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公开(公告)号：US12025570B2
公开(公告)日：2024-07-02
申请号：US17621237
申请日：2021-11-25
Inventor： Yali Liu , Yongzhen Jia
CPC classification number: G01N21/9515 , G01N21/8851 , G01N2021/8887 , G01N2021/9513 , G01N2201/063
Abstract: The present application provides a detection method of a crease degree of a screen and a visual detection device, the detection method includes: providing detection rays and obliquely irradiating the detection rays onto a surface to be measured of a folding screen; acquiring detection rays reflected by the surface to be measured of the folding screen to obtain a corresponding light source reflection image; analyzing the light source reflection image to obtain an evaluation index of an crease degree of the folding screen; and evaluating the crease degree of the folding screen.
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公开(公告)号：US11749571B2
公开(公告)日：2023-09-05
申请号：US17462916
申请日：2021-08-31
Inventor： Sheng He Huang , Chung-Pin Chou , Shiue-Ming Guo , Hsuan-Chia Kao , Yan-Cheng Chen , Sheng-Ching Kao , Jun Xiu Liu
CPC classification number: H01L22/12 , G01N21/9501 , G01N2201/063 , G02B27/14
Abstract: In a method of inspection of a semiconductor substrate a first beam of light is split into two or more second beams of light. The two or more second beams of light are respectively transmitted onto a first set of two or more first locations on top of the semiconductor substrate. In response to the transmitted two or more second beams of light, two or more reflected beams of light from the first set of two or more first locations are received. The received two or more reflected beams of light are detected to generate two or more detected signals. The two or more detected signals are analyzed to determine whether a defect exists at the set of the two or more first locations.
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3.发明授权公开(公告)号：US10012583B2
公开(公告)日：2018-07-03
申请号：US14648577
申请日：2013-09-11
Applicant: KONICA MINOLTA, INC.
Inventor： Yoshiyuki Nagashima , Katsutoshi Tsurutani
CPC classification number: G01N21/21 , G01N21/251 , G01N33/32 , G01N2201/063
Abstract: A reflection property measuring device comprising illumination light and reflected light polarizing plates held by a holder in a mutually superposed state in a thickness direction thereof, wherein the holder has a fittingly-holding portion for setting a held posture, and each of the polarizing plates has a fitting portion fittable to the fittingly-holding portion. The fitting portions of the polarizing plates are provided at positions allowing the polarizing plates to be held by the holder in respective postures where polarizing directions thereof intersect orthogonally. A manufacturing method is disclosed for polarizing plates used in the device, wherein the illumination light and reflected light polarizing plates are manufactured in such a manner as to be punched out from the same polarizing plate material.
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公开(公告)号：US09897790B2
公开(公告)日：2018-02-20
申请号：US14996717
申请日：2016-01-15
Applicant: NIKON CORPORATION
Inventor： Hiroaki Nakayama , Yumiko Ouchi
CPC classification number: G02B21/06 , G01N21/64 , G01N21/6428 , G01N2021/6439 , G01N2201/063 , G01N2201/0638 , G02B21/0032 , G02B21/0076 , G02B21/16 , G02B21/367 , G02B27/58
Abstract: A structured illumination device includes: a diffraction unit that diffracts light beams of a plurality of wavelengths that are emitted simultaneously or sequentially by a light source into a plurality of diffracted beams; and an optical system that forms interference fringes on a surface of a sample using the plurality of diffracted beams diffracted by the diffraction unit, the optical system including a first optical system and a second optical system that focuses the plurality of diffracted beams at positions on or near a pupil plane of the first optical system, and a magnification characteristic dY(λ) of the second optical system satisfying the condition of (fo·nw−afλ/P)≦dY(λ)≦(fo·NA−afλ/P), where a=1 (for M=1, 2) or a=2 (for M=3).
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5.发明申请公开(公告)号：US20170363547A1
公开(公告)日：2017-12-21
申请号：US15673582
申请日：2017-08-10
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
CPC classification number: G01N21/8806 , G01N21/21 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/8848 , G01N2201/06113 , G01N2201/063
Abstract: The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.
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Patent Agency Ranking
公开(公告)号：US09638635B2
公开(公告)日：2017-05-02
申请号：US14649096
申请日：2013-11-29
Applicant: HORIBA JOBIN YVON SAS
Inventor： Olivier Acher , Simon Richard , Christian Brach , Viviane Millet , Sebastien Corde , Daphne Heran
CPC classification number: G01N21/645 , G01J3/021 , G01J3/0224 , G01J3/18 , G01J3/447 , G01N2201/063 , G01N2201/0633 , G02B5/1866 , G02B27/283
Abstract: A spectrometer (100) for analyzing the spectrum of an upstream light beam (1), includes an entrance slit (101) and collimating elements (110) suitable for generating, from the upstream light beam, a collimated light beam (10), characterized in that it also includes: a polarization-dependent diffraction grating (120) suitable for diffracting, at each wavelength (11, 12) of the spectrum of the upstream light beam, the collimated light beam into a first diffracted light beam (11, 12) and a second diffracted light beam (21, 22); optical recombining elements (130) including a planar optical reflecting surface (130) perpendicular to the grating and suitable for deviating at least the second diffracted light beam; and focussing elements (140) suitable for focussing, at each wavelength, the first diffracted light beam and the second diffracted light beam onto one and the same focussing area (141).
