公开(公告)号：US20110128519A1

公开(公告)日：2011-06-02

申请号：US12788903

申请日：2010-05-27

Applicant: Wouter Anthon SOÉR ,  Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Kurt GIELISSEN ,  Martin Jacobus Johan JAK

Inventor： Wouter Anthon SOÉR ,  Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Kurt GIELISSEN ,  Martin Jacobus Johan JAK

IPC: G03B27/54 ,  G21K5/00

CPC classification number: H05G2/001 ,  G03F7/70033 ,  G03F7/70858 ,  G21K2201/06

Abstract: A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.

Abstract translation: 辐射源可以包括用于发射辐射的辐射发射器，用于收集由辐射发射器发射的辐射的收集器以及在使用中被配置成将冷却的气体引入到辐射源中的出口。

公开(公告)号：US20100014641A1

公开(公告)日：2010-01-21

申请号：US12505012

申请日：2009-07-17

Applicant: Stephen F. Horne ,  Michael J. Roderick

Inventor： Stephen F. Horne ,  Michael J. Roderick

IPC: G21K1/00 ,  B23Q7/00

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067 ,  Y10T29/49998

Abstract: Described are optical apparatuses and methods for forming optical apparatuses. The optical apparatus includes a plurality of individually fabricated segments and a holder. Each of the plurality of individually fabricated segments include an inner annular surface and an outer contact surface opposite to the inner annular surface. Each of the inner annular reflecting surfaces define a longitudinal segment axis. The holder contacts each of the outer contact surfaces of the plurality of individually fabricated segments. Each of the longitudinal segment axes of the plurality of individually fabricated segments are linearly aligned.

Abstract translation: 描述了用于形成光学装置的光学装置和方法。 该光学装置包括多个单独制造的片段和一个保持器。 多个单独制造的片段中的每一个包括内环形表面和与内环形表面相对的外接触表面。 每个内环形反射表面限定纵向段轴线。 保持器接触多个单独制造的段的每个外接触表面。 多个单独制造的段的每个纵向段轴线是线性对准的。

公开(公告)号：US20090296889A1

公开(公告)日：2009-12-03

申请号：US12130574

申请日：2008-05-30

Applicant: Licai Jiang

Inventor： Licai Jiang

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: An x-ray optical system for producing high intensity x-ray beams. The system includes an optic with a surface formed by revolving a defined contour around a revolving axis that is different than the geometric symmetric axis of the optic. Accordingly, the system may use a source that has a circular emission profile or a large source to provide increased flux to a sample.

Abstract translation: 一种用于产生高强度X射线束的X射线光学系统。 该系统包括具有通过围绕不同于光学器件的几何对称轴线的旋转轴线旋转限定轮廓而形成的表面的光学元件。 因此，系统可以使用具有圆形发射轮廓或大的源的源来向样品提供增加的通量。

公开(公告)号：US20090060134A1

公开(公告)日：2009-03-05

申请号：US11985649

申请日：2007-11-17

Applicant: Michael Keith Fuller

Inventor： Michael Keith Fuller

IPC: G21K1/06

CPC classification number: G01N23/223 ,  A61B6/00 ,  A61B6/4092 ,  A61B6/482 ,  A61B6/484 ,  G01N23/04 ,  G01N2223/076 ,  G21K2201/06

Abstract: A system for observing the internal features of an object, such that the object's internal absorption, refraction, reflection and/or scattering properties are visualized, is disclosed. An embodiment may include one or more beams of penetrating radiation, an object with internal features to be imaged, a single or an array of radiation optics, and a detection system for capturing the resultant shadowgraph images. The beam(s) of radiation transmitted through the object typically originate from a line-shaped source(s), which has high spatial purity along the narrow axis, and low spatial purity in the perpendicular, long axis. In the long axis, radiation optic(s) capture and focus diverging rays exiting from the object to form a high resolution image of the object, without which optic(s) the shadowgraph would have blurring in this axis. Such shadowgraph is naturally well defined in the opposite axis of narrow beam origin and can reveal an object's refraction, reflection and/or scattering properties along that axis. An embodiment may also include discriminators (stops, phase shifters, analyzer crystals, etc.) in the beam exiting the object. An embodiment may also include mechanisms for scanning whereby a two-dimensional or three-dimensional image of a large object is made possible. An embodiment may also include an image of an object's internal features being derived from an analysis of the radiation and/or radiation waveform exiting the object.

