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    X-ray optical apparatus
    91.
    发明授权
    X-ray optical apparatus 有权
    X射线光学装置

    公开(公告)号：US09020102B2

    公开(公告)日：2015-04-28

    申请号：US13778780

    申请日：2013-02-27

    Applicant: Canon Kabushiki Kaisha

    Inventor： Mitsuaki Amemiya ,  Ichiro Nomura ,  Takeo Tsukamoto ,  Akira Miyake

    IPC: G21K1/06

    CPC classification number: G21K1/06 ,  G21K2201/064

    Abstract: The present invention provides an X-ray optical apparatus including an X-ray reflective structure in which at least three reflective substrates are arranged with an interval and an X-ray which is incident into a plurality of X-ray passages whose both sides are put between the reflective substrates is reflected from the reflective substrate at both sides of the X-ray passage to be parallelized and emitted from the X-ray passage. When an edge of the X-ray reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet. Therefore, it is possible to efficiently parallelize the incident X-ray to be emitted with a simple structure.

    Abstract translation: 本发明提供了一种X射线光学装置，其包括X射线反射结构，其中至少三个反射基板间隔布置，并且X射线入射到放置在其两侧的多个X射线通道中 反射基板之间的反射基板在X射线通道的两侧被反射，以被平行化并从X射线通道发射。 当X射线反射结构的边缘是X射线的入口并且另一边缘是X射线的出口时，出口处的反射基板的间距大于入口处的间距。 因此，能够以简单的结构高效地并行化待发射的X射线。

    COLOR X-RAY HISTOLOGY FOR MULTI-STAINED BIOLOGIC SAMPLE
    92.
    发明申请
    COLOR X-RAY HISTOLOGY FOR MULTI-STAINED BIOLOGIC SAMPLE 有权
    多色生物样品的颜色X射线分类

    公开(公告)号：US20140301528A1

    公开(公告)日：2014-10-09

    申请号：US14354855

    申请日：2012-10-29

    Applicant: THE UNIVERSITY OF CHICAGO

    Inventor： Patrick La Riviere

    IPC: G01N23/04

    CPC classification number: G01N23/04 ,  A61B6/032 ,  A61B6/482 ,  A61B6/508 ,  B82Y10/00 ,  G01N23/046 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/0766 ,  G01N2223/6126 ,  G06T19/00 ,  G06T2210/41 ,  G21K2201/061 ,  G21K2201/064

    Abstract: Systems and methods are provided for staining tissue with multiple biologically specific heavy metal stains and then performing X-ray imaging, either in projection or tomography modes, using either a plurality of illumination energies or an energy sensitive detection scheme. The resulting energy-weighted measurements can then be used to decompose the resulting images into quantitative images of the distribution of stains. The decomposed images may be false-colored and recombined to make virtual X-ray histology images. The techniques thereby allow for effective differentiation between two or more X-ray dyes, which had previously been unattainable in 3D imaging, particularly 3D imaging of features at the micron resolution scale. While techniques are described in certain example implementations, such as with microtomography, the techniques are scalable to larger fields of view, allowing for use in 3D color, X-ray virtual histology of pathology specimens.

    Abstract translation: 提供了用多个生物特异性重金属染色染色组织的系统和方法，然后使用多个照明能量或能量敏感检测方案，以投影或断层摄影模式进行X射线成像。 然后，所得到的能量加权测量可用于将所得图像分解成污渍分布的定量图像。 分解图像可能是假色的并重新组合以制作虚拟X射线组织学图像。 因此，这些技术允许两种或多种X射线染料之间的有效区分，其先前在3D成像中是不可实现的，特别是在微米分辨率刻度上的特征的3D成像。 虽然技术在某些示例实现中被描述，例如利用微影像技术，但是这些技术可扩展到更大的视野，允许在3D颜色，病理标本的X射线虚拟组织学中使用。

    X-ray reflecting device
    93.
    发明授权
    X-ray reflecting device 有权
    X射线反射装置

