

    Inventor： Kenji Wada ,  Kyohei Arayama ,  Akiyoshi Goto

    IPC: G02B5/22 ,  C07F7/18 ,  C07F7/10

    CPC classification number: C07F7/21 ,  C08G77/045 ,  C08L83/04 ,  G02B1/111

    Abstract: The composition for optical materials includes a polymer obtained from silsesquioxanes which are represented by average composition formula (1): (R1SiO1.5)x(R2SiO1.5)y (wherein R1 is a polymerizable group, R2 is a non-polymerizable group, x is a number of 2.0 to 14.0, y is a number of 2.0 to 14.0, provided that x+y=8.0 to 16.0, and R1 groups and R2 groups may be the same or different) and include at least one cage silsesquioxane compound. This composition is suitable for use as the antireflective film in optical devices, has less film shrinkage in the curing step, has good coated surface state and excellent moisture resistance and adhesion, has small changes in the refractive index under high temperature conditions, and is capable of forming a low-refractive-index film.

    Abstract translation: 用于光学材料的组合物包括由平均组成式（1）表示的倍半硅氧烷获得的聚合物：（R1SiO1.5）x（R2SiO1.5）y（其中R1是可聚合基团，R2是不可聚合基团， x为2.0〜14.0的数，y为2.0〜14.0的数，条件是x + y = 8.0〜16.0，R 1基和R 2基可以相同或不同），并且包括至少一种笼型倍半硅氧烷化合物。 该组合物适合用作光学元件中的抗反射膜，在固化步骤中具有较小的膜收缩率，具有良好的涂覆表面状态和优异的耐湿性和粘附性，在高温条件下的折射率变化小，并且能够 形成低折射率膜。

    PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
    8.
    发明申请
    PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION 有权
    感光性组合物，使用感光性组合物的图案形成方法和化合物用于感光性组合物

    公开(公告)号：US20100233617A1

    公开(公告)日：2010-09-16

    申请号：US12679140

    申请日：2008-09-18

    Applicant: Kenji Wada

    Inventor： Kenji Wada

    IPC: G03F7/004 ,  G03F7/20 ,  C07C309/63 ,  C08F14/18 ,  C07C233/00 ,  C08G75/00 ,  C07C311/00

    CPC classification number: C08F20/10 ,  C07D211/96 ,  C07D243/04 ,  C07D295/26 ,  C08F214/18 ,  C08F220/26 ,  C08F220/28 ,  C08F220/34 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2022 ,  G03F7/2041

    Abstract: A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

    Abstract translation: 感光性组合物包括：（A）含有对应于下式（I）表示的化合物的重复单元的树脂; 该树脂能够在用光化射线或辐射照射时产生酸基团：ZAX-B-R（I）其中Z表示能够在用光化射线照射时离开阳离子时成为酸基团的基团，或 辐射; A表示亚烷基; X表示单键或含杂原子的二价连接基团; B表示单键，氧原子或-N（Rx） - ; Rx表示氢原子或一价有机基团; R表示被Y取代的一价有机基团; 当B表示-N（Rx） - 时，R和Rx可以相互结合形成环; Y表示可聚合基团。

    Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
    9.
    发明授权
    Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition 有权
    感光组合物，用于感光组合物的化合物和使用感光组合物的图案形成方法

    公开(公告)号：US07691558B2

    公开(公告)日：2010-04-06

    申请号：US11335679

    申请日：2006-01-20

    Applicant: Kenji Wada

    Inventor： Kenji Wada

    IPC: G03F7/00 ,  G03F7/004

    CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0382

    Abstract: A photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the photosensitive composition, and a pattern forming method using the photosensitive composition, are provided, which are a photosensitive composition excellent in the sensitivity, resolution and pattern profile, assured of large exposure latitude and small pitch dependency, and improved in the sensitivity and dissolution contrast at the exposure with EUV light, a pattern forming method using the photosensitive composition, and a compound useful for the photosensitive composition.

    Abstract translation: 用于半导体（例如IC）的制造中的光敏组合物，在液晶，热敏头等的电路基板的制造中或在其它光制造工艺中，用于感光组合物的化合物和图案 提供了使用感光性组合物的成膜方法，它们是灵敏度，分辨率和图案轮廓优异的感光组合物，确保了大的曝光宽容度和小的间距依赖性，并且在用EUV光曝光时提高了灵敏度和溶解度对比度， 使用该感光性组合物的图案形成方法和可用于感光性组合物的化合物。

    Broadcast receiving device and stream output device
    10.
    发明授权
    Broadcast receiving device and stream output device 有权
    广播接收设备和流输出设备

    公开(公告)号：US07614076B2

    公开(公告)日：2009-11-03

    申请号：US10969800

    申请日：2004-10-19

    Applicant: Chiyo Ono ,  Kenji Wada

    Inventor： Chiyo Ono ,  Kenji Wada

    IPC: H04N7/16 ,  H04N7/00 ,  H04N5/91

    CPC classification number: H04N5/76 ,  G11B31/00 ,  H04N5/765 ,  H04N5/781 ,  H04N5/85 ,  H04N5/907 ,  H04N2005/91328

    Abstract: A broadcast receiving device configured to receive broadcasted digital programs includes a tuner to select a channel from a plurality of channels, so that a desired digital program may be received via the selected channel; a recording component to record the received program and copy control information associated with the received program; a digital terminal to output the program recorded on the recording component to a video recording device coupled to the digital terminal; and a controller to control the output of the recorded program to the video recording device that is coupled to the digital terminal. The recorded program is not output via the digital terminal if more than one video recording device is coupled to the digital terminal and if the copy control information of the recorded program imposes restriction on copying of the recorded program.

    Abstract translation: 被配置为接收广播的数字节目的广播接收装置包括从多个频道中选择频道的调谐器，从而可以经由所选择的频道接收期望的数字节目; 用于记录所接收的节目的记录组件和与所接收节目相关联的复制控制信息; 数字终端，将记录在记录部件上的程序输出到耦合到数字终端的视频记录装置; 以及控制器，用于将记录的节目的输出控制到耦合到数字终端的视频记录装置。 如果多于一个的视频记录装置耦合到数字终端，并且所记录的节目的复制控制信息对所记录的节目的复制的限制，则不经由数字终端输出所记录的节目。

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