Abstract translation: 公开了一种用于观察物体的内部特征的系统，使得物体的内部吸收，折射，反射和/或散射特性被可视化。 一个实施例可以包括一个或多个穿透辐射束，具有要成像的内部特征的物体，单个或一组辐射光学器件，以及用于捕获所得到的阴影图像的检测系统。 透过物体的辐射束通常来源于沿着窄轴具有高空间纯度和垂直长轴的空间纯度低的线状源。 在长轴上，辐射光学器件捕获并聚焦从物体出射的发散光线，以形成物体的高分辨率图像，而没有这些光学元件的阴影图将在该轴上具有模糊。 这样的阴影图自然界定在窄波束起源的相反轴线上，并且可以沿着该轴显示物体的折射，反射和/或散射特性。 实施例还可以包括离开物体的光束中的鉴别器（停止点，移相器，分析器晶体等）。 一个实施例还可以包括用于扫描的机构，从而可以实现大对象的二维或三维图像。 实施例还可以包括物体的内部特征的图像，其从离开物体的辐射和/或辐射波形的分析得到。

公开(公告)号：US20070236815A1

公开(公告)日：2007-10-11

申请号：US11723554

申请日：2007-03-21

Applicant: Gerd Wings ,  Christian Hoffmann ,  Klaus Wulf ,  Carsten Michaelsen

Inventor： Gerd Wings ,  Christian Hoffmann ,  Klaus Wulf ,  Carsten Michaelsen

IPC: G02B7/02

CPC classification number: G02B7/1824 ,  G21K2201/06

Abstract: A device for adjusting optical elements, in particular, for X-ray analysis, comprising a holding device (2) for receiving the optical element and at least two adjusting units at least one of the two longitudinal ends of the holding device (2), wherein the adjusting units each comprise one plunger (6, 6a, 6b, 6c, 6d), characterized in that each adjusting unit comprises a rotatably disposed adjusting ring (4, 4a, 4b, 4c, 4d) with an eccentric recess, and the optical element is mechanically coupled to the inner surfaces (7) of the adjusting rings (4, 4a, 4b, 4c, 4d) via the plungers (6, 6a, 6b, 6c, 6d). The adjusting device is compact, can be flexibly used and provides simple adjustment of the optical element.

Abstract translation: 一种用于调整光学元件的装置，特别是用于X射线分析的装置，包括用于容纳光学元件的保持装置（2）和保持装置（2）的两个纵向端部中的至少一个的至少两个调节单元， 其特征在于，每个调节单元包括可旋转地布置的调节环（4,4a，4b，4c，4c），所述调节单元 ），并且所述光学元件经由所述柱塞（6,6a，6b）被机械联接到所述调节环（4,4a，4b，4c，4c）的内表面（7） ，6c，6d）。 调节装置紧凑，可灵活使用，并提供光学元件的简单调整。

公开(公告)号：US20070187627A1

公开(公告)日：2007-08-16

申请号：US11705954

申请日：2007-02-13

Applicant: Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov

Inventor： Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov

IPC: G01J3/10

CPC classification number: B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Abstract translation: 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

公开(公告)号：US20070053487A1

公开(公告)日：2007-03-08

申请号：US11510615

申请日：2006-08-28

Applicant: Kwon-ha Yoon ,  Kyong-woo Kim

Inventor： Kwon-ha Yoon ,  Kyong-woo Kim

IPC: G21K7/00

CPC classification number: G21K7/00 ,  G21K2201/06 ,  H05G2/008

Abstract: A soft X-ray microscope includes a table (10); a housing (20) installed to the upper side of the table (10) and having a partition (22); a light source chamber (30) installed lower than the partition (22) of the housing (20) to project a light to liquid jetted under a high pressure to generate plasma; a mirror chamber (40), installed above the partition (22) of the housing (20), in which first and second mirror (410 and 430) are respectively installed to upper and lower sides of a holder (420) for storing a living sample, the soft X-ray generated by the plasma generated in the light source chamber (30) illuminates the living sample, and the soft X-ray penetrated the living sample is amplified to obtain an image in an image capturing chamber; and an image capturing chamber (50) installed to the upper side of the housing (20) to amplify a light image signal amplified through the mirror chamber (40) and to capture the light image on an external screen to allow distinguishing the light image from exterior.