    公开(公告)号：US08824631B2

    公开(公告)日：2014-09-02

    申请号：US13008866

    申请日：2011-01-18

    Applicant: Kazuhisa Mitsuda ,  Manabu Ishida ,  Yuichiro Ezoe ,  Kazuo Nakajima

    Inventor： Kazuhisa Mitsuda ,  Manabu Ishida ,  Yuichiro Ezoe ,  Kazuo Nakajima

    IPC: G21K1/06

    CPC classification number: G21K1/067 ,  G21K2201/062 ,  G21K2201/064

    Abstract: Provided is a technique for X-ray reflection, such as an X-ray reflecting mirror, capable of achieving a high degree of smoothness of a reflecting surface, high focusing (reflecting) performance, stability in a curved surface shape, and a reduction in overall weight. A silicon plate (silicon wafer) is subjected to thermal plastic deformation to form an X-ray reflecting mirror having a reflecting surface with a stable curved surface shape. The silicon wafer can be deformed to any shape by applying a pressure thereto in a hydrogen atmosphere at a high temperature of about 1300° C. The silicon plate may be simultaneously subjected to hydrogen annealing to further reduce roughness of a silicon surface to thereby provide enhanced reflectance.

    Abstract translation: 提供了能够实现反射面的高度平滑度，高聚焦（反射）性能，曲面形状的稳定性以及缩小的X射线反射技术，例如X射线反射镜 总重。 硅板（硅晶片）经受热塑性变形，形成具有稳定曲面形状的反射面的X射线反射镜。 硅晶片可以通过在约1300℃的高温下在氢气氛中施加压力而变形为任何形状。硅板可以同时进行氢退火以进一步降低硅表面的粗糙度，从而提供增强的 反射率。

    METHOD FOR CHARACTERIZATION OF A SPHERICALLY BENT CRYSTAL FOR K-alpha X-RAY IMAGING OF LASER PLASMAS USING A FOCUSING MONOCHROMATOR GEOMETRY
    98.
    发明申请
    METHOD FOR CHARACTERIZATION OF A SPHERICALLY BENT CRYSTAL FOR K-alpha X-RAY IMAGING OF LASER PLASMAS USING A FOCUSING MONOCHROMATOR GEOMETRY 有权
    表征激光等离子体的K-αX射线成像的球形晶体的方法使用聚焦单色子几何

    公开(公告)号：US20130108022A1

    公开(公告)日：2013-05-02

    申请号：US13662038

    申请日：2012-10-26

    Applicant: Lawrence Livermore National Security, LLC

    Inventor： Nathan Kugland ,  Tilo Doeppner ,  Siegfried Glenzer ,  Carmen Constantin ,  Chris Niemann ,  Paul Neumayer

    IPC: G21K1/06

    CPC classification number: G21K1/06 ,  G01N23/2076 ,  G01N2223/331 ,  G21B1/23 ,  G21K2201/062 ,  G21K2201/064

    Abstract: A method is provided for characterizing spectrometric properties (e.g., peak reflectivity, reflection curve width, and Bragg angle offset) of the Kα emission line reflected narrowly off angle of the direct reflection of a bent crystal and in particular of a spherically bent quartz 200 crystal by analyzing the off-angle x-ray emission from a stronger emission line reflected at angles far from normal incidence. The bent quartz crystal can therefore accurately image argon Kα x-rays at near-normal incidence (Bragg angle of approximately 81 degrees). The method is useful for in-situ calibration of instruments employing the crystal as a grating by first operating the crystal as a high throughput focusing monochromator on the Rowland circle at angles far from normal incidence (Bragg angle approximately 68 degrees) to make a reflection curve with the He-like x-rays such as the He-α emission line observed from a laser-excited plasma.

    Abstract translation: 提供了一种用于表征Kalpha发射线的光谱特性（例如，峰值反射率，反射曲线宽度和布拉格角偏移）的方法，其反映了弯曲晶体的直接反射的窄偏角，特别是反射曲线的石英200晶体 通过分析从远离正常入射角度反射的较强发射线的偏角x射线发射。 因此，弯曲的石英晶体可以以近似法线入射（约为81度的布拉格角）精确地成像氩Kalpha x射线。 该方法对于使用晶体作为光栅的仪器的原位校准是有用的，首先将晶体作为高通量聚焦单色仪在Rowland圆上以远离法向入射角度（布拉格角约68度）进行操作，以形成反射曲线 与He-like x射线如从激光激发等离子体观察到的He-α发射线。