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7.发明授权Laser differential confocal mapping-spectrum microscopic imaging method and device 有权激光微分共焦测绘光谱显微镜成像方法及装置公开(公告)号：US09410880B2
公开(公告)日：2016-08-09
申请号：US14366266
申请日：2013-08-08
Applicant: BEIJING INSTITUTE OF TECHNOLOGY
Inventor： Weiqian Zhao , Han Cui , Lirong Qiu , Yun Wang
CPC classification number: G01N21/47 , G01N21/65 , G01N21/658 , G01N2201/063
Abstract: The present invention belongs to a technical field of optical microscopic imaging and spectral measurement, and discloses a laser differential confocal mapping-spectrum microscopic imaging method and device. The core concept of the present invention is to combine the differential confocal detection and the spectrum detection techniques and use a dichroic beam splitting system (13) to separate the Rayleigh light for geometric position detection from the Raman scattering light for spectrum detection, by mean of the property that the zero-cross point of the differential confocal curve (43) accurately corresponds to the focus of the objective, the spectral information at focus of the excitation spot being accurately captured by the zero trigger to accomplish the spectrum detection with high spatial resolution. Therefore, the present invention provides a method and device that may be able to accomplish the spectrum detection with high spatial resolution to a micro-area of a sample.
Abstract translation: 本发明属于光学显微成像和光谱测量的技术领域，并且公开了一种激光微分共焦映射光谱显微成像方法和装置。 本发明的核心概念是组合差分共聚焦检测和光谱检测技术，并使用二向色分束系统（13）将用于几何位置检测的瑞利光与用于光谱检测的拉曼散射光分离，通过 差分共聚焦点曲线（43）的零交叉点准确地对应于物镜的焦点，激发点焦点处的光谱信息被零点触发精确地捕获，完成高空间分辨率的光谱检测 。 因此，本发明提供了一种能够以高空间分辨率对样品的微区进行光谱检测的方法和装置。
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公开(公告)号：US20160209333A1
公开(公告)日：2016-07-21
申请号：US15000715
申请日：2016-01-19
Applicant: NuFlare Technology, Inc.
Inventor： Masatoshi HIRONO , Riki OGAWA , Takeshi FUJIWARA
CPC classification number: G01N21/9501 , G01N21/956 , G01N2021/95676 , G01N2201/063 , G03F1/84
Abstract: According to one embodiment, a defect inspection device includes a first beam splitter configured to branch light into a first optical path and a second optical path, a first optical system on the first optical path, a second optical system on the second optical path, a first aperture configured to form an illumination field of an inspection sample by light from the first optical system, a second aperture configured to form an illumination field of the inspection sample by light from the second optical system, and a third optical system configured to illuminate, with a first illumination, an image of the first aperture on a first area of the inspection sample, and to illuminate, with a second illumination, an image of the second aperture on a second area of the inspection sample.
Abstract translation: 根据一个实施例，缺陷检查装置包括第一分束器，其被配置为将光分支到第一光路和第二光路中，第一光学系统上的第一光学系统，第二光学路径上的第二光学系统， 第一孔，被配置为通过来自第一光学系统的光形成检查样本的照明场;第二孔，被配置为通过来自第二光学系统的光形成检查样本的照明场;以及第三光学系统， 利用第一照明，在检查样品的第一区域上的第一孔的图像，并且用第二照明照亮检查样品的第二区域上的第二孔的图像。
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9.发明申请AUTOMATED FOCUSING, CLEANING, AND MULTIPLE LOCATION SAMPLING SPECTROMETER SYSTEM 审中-公开自动聚焦，清洁和多个位置采样光谱仪系统公开(公告)号：US20160139053A1
公开(公告)日：2016-05-19
申请号：US14983933
申请日：2015-12-30
Applicant: SciAps, Inc.
Inventor： David Day
IPC: G01N21/71
CPC classification number: G01N21/718 , G01J3/0272 , G01J3/2823 , G01J3/443 , G01N21/65 , G01N2201/0221 , G01N2201/06113 , G01N2201/063
Abstract: An analysis system includes a moveable focusing lens, a laser (typically an eye safe laser) having an output directed at the focusing lens, and a spectrometer outputting intensity data from a sample. A controller system is responsive to the spectrometer and is configured to energize the laser, process the output of the spectrometer, and adjust the position of the focusing lens relative to the sample until the spectrometer output indicates a maximum or near maximum intensity resulting from a laser output focused to a spot on the sample.
Abstract translation: 分析系统包括可移动聚焦透镜，具有指向聚焦透镜的输出的激光器（通常是眼睛安全激光器）以及从样本输出强度数据的光谱仪。 控制器系统响应于光谱仪并且被配置为激励激光器，处理光谱仪的输出，并且调整聚焦透镜相对于样品的位置，直到光谱仪输出指示由激光产生的最大或接近最大强度 输出集中在样品上的一个点。
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10.发明申请DEFECT DETECTION METHOD AND DEFECT DETECTION DEVICE AND DEFECT OBSERVATION DEVICE PROVIDED WITH SAME 审中-公开缺陷检测方法和缺陷检测装置和缺陷检测装置公开(公告)号：US20160069816A1
公开(公告)日：2016-03-10
申请号：US14942124
申请日：2015-11-16
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
CPC classification number: G01N21/8806 , G01N21/21 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/8848 , G01N2201/06113 , G01N2201/063
Abstract: The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.
Abstract translation: 所公开的使用电子显微镜等精细观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的装置可以将观察到的缺陷可靠地插入电子显微镜领域或 喜欢，可以是一个规模较小的设备。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜具有结合重新检测缺陷的最佳显微镜的结构，并且将空间滤光器和分布偏振元件插入瞳孔 当使用该光学显微镜进行暗视场观察时。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜具有包含重新检测缺陷的最佳显微镜的结构，并且当制作暗色检测装置时，将分布滤光片插入瞳孔平面， 使用该光学显微镜进行现场观察。
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