Abstract:
A method for inspecting a surface of a workpiece for asymmetric defects, by scanning an incident beam on the surface of the workpiece to impinge thereon to create reflected light extending along a light channel axis in a front quartersphere and scattered light, the incident beam and the light channel axis defining an incident plane, collecting the scattered light at a plurality of collectors disposed above the surface at defined locations such that scatter from asymmetric defects is collectable by at least one collector, detecting collector output and generating signals in response, and processing the signals associated with each collector individually to obtain information about asymmetric defects.
Abstract:
A method and an apparatus for precisely detecting a trench S in a product W to become a thin film solar cell are provided. In the product W, a lower electrode layer 12, in which the trench S is created, and light absorbing layers 13 and 14 are layered on a substrate 11 in this order. The method includes the steps of: detecting infrared rays for imaging, of which the wavelengths are in such a range that can transmit through the light absorbing layers 13 and 14 and which are irradiated from the product W, by means of an infrared ray imaging apparatus 16 that is provided above the light absorbing layers 13 and 14 so that image data for radiation intensity distribution can be taken; and detecting the trench S in the lower electrode layer 12 on the basis of this image data for radiation intensity distribution.
Abstract:
An apparatus for obtaining suspended particle information includes an optical array to divide light to a first path and a second path, a platform to orient a first and second container with either the first or second path, and a first and second photodetector to receive at least a direct illuminating component of the light of the first and second path after said light penetrates through the first and second container. A detector interface receives transmission signals from the first and second photodetectors of the direct illuminating component of the light after penetrating through the first and second container and a calculation engine computes the particle information based on a ratio of the received transmission signals.
Abstract:
An apparatus for detecting matter, the apparatus including: a first light source adapted to emit a first light beam; a second light source adapted to emit a second light beam, wherein the apparatus is arranged such that the first and second light beams converge towards a scanning element; the scanning element adapted to redirect the converging first and second light beams towards the matter to be detected; and a detector adapted to receive light reflected by the matter via the scanning element. Also, a system and method of detecting matter.
Abstract:
The present invention relates to systems and methods for quantitative three-dimensional mapping of refractive index in living or non-living cells, tissues, or organisms using a phase-shifting laser interferometric microscope with variable illumination angle. A preferred embodiment provides tomographic imaging of cells and multicellular organisms, and time-dependent changes in cell structure and the quantitative characterization of specimen-induced aberrations in high-resolution microscopy with multiple applications in tissue light scattering.
Abstract:
A method for inspecting a surface of a workpiece for asymmetric defects, by scanning an incident beam on the surface of the workpiece to impinge thereon to create reflected light extending along a light channel axis in a front quartersphere and scattered light, the incident beam and the light channel axis defining an incident plane, collecting the scattered light at a plurality of collectors disposed above the surface at defined locations such that scatter from asymmetric defects is collectable by at least one collector, detecting collector output and generating signals in response, and processing the signals associated with each collector individually to obtain information about asymmetric defects.
Abstract:
Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
Abstract:
A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. Certain of these components, most notably the beam source subsystem, the beam scanning subsystem and the optical collection and detection subsystem are modular for ready field replacement and/or maintenance. The optical collection and detection system features wing collectors in the front quartersphere and back collectors in the back quartersphere for collected light scattered from the surface of the workpiece. This can greatly improve the measurement capabilities of the system. Also included is a method for detecting asymmetric defects using the wing collectors and back collectors.
Abstract:
A surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The optical collection and detection system features back collectors disposed in the back quartersphere, outside the incident plane, for collecting light scattered from the surface of the workpiece. The back collectors are disposed at a relative minimum in the portion of scattered light attributable to haze relative to the portion of scattered light attributable to defect scatter portion, or, alternatively, at a relative minimum in the Rayleigh scatter.
Abstract:
A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The system features a variable polarization a polarizing relay assembly arranged to selectively permit the scattered light having a selected polarization orientation to pass along a detector optical axis to a light detection unit in the detection subsystem. The system also features a collector output width varying subsystem for varying the width of an output slit in response to changes in the location of the location scanned on the workpiece.