    X-ray convergence element and X-ray irradiation device
    99.
    发明授权
    X-ray convergence element and X-ray irradiation device 有权
    X射线会聚元件和X射线照射装置

    公开(公告)号：US08416921B2

    公开(公告)日：2013-04-09

    申请号：US12280136

    申请日：2007-02-08

    Applicant: Hiromoto Nakazawa ,  Hideki Yoshikawa ,  Aurel-Mihai Vlaicu ,  Kenichi Obori ,  Shintaro Komatani ,  Sumito Ohzawa

    Inventor： Hiromoto Nakazawa ,  Hideki Yoshikawa ,  Aurel-Mihai Vlaicu ,  Kenichi Obori ,  Shintaro Komatani ,  Sumito Ohzawa

    IPC: G21K1/06

    CPC classification number: G21K1/06 ,  G21K2201/064

    Abstract: An X-ray convergence element and an X-ray irradiation device including the X-ray convergence element are provided. The X-ray convergence element can extend a working distance from an exit-side opening end thereof to a specimen, and can perform analysis of the specimen with rough surface, a fluorescent X-ray analysis, and a X-ray diffraction analysis, regardless of a size of the specimen. An X-ray blocking member 23 is provided with three supporting members 233 for supporting the X-ray blocking member 23, which extend from an annular member 232 having approximately the same diameter as a diameter of an entrance-side opening end (outer diameter of a capillary 20) toward the center of the X-ray blocking member 23 to fix the annular member 232 to the capillary 20. The annular member 232, the supporting members 233, and the X-ray blocking member 23 are integrally formed of a metal that shields X-rays, such as tantalum, tungsten, or molybdenum. A dimension of the X-ray blocking member 23 in the axial direction (thickness) is set to be sufficient for blocking X-rays.

    Abstract translation: 提供了包括X射线会聚元件的X射线会聚元件和X射线照射装置。 X射线会聚元件可以将其出口侧开口端的工作距离延伸到试样，并且可以进行具有粗糙表面，荧光X射线分析和X射线衍射分析的样品的分析 的样本大小。 X射线阻挡构件23设置有用于支撑X射线阻挡构件23的三个支撑构件233，其从具有与入口侧开口端的直径大致相同直径的环形构件232延伸（外径 毛细管20）朝向X射线阻挡构件23的中心，以将环形构件232固定到毛细管20.环形构件232，支撑构件233和X射线阻挡构件23由金属 屏蔽X射线，如钽，钨或钼。 X射线阻挡构件23的轴向（厚度）的尺寸被设定为足以阻挡X射线。

    Collector optical system
    100.
    发明授权
    Collector optical system 有权
    收集器光学系统

    公开(公告)号：US08390785B2

    公开(公告)日：2013-03-05

    申请号：US12441343

    申请日：2007-09-03

    Applicant: Fabio E. Zocchi ,  Pietro Binda ,  Enrico Benedetti

    Inventor： Fabio E. Zocchi ,  Pietro Binda ,  Enrico Benedetti

    IPC: G03B27/54 ,  G03B27/42

    CPC classification number: G03F7/70175 ,  B82Y10/00 ,  G02B5/0891 ,  G02B19/0019 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70166 ,  G21K1/06 ,  G21K2201/064

    Abstract: A collector optical system is provided in which radiation is collected from a radiation source and directed to an image focus. The collector optical system includes one or more mirrors, with each mirror being symmetric about an optical axis extending through the radiation source and each mirror having at least first and second reflective surfaces. The first and second reflective surfaces have a common focus, such that radiation from the source undergoes successive grazing incidence reflections at the first and second reflective surface and wherein the common focus is transversely offset by a predetermined distance Δr with respect to the optical axis.

    Abstract translation: 提供收集器光学系统，其中从辐射源收集辐射并引导到图像焦点。 收集器光学系统包括一个或多个反射镜，每个反射镜关于延伸穿过辐射源的光轴对称，并且每个反射镜具有至少第一和第二反射表面。 第一和第二反射表面具有共同的焦点，使得来自源的辐射在第一和第二反射表面处经历连续的掠入射反射，并且其中公共焦点相对于光轴横向偏移预定距离＆Dgr; r 。

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