中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

1314 records (took 0.027 seconds)

    Continuous process for making polymers in carbon dioxide
    106.
    发明申请
    Continuous process for making polymers in carbon dioxide 失效
    在二氧化碳中制备聚合物的连续方法

    公开(公告)号：US20050192415A1

    公开(公告)日：2005-09-01

    申请号：US11112420

    申请日：2005-04-22

    Applicant: Paul Charpentier ,  Joseph DeSimone ,  George Roberts

    Inventor： Paul Charpentier ,  Joseph DeSimone ,  George Roberts

    IPC: B01J3/00 ,  B01J8/00 ,  B01J19/18 ,  B01J19/24 ,  C08F2/04 ,  C08F14/22 ,  C08F2/00

    CPC classification number: B01J19/1881 ,  B01J3/008 ,  B01J8/0055 ,  B01J8/006 ,  B01J19/2435 ,  B01J19/2465 ,  B01J19/2475 ,  B01J2219/00006 ,  B01J2219/00015 ,  B01J2219/00033 ,  B01J2219/00114 ,  B01J2219/00135 ,  B01J2219/00166 ,  C08F2/04 ,  C08F14/22 ,  Y02P20/544 ,  Y10S526/942

    Abstract: A method for carrying out the continuous polymerization of a monomer in a carbon dioxide reaction medium comprises the steps of: (a) providing an apparatus including a continuous reaction vessel and a separator; (b) carrying out a polymerization reaction in the reaction vessel by combining a monomer and a carbon dioxide reaction medium therein (and preferably by also combining an initiator therein), wherein the reaction medium is a liquid or supercritical fluid, and wherein the reaction produces a solid polymer product in the reaction vessel; then (c) withdrawing a continuous effluent stream from the reaction vessel during the polymerization reaction, wherein the effluent stream is maintained as a liquid or supercritical fluid; then (d) passing the continuous effluent stream through the separator and separating the solid polymer therefrom while maintaining at least a portion of the effluent stream as a liquid or supercritical fluid; and then (e) returning at least a portion of the continuous effluent stream to the reaction vessel while maintaining the effluent stream as a liquid or supercritical fluid. The need for significant recompression of the continuous effluent stream prior to return to the reaction vessel is thereby minimized. Apparatus for carrying out such methods is also disclosed.

    Abstract translation: 在二氧化碳反应介质中进行单体的连续聚合的方法包括以下步骤：（a）提供包括连续反应容器和分离器的装置; （b）通过在其中组合单体和二氧化碳反应介质（优选通过将其中的引发剂结合在其中）来在反应容器中进行聚合反应，其中反应介质是液体或超临界流体，其中反应产生 反应容器中的固体聚合物产物; 然后（c）在聚合反应期间从反应容器中取出连续的流出物流，其中流出物流被保持为液体或超临界流体; 然后（d）使连续的流出物流通过分离器并从其中分离固体聚合物，同时将至少一部分流出物流保持为液体或超临界流体; 然后（e）将至少一部分连续流出物流返回到反应容器中，同时将流出物流保持为液体或超临界流体。 因此，在返回到反应容器之前对连续流出物流进行显着再压缩的需要被最小化。 还公开了用于执行这种方法的装置。

    Method and device for plasma treatment of moving metal substrates
    107.
    发明授权
    Method and device for plasma treatment of moving metal substrates 有权
    移动金属基板等离子体处理方法和装置

    公开(公告)号：US06933460B2

    公开(公告)日：2005-08-23

    申请号：US10343764

    申请日：2001-08-06

    Applicant: Pierre Vanden Brande ,  Alain Weymeersch

    Inventor： Pierre Vanden Brande ,  Alain Weymeersch

    IPC: H05H1/24 ,  B01J3/00 ,  B01J19/08 ,  C21D1/38 ,  C21D1/56 ,  C21D9/56 ,  C23C14/02 ,  C23F4/00 ,  C23G3/02 ,  C23G5/00 ,  H01J37/32 ,  H01J37/34 ,  H05H1/46 ,  B23K9/00

    CPC classification number: H01J37/32623 ,  C21D1/38 ,  C21D9/561 ,  C23C14/022 ,  C23G5/00 ,  H01J37/3266

    Abstract: The invention relates to a method of treatment, in particular cleaning and/or heating, for a metal substrate (1) fed in a substantially continuous manner through a vacuum chamber (3), having a treatment zone in which an electric discharge (10), i.e. a plasma, and a magnetic field are produced in a gas maintained at a pressure below atmospheric pressure between at least the substrate (1), acting as an electrode, and at least one counter-electrode (9) to enable the substrate (1) to be bombarded by the ions produced in the electric discharge (10). This method is characterised in that a confining magnetic induction field is produced entirely around the substrate (1) in the treatment zone so that the electric discharge (10) is also confined entirely around the substrate (1) inside this treatment zone by the confinement of electrons released in the electric discharge (10).

