Abstract:
A method and apparatus for characterizing and screening an array of material samples is disclosed. The apparatus includes a sample block having a plurality of regions for containing the material samples, a polarized light source to illuminate the materials, an analyzer having a polarization direction different than the polarization direction of the polarized light source, and a detector for analyzing changes in the intensity of the light beams. The light source, together with a polarizer, may include a plurality of light beams to simultaneously illuminate the entire array of materials with linearly polarized light so that characterization and screening can be performed in parallel. In addition, the materials in the sample block maybe subjected to different environmental conditions or mechanical stresses, and the detector analyzes the array as a function of the different environmental conditions or mechanical stresses.
Abstract:
Apparatus for acquiring an image of a specimen comprising a cassette having an optical portion holding a specimen array on a TIR surface and being removably matable to a processing portion having a polarized light beam source and a processing polarization-sensitive portion to image the spatially distributed charges in polarization of the specimen array. In one form the array optical portion comprises a transparent slide having a bottom surface with first and second gratings located to direct polarized light to the TIR surface and to direct light reflected by that (TIR) surface to an imager, respectively. The apparatus may include a flow cell integral with the optical portion as well as means for selecting the direction and wavelength of the polarized light.
Abstract:
A polarization detector is described which contains a beam splitter, which disperses an incident light beam into partial beam paths. The partial beams pass though &lgr;/4 wafers and a cholesterol layer and impinge upon detectors. The polarization direction of the incident light beam can be measured by the polarization detector with the aid of the signal level of the detectors.
Abstract:
Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. Radiation so modulated and modified by the sample is detected and up to 25 harmonics may be derived from the detected signal. The up to 25 harmonics may be used to derive ellipsometric and system parameters, such as parameters related to the angles of fixed polarizing elements, circular deattenuation, depolarization of the polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.
Abstract:
Disclosed is an odd bounce image rotating system with a sequence of an odd number of reflecting elements, such that a polarized electromagnetic beam caused to enter, reflectively interacts with the odd number of reflecting elements and exits along an essentially non-deviated, non-displaced locus, but with an azimuthally rotated polarization state. Application to, and methodology of application to set azimuthal angles of polarization in spectroscopic ellipsometer, polarimeter and the like systems is also disclosed.
Abstract:
A system is disclosed for evaluating nitrogen levels in thin gate dielectric layers formed on semiconductor samples. In one embodiment, a tool is disclosed which includes both a narrow band ellipsometer and a broadband spectrometer for measuring the sample. The narrowband ellipsometer provides very accurate information about the thickness of the thin film layer while the broadband spectrometer contains information about the nitrogen levels. In another aspect of the subject invention, a thermal and/or plasma wave detection system is used to provide information about the nitrogen levels and nitration processes.
Abstract:
Devices and methods for differential numerical aperture analysis of samples, utilizing angle-of-incidence measurements resulting from variable illumination or observation numerical apertures, or both. Metrology applications are provided, and more particularly including scatterometer, ellipsometer and similar analysis methods, including bi-directional reflectance or transmission distribution function measurement. The provided devices and methods enable analysis of critical dimensions of samples utilizing a minimum of moving parts, with the range of striking or scattering angles varied by a variable numerical aperture or apertures.
Abstract:
An ellipsometer for aligning incident angle comprising: a main frame shaping half circle and flat surface on which a plurality of grooves are radial and circumferential directionally carved; a specimen stage, which is installed at the groove-caved surface of the main frame, for tilting a specimen on a upper surface of the specimen stage with respect to horizontal direction and translating the specimen upward and downward; a polarizing unit, which is capable of fixing and moving on the groove-carved surface of the main frame, for polarizing a light from a light source and outputting the polarized light to the specimen, and moving on the groove-carved surface; and a light detecting unit, which is capable of fixing and moving on the groove-carved surface, for a reflection light from the specimen.
Abstract:
To carry out measurements in the vacuum, for example for quality control in the production of semiconductors, conventional stand alone measuring machines are installed. They are very cost, space and time intensive. To enable a process oriented measurement under optimal conditions, a device with a two part case is proposed that can be moved in a vacuum chamber, whereby one part of the case projects into the vacuum chamber and the other part of the case is located outside the vacuum chamber. The case can receive a measurement system. In addition, an adjusting device, engaging with the case, and a counterpull device, engaging with the second part of the case, are provided.
Abstract:
A non-intrusive method of characterizing particles through inverse analysis of experimental data based on measurements using elliptically polarized radiation is provided. A database of theoretical absorption and scattering data sets for particles is compiled. Optimum settings for an experimental test to gather an experimental absorption and scattering data set are determined and the experimental test is conducted. The experimental absorption and scattering data set is then compared to the theoretical absorption and scattering data sets of the database of theoretical absorption and scattering data sets in order to determine an absorption and scattering data set which differs the least from the experimental absorption and scattering data set in order to characterize the particles.