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公开(公告)号：US12068145B2
公开(公告)日：2024-08-20
申请号：US17225871
申请日：2021-04-08
Applicant: Thermo Fisher Scientific (Bremen) GmbH
Inventor： Ayrat Murtazin
CPC classification number: H01J49/045 , G01J3/0267 , G01J3/443 , H01J49/0409 , H01J49/0454
Abstract: A liquid sample introduction system for a plasma spectrometer includes a sample container for holding a liquid sample, a surface acoustic wave (SAW) nebulizer, arranged to receive a liquid sample from the sample container, an electronic controller for supplying electrical power to the SAW nebulizer so as to produce a surface acoustic wave on a surface of the SAW nebulizer, for generating an aerosol from the supplied sample liquid, and an aerosol transport arrangement for receiving the aerosol from the SAW nebulizer and carrying it into a plasma or flame of a spectrometer. The electronic controller is further configured to control the electrical power to the SAW nebulizer so as to permit adjustment of the aerosol parameters, and to control the aerosol transport arrangement so as to permit adjustment of the aerosol delivery into the plasma or flame of the spectrometer.
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公开(公告)号：US12050181B2
公开(公告)日：2024-07-30
申请号：US17780076
申请日：2020-11-03
Applicant: THERMO FISHER SCIENTIFIC (ECUBLENS) SARL
Inventor： Patrick Lancuba
CPC classification number: G01N21/718 , G01J3/0208 , G01J3/443
Abstract: A method for controlling the flow of gas through a spectrometer, comprising: flowing a gas through a volume of the spectrometer, the volume being a volume through which light from a sample passes along a first path to reach a first detector and the gas being transparent to the light in a spectral region analysed by the spectrometer; transmitting light from a light source along a second path through the gas to a second detector; detecting an intensity of the light from the light source at the second detector at one or more wavelengths of the light; comparing the detected intensity of the light to a respective setpoint corresponding to a desired transmittance of the gas in the volume of the spectrometer and generating at least one error signal based on the comparison; and adjusting a flow rate of the gas through the volume of the spectrometer based on the error signal, in particular to minimise the difference between the detected intensity and setpoint.
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公开(公告)号：US20240125649A1
公开(公告)日：2024-04-18
申请号：US18365821
申请日：2023-08-04
Applicant: California Institute of Technology
Inventor： Seyedeh Sona Hosseini
CPC classification number: G01J3/0256 , G01J3/0202 , G01J3/0208 , G01J3/0272 , G01J3/0291 , G01J3/443
Abstract: Ultra-miniature spatial heterodyne spectrometers (SHSs) are presented. Ultra-miniature SHSs in accordance with the invention, comprise a beam-splitter and gratings configured to generate a fringe pattern for spectroscopic detection. Many embodiments include input optics and a sensor and are configured in a way to omit collimating optics and imaging optics from the SHS. Compared to conventional SHSs known in the art, the present invention enables fewer parts, significantly smaller and lighter SHSs, are more efficient and robust, and require less maintenance. Many embodiments are field-deployable, in that such embodiments can be deployed for hand held use in real-world or remote activities outside of research or diagnostic facilities.
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公开(公告)号：US11879850B2
公开(公告)日：2024-01-23
申请号：US17381939
申请日：2021-07-21
Applicant: Elemental Scientific, Inc.
Inventor： Daniel R. Wiederin , Ross Coenen , Mark Casper
CPC classification number: G01N21/718 , G01J3/443 , H01J49/105 , G01N2201/06113
Abstract: Systems and methods are described for providing a representative, homogeneous, and planarized target for solid sample laser ablation. A method embodiment includes, but is not limited to, removing portions of a solid sample with an abrasive sampling system, the abrasive sampling system including at least one of a plurality of abrasive particles configured to hold the portions of the solid sample on an abrasive substrate between the abrasive particles or a texturized surface configured to hold the portions of the solid sample on the texturized surface; transferring the abrasive sampling system holding the portions of the solid sample to a laser ablation system; and ablating the portions of the solid sample held by the abrasive sampling system with the laser ablation system.
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公开(公告)号：US11862442B2
公开(公告)日：2024-01-02
申请号：US16412818
申请日：2019-05-15
Inventor： Il Gu Yun
CPC classification number: H01J37/32944 , G01J1/44 , G01J3/443 , H01L21/67253 , H01J2237/24507
Abstract: A plasma process monitoring device capable of monitoring plasma light distributed in a certain area in a chamber includes a selection area light transmitter and a monitor. The selection area light transmitter is disposed to face a viewport formed in a chamber and includes a plurality of selective light blockers for selectively blocking plasma light emitted through the viewport. The monitor receives plasma light transmitted through at least one of a plurality of selective light blockers to acquire information on the plasma light, and monitors the uniformity of plasma generated in the chamber based on the information on the plasma light.
