Structure of connection between optical unit and optical path tube

    公开(公告)号:US10481354B2

    公开(公告)日:2019-11-19

    申请号:US16055243

    申请日:2018-08-06

    Abstract: An optical unit and an optical path tube are easily connected. A structure of connection between a side surface (1a) of the optical unit and the optical path tube includes: an extensible tube (72) constituting at least a part of the optical path tube, the extensible tube being extensible in a tube axis direction; a flange (26) attached to one end of the optical path tube; a flange receiving part (20) provided on the optical unit, the flange receiving part (20) receiving a front surface (26a) of the flange (26), the front surface (26a) of the flange (26) being an end surface on an open side; and a biasing part (23, 72) configured to bias at least a part of the optical path tube in a direction in which the extensible tube (72) extends.

    LASER APPARATUS
    93.
    发明申请
    LASER APPARATUS 审中-公开

    公开(公告)号:US20190334311A1

    公开(公告)日:2019-10-31

    申请号:US16507075

    申请日:2019-07-10

    Inventor: Hiroaki HAMANO

    Abstract: A laser apparatus includes: a master oscillator for emitting a laser beam; an amplifier on an optical path of the laser beam; a beam splitter between the master oscillator and the amplifier for separating, from the optical path of the laser beam, at least part of a return beam traveling through the optical path of the laser beam in a direction opposite to a traveling direction of the laser beam; a focusing optical system for focusing the return beam separated from the optical path; and an optical sensor having a light receiving surface for the return beam for detecting information on power of the return beam entering the light receiving surface through the focusing optical system, the light receiving surface being arranged at a position different from a focusing position of the focusing optical system on the optical path of the return beam.

    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    94.
    发明申请

    公开(公告)号:US20190313519A1

    公开(公告)日:2019-10-10

    申请号:US16434196

    申请日:2019-06-07

    Abstract: An extreme ultraviolet light generation system includes: a target supply unit configured to output a target toward a predetermined region; a drive laser configured to output a drive laser beam in a first duration; a guide laser configured to output a guide laser beam; a beam combiner configured to substantially align the optical path axes of the drive and guide laser beams and output the laser beams; a laser beam focusing optical system configured to focus the laser beams output from the beam combiner to the predetermined region; an actuator configured to change the focusing positions of the laser beams through the laser beam focusing optical system; an optical sensor configured to detect reflected light of the guide laser beam from the target; and a control unit configured to control the actuator so that the light amount of the reflected light thus detected increases in a second duration.

    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    96.
    发明申请

    公开(公告)号:US20190289707A1

    公开(公告)日:2019-09-19

    申请号:US16434197

    申请日:2019-06-07

    Abstract: An EUV light generation system includes: a target supply unit; a prepulse laser that outputs a prepulse laser beam; a main pulse laser that outputs a main pulse laser; a light focusing optical system that focuses the prepulse and main pulse laser beams on a predetermined region; an actuator that changes a focusing position of the prepulse laser beam by the light focusing optical system; a first sensor that captures an image of a target; and a control unit that stores a reference position of the actuator, calculates a predetermined parameter on the target after irradiation with the prepulse laser beam and before irradiation with the main pulse laser beam based on image data obtained from the first sensor, and controls the actuator to approach the reference position if the predetermined parameter does not satisfy a first condition.

    LASER PROCESSING SYSTEM AND LASER PROCESSING METHOD

    公开(公告)号:US20190283177A1

    公开(公告)日:2019-09-19

    申请号:US16429091

    申请日:2019-06-03

    Abstract: A laser processing system includes a wavelength tunable laser apparatus capable of changing the wavelength of pulsed laser light to be outputted, an optical system irradiating a workpiece with the pulsed laser light, a reference wavelength acquisition section acquiring a reference wavelength corresponding to photon absorption according to the material of the workpiece, a laser processing controller controlling the wavelength tunable laser apparatus to perform preprocessing before final processing performed on the workpiece, changes the wavelength of the pulsed laser light over a predetermined range containing the reference wavelength, and performs wavelength search preprocessing at a plurality of wavelengths, a processed state measurer measuring a processed state on a wavelength basis achieved by the wavelength search preprocessing performed at the plurality of wavelengths, and an optimum wavelength determination section assessing the processed state on a wavelength basis to determine an optimum wavelength used in the final processing.

    LASER DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE

    公开(公告)号:US20190239330A1

    公开(公告)日:2019-08-01

    申请号:US16379511

    申请日:2019-04-09

    Inventor: Motoki NIWANO

    Abstract: A laser device includes: a master oscillator (100) configured to output a pulse laser beam (L) based on a light emission trigger signal (S21); a delay circuit (153) configured to generate a switching signal (S10) after a predetermined delay time has elapsed since reception of the light emission trigger signal (S21); a high voltage switch (304) configured to generate a high voltage pulse based on the switching signal (S10); an optical shutter (32k) positioned on the optical path of the pulse laser beam (L) and driven based on the high voltage pulse; and a high voltage monitor (151) configured to detect the high voltage pulse and transmit a high voltage pulse sensing signal (S6) to the delay circuit (153). The delay circuit (153) determines the delay time based on the light emission trigger signal (S21) and the high voltage pulse sensing signal (S6).

    Target storage device
    99.
    发明授权

    公开(公告)号:US10349508B2

    公开(公告)日:2019-07-09

    申请号:US15888111

    申请日:2018-02-05

    Abstract: A target storage device may include a tank configured to store a target that generates extreme ultraviolet light when being irradiated with laser light, a heater connected with the tank and configured to heat the tank, and a radiation member disposed to cover at least a part of the tank connected with the heater and configured to reflect heat radiation from the tank and the heater toward the tank.

    LASER APPARATUS
    100.
    发明申请
    LASER APPARATUS 审中-公开

    公开(公告)号:US20190173259A1

    公开(公告)日:2019-06-06

    申请号:US16266189

    申请日:2019-02-04

    Abstract: A laser apparatus includes a chamber accommodating a pair of discharge electrodes, a gas supply and exhaust device configured to supply laser gas to an interior of the chamber and exhaust laser gas from the interior of the chamber, and a controller. The controller performs first control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber at every first number of pulses or first elapsed time, and second control to control the gas supply and exhaust device so as to suspend laser oscillation and replace laser gas in the chamber before the first control at every second number of pulses less than the first number of pulses or second elapsed time less than the first elapsed time.

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