Abstract translation: 软X射线显微镜包括台（10）; 安装在所述工作台（10）的上侧并具有隔板（22）的壳体（20）; 光源室（30），其安装在所述壳体（20）的隔板（22）的下方，以将在高压下喷射的液体投射到液体中以产生等离子体; 安装在所述壳体（20）的隔板（22）上方的反射镜室（40），其中第一和第二反射镜（410和430）分别安装在用于储存活体的保持器（420）的上侧和下侧 样品中，由光源室（30）中产生的等离子体产生的软X射线照射活体样品，并且穿透活体样品的软X射线被放大，以在摄像室中获得图像; 以及安装到所述壳体（20）的上侧的图像捕获室（50），用于放大通过所述镜室（40）放大的光图像信号，并将所述光图像捕获到外部屏幕上以允许将所述光图像与 外观。

公开(公告)号：US20070030948A1

公开(公告)日：2007-02-08

申请号：US11581053

申请日：2006-10-13

Applicant: Wolfgang Singer ,  Joachim Hainz ,  Hans-Joachim Frasch ,  Johannes Wangler ,  Joachim Wietzorrek ,  Jorg Schultz

Inventor： Wolfgang Singer ,  Joachim Hainz ,  Hans-Joachim Frasch ,  Johannes Wangler ,  Joachim Wietzorrek ,  Jorg Schultz

IPC: G21K5/00

CPC classification number: G03F7/7015 ,  G03F7/70083 ,  G21K2201/06

Abstract: This invention relates to an illumination system for scanning lithography especially for wavelengths ≦193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in that at least one of the field mirror(s) or the field lens(es) has (have) an aspheric shape.

Abstract translation: 本发明涉及一种用于扫描光刻的照明系统，特别是用于照射狭缝的波长<= 193nm，特别是EUV光刻，其包括至少一个场反射镜或至少一个场透镜，其特征在于，至少一个 场反射镜或场透镜具有非球面形状。

公开(公告)号：US20070019310A1

公开(公告)日：2007-01-25

申请号：US10563701

申请日：2004-07-08

Applicant: Andreas Seifert ,  Frank Melzer ,  Andreas Heisler ,  Heinz Mann ,  Gerhard Romeyn

Inventor： Andreas Seifert ,  Frank Melzer ,  Andreas Heisler ,  Heinz Mann ,  Gerhard Romeyn

IPC: G02B5/08

CPC classification number: G03F7/70075 ,  G02B5/08 ,  G02B5/09 ,  G03F7/70141 ,  G03F7/702 ,  G03F7/70825 ,  G21K2201/06

Abstract: In a method for producing mirror facets (1) for facet mirrors in illuminating devices or projection exposure machines in microlithography by using radiation in the extreme ultraviolet range, individual tilting angles are recessed into an optical surface (2) of the mirror facet (1), preferably a surface with tilting angles relative to a reference surface of the mirror facet (1) is machined into or on said optical surface.

Abstract translation: 在通过使用在极紫外线范围内的辐射的微照相中的用于在照明装置或投影曝光机中制造用于刻面镜的镜面（1）的方法中，各个倾斜角度凹入到镜面（1）的光学表面（2）中， 优选地，相对于镜面（1）的参考表面具有倾斜角度的表面被加工到所述光学表面中或所述光学表面上。

公开(公告)号：US20070018122A1

公开(公告)日：2007-01-25

申请号：US11512822

申请日：2006-08-30

Applicant: Alexander Ershov ,  William Partlo

Inventor： Alexander Ershov ,  William Partlo

IPC: G01J3/10

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.