    Abstract translation: 本发明涉及一种用于以基本上连续的方式通过真空室（3）供给的金属基底（1）的处理，特别是清洁和/或加热的方法，所述真空室具有处理区，其中放电（10） 即等离子体，并且在至少用作电极的基板（1）和至少一个对电极（9）之间的气体中产生保持在低于大气压的压力下的气体，以使基板（ 1）被放电（10）中产生的离子轰击。 该方法的特征在于，在处理区域中完全围绕基板（1）产生约束磁感应场，使得放电（10）也被完全限制在该处理区内的基板（1）周围，通过限制 在放电（10）中释放的电子。

    Methods of operating vacuum processing equipment and methods of processing wafers
    109.
    发明授权
    Methods of operating vacuum processing equipment and methods of processing wafers 失效
    操作真空加工设备的方法和加工晶圆的方法

    公开(公告)号：US06920369B2

    公开(公告)日：2005-07-19

    申请号：US10911659

    申请日：2004-08-05

    Applicant: Tooru Ueno ,  Shigeru Nakamoto ,  Shoji Okiguchi ,  Hideki Yamasaki ,  Kouji Nishihata

    Inventor： Tooru Ueno ,  Shigeru Nakamoto ,  Shoji Okiguchi ,  Hideki Yamasaki ,  Kouji Nishihata

    IPC: G05B23/02 ,  B01J3/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/677 ,  G06F19/00

    CPC classification number: H01L21/67276 ,  H01L21/67167 ,  H01L21/67745 ,  H01L21/67769

    Abstract: A method of operating vacuum processing equipment that includes multiple sets of apparatus for performing a succession of different processes on individual wafers, an apparatus for transporting said wafers, and an apparatus for controlling said processing apparatus sets and said transport apparatus, and has at least two sets of wafer processing routes including multiple sets of said processing apparatus; wherein it is possible to judge whether each set of said processing apparatus for performing various processes is in a valid or invalid status for operation, to electrically disconnect only the processing apparatus whose operational status has been judged to be invalid, to reconstruct said processing routes by using the processing apparatus whose operational status has been judged to be valid, and to process said wafers by using only said processing apparatus which is valid for operation.

    Abstract translation: 一种操作真空处理设备的方法，其包括用于在单个晶片上执行不同处理的多组设备，用于传输所述晶片的设备以及用于控制所述处理设备组和所述传送设备的设备，并且具有至少两个 一组晶片处理路线，包括多组所述处理装置; 其中可以判断用于执行各种处理的所述处理装置的每一组是否处于用于操作的有效或无效状态，仅电连接仅操作状态被判断为无效的处理装置，以便重新构建所述处理路线 使用其操作状态已被判断为有效的处理装置，并且仅使用对于操作有效的所述处理装置来处理所述晶片。

    Method and apparatus for controlling feed of gaseous reaction component
    110.
    发明申请
    Method and apparatus for controlling feed of gaseous reaction component 有权
    用于控制气态反应组分进料的方法和装置

    公开(公告)号：US20050154228A1

    公开(公告)日：2005-07-14

    申请号：US10503303

    申请日：2003-02-26

    Applicant: Hidehiko Nakajima ,  Yoshiyuki Harano ,  Manabu Yamada

    Inventor： Hidehiko Nakajima ,  Yoshiyuki Harano ,  Manabu Yamada

    IPC: B01J3/02 ,  B01J3/00 ,  B01J4/00 ,  B01J4/02 ,  B01J8/22 ,  B01J10/00 ,  B01J19/00 ,  C07C51/12 ,  C07C53/08 ,  B01J8/00

    CPC classification number: B01J19/0006 ,  B01J4/02 ,  B01J10/002 ,  B01J2219/00006 ,  B01J2219/00065 ,  B01J2219/00162 ,  B01J2219/00164 ,  B01J2219/002 ,  B01J2219/00207 ,  B01J2219/00216 ,  B01J2219/0022 ,  B01J2219/00231 ,  B01J2219/0024 ,  C07C51/12 ,  Y02P20/142 ,  C07C53/08

    Abstract: A method comprises continuously supplying an alcohol to a pressurized reaction system, pressurizing carbon monoxide with a compressor 8 attached to a first feed line 22, for continuously supplying carbon monoxide to the reaction system via a second feed line 23 with a reference flow rate F, and converging excess carbon monoxide in the reaction system in the first feed line via a branched circulation line 24 for allowing to react alcohol with carbon monoxide. The reference flow rate F in the second feed line 23 is a total rate of a reference consumption flow rate Fcs in the reaction and a flow rate F1 in excess rate over a fluctuation consumption flow rate ΔFcv in the reaction system (F=Fcs+F1, F1>ΔFcv). According to the pressure fluctuation of the gaseous phase in the reaction system, the flow rate in the circulation line 24 is controlled to a flow rate Fr=F1−ΔFcv and the feed flow rate in the first feed line 22 is controlled to a flow rate Fsu=Fcs+ΔFcv, for compensating a consumption rate variation in the reaction system with the feed flow rate of carbon monoxide. This ensures discharge inhibition of the gaseous reactant in a liquid phase pressurized reaction system (such as carbonylation reaction system) and effective utilization of the reactant for the reaction.

    Abstract translation: 一种方法包括向加压反应系统连续供应醇，用连接到第一进料管线22的压缩机8加压一氧化碳，用于经由第二进料管线23以参考流量F连续向反应系统供应一氧化碳， 并且通过分支循环管线24在第一进料管线中的反应体系中过量的一氧化碳收敛，以允许醇与一氧化碳反应。 第二供给管线23中的参考流量F是反应中的参考消耗流量Fcs和超过反应系统中的波动消耗流量DeltaFcv的流量F1的总速率（F = Fcs + F1 ，F1> DeltaFcv）。 根据反应体系中的气相的压力波动，将循环管线24中的流量控制为流量Fr = F1-ΔFcv，将第一进料管线22中的进料流量控制为流量 Fsu = Fcs +ΔFcv，用于补偿反应体系中一氧化碳进料流量的消耗速率变化。 这确保液相加压反应体系（如羰基化反应体系）中的气态反应物的排放抑制和反应物的有效利用。

Patent Agency Ranking