公开(公告)号：US5557105A

公开(公告)日：1996-09-17

申请号：US320377

申请日：1994-10-11

Applicant: Ichiro Honjo ,  Kenji Sugishima ,  Masaki Yamabe

Inventor： Ichiro Honjo ,  Kenji Sugishima ,  Masaki Yamabe

IPC: H01J37/30 ,  H01J37/06 ,  H01J37/244

CPC classification number: H01J37/04 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3007 ,  H01J2237/04924 ,  H01J2237/062 ,  H01J2237/0635 ,  H01J2237/1205 ,  H01J2237/1504 ,  H01J2237/1516 ,  H01J2237/153 ,  H01J2237/24455 ,  H01J2237/2447 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/2817

Abstract: A pattern inspection apparatus is designed to quickly and accurately perform an inspection of an inspection sample, such as a mask or a wafer or the like by irradiating electron beams onto the inspection sample and detecting secondary or backscattered electrons reflected from the surface of the inspection sample and/or transmitted electrons passing through the inspection sample. The pattern inspection apparatus includes an electron beam generator including at least one electron gun for generating at least one electron beam irradiating onto the surface of the inspection sample. A movable support is provided for supporting the inspection sample. The apparatus also includes a detector unit having a plurality of electron detecting elements for detecting electrons containing information related to the construction of the inspection sample and a detection signal processor for processing simultaneously or in parallel formation the outputs of the electron detecting elements of the detector. Also, when a plurality of electron beams are used for simultaneous irradiation of the inspection sample, the pattern inspection apparatus includes a mechanism for avoiding interference between the reflected electrons of the adjacent electron beams.

Abstract translation: 图案检查装置被设计为通过将电子束照射到检查样品上并检测从检查样品的表面反射的次级或反向散射电子来快速且准确地执行诸如掩模或晶片等的检查样本的检查 和/或穿过检查样品的透射电子。 图案检查装置包括电子束发生器，其包括至少一个电子枪，用于产生照射到检查样品表面上的至少一个电子束。 提供用于支撑检查样品的可移动支撑件。 该装置还包括具有多个电子检测元件的检测器单元，用于检测包含与检查样本的结构有关的信息的电子;以及检测信号处理器，用于同时或并行地形成检测器的电子检测元件的输出。 此外，当使用多个电子束同时照射检查样本时，图案检查装置包括用于避免相邻电子束的反射电子之间的干涉的机构。

公开(公告)号：US5418378A

公开(公告)日：1995-05-23

申请号：US212247

申请日：1994-03-14

Applicant: Donald L. Friede ,  Van Le ,  Denver L. Dolman

Inventor： Donald L. Friede ,  Van Le ,  Denver L. Dolman

IPC: G21K5/04 ,  C23C14/48 ,  H01J37/147 ,  H01J37/317 ,  H01L21/265 ,  H01J37/302

CPC classification number: H01J37/3171 ,  H01J37/1474 ,  H01J2237/1504 ,  H01J2237/31701

Abstract: An ion implanter is provided having a modulator which provides a variable frequency modulated scan signal. The modulator ensures that the scan signal will not retrace substantially upon itself during a scan cycle, and during subsequent scan cycles. Minimization of retrace allows for a more uniform dopant placed across the upper surface of the wafer and thereby eliminates or minimizes underdoping areas often arising between retraced beam widths when heavy atomic species are implanted.

Abstract translation: 提供了具有提供可变频调制的扫描信号的调制器的离子注入机。 调制器确保扫描信号在扫描周期期间和在随后的扫描周期期间不会基本上回扫自身。 回扫的最小化允许跨越晶片的上表面放置更均匀的掺杂剂，从而消除或最小化在重原子物质被植入时在回波束宽度之间经常出现的欠掺杂区域。