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Patent Agency Ranking
公开(公告)号：US20230317435A1
公开(公告)日：2023-10-05
申请号：US18113158
申请日：2023-02-23
Applicant: SEMES CO., LTD.
Inventor： Sunjoo PARK , Hyunjong SHIM , Sangmin MUN , Kyungseok MIN , Hwan JUNG , Nayeon LEE
CPC classification number: H01J37/32807 , H01J37/32724 , G01J3/443 , H01J37/32862 , H01L21/3065
Abstract: Provided is a substrate processing apparatus including a chamber having a processing space therein, a supporting unit arranged in the processing space, having a substrate located thereon, and including a label material layer including a label material therein, a plasma source configured to generate plasma from a processing gas in the processing space, and a measurement apparatus configured to detect the label material, wherein, when the supporting unit is etched to a depth that is greater than or equal to a first depth, the label material layer is exposed.
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公开(公告)号：US11692940B2
公开(公告)日：2023-07-04
申请号：US17259937
申请日：2019-07-31
Inventor： Rui Miguel Da Costa Martins , Pedro Alberto Da Silva Jorge , Eduardo Alexander Pereira Silva , José Miguel Soares De Almeida , Alfredo Manuel De Oliveira Martins
CPC classification number: G01N21/718 , G01J3/443
Abstract: The present invention is enclosed in the area of machine learning, in particular machine learning for the analysis of High or Super-resolution spectroscopic data, which typically comprises analysis of highly complex samples/mixtures of substances and/or data with low resolution, for instance Laser-Induced Breakdown Spectroscopy (LIBS). It is an object of the present invention a method of computational self-learning for characterization of one or more constituents in a sample, from electromagnetic spectral information of such sample, which changes the paradigm associated with prior art methods, by using only sub-optical spectral information, i.e., obtaining the resolution of the spectral information and thereby be able to extract spectral lines—thus determining a spectral line position—from such spectral information, hence avoiding all the uncertainty associated with pixel based methods. It is also an object of the present invention a computational apparatus configured to implement such method.
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8.发明申请公开(公告)号：US20190246908A1
公开(公告)日：2019-08-15
申请号：US16101928
申请日：2018-08-13
Applicant: Speclipse, Inc.
Inventor： Sung Hyun PYUN , Wanki MIN
CPC classification number: A61B5/0084 , A61B5/0075 , A61B5/414 , A61B5/444 , G01J3/0218 , G01J3/443 , G01N21/718 , G16H50/20
Abstract: According to an embodiment of the present disclosure, there is provided a laser spectroscopy-based independent device, including: a spectrometer configured to measure a spectrum of generated light which is generated by a laser projected onto a sample; and a disease analysis module configured to determine whether there is lesion tissue by applying a lesion tissue detection learning model to a result of non-discrete spectrum measurement, which is measured by the spectrometer, wherein the spectrometer is configured to measure spectra of all generated light that is generated from a time when the laser is projected onto the sample.
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公开(公告)号：US20190221407A1
公开(公告)日：2019-07-18
申请号：US16123208
申请日：2018-09-06
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Shota UMEDA , Keita NOGI , Akira KAGOSHIMA , Daisuke SHIRAISHI
CPC classification number: H01J37/32926 , G01J3/443 , H01J37/32972 , H01L21/67253
Abstract: Provided is a plasma processing apparatus including a processing unit in which a sample is plasma processed and which includes a monitor (optical emission spectroscopy) that monitors light emission of plasma, wherein the processing unit includes a prediction model storage unit that stores a prediction model predicting a plasma processing result, and a control device in which the plasma processing result is predicted by using a prediction model selected based on light emission data and device data as an indicator of state change of the processing unit.
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公开(公告)号：US20190206663A1
公开(公告)日：2019-07-04
申请号：US16234935
申请日：2018-12-28
Applicant: Elemental Scientific, Inc.
Inventor： Daniel R. Wiederin , Kyle W. Uhlmeyer , Michael P. Field , Jae Seok Lee
CPC classification number: H01J49/0009 , G01J3/443 , G01J2003/2866 , H01J49/0031 , H01J49/105 , H01J49/26
Abstract: Systems and methods are described for calibrating an analytical instrument analyzing a plurality of sample matrices in series. A system embodiment can include, but is not limited to, a sample analysis device configured to receive a plurality of samples from a plurality of remote sampling systems and to determine an intensity of one or more species of interest contained in each of the plurality of samples; and a controller configured to generate a primary calibration curve based on analysis of a first standard solution having a first sample matrix by the sample analysis device and generate at least one secondary calibration curve based on analysis of a second standard solution having a second sample matrix by the sample analysis device, the controller configured to associate the at least one secondary calibration curve with the primary calibration curve according to a matrix correction factor.
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