公开(公告)号：US20020171830A1

公开(公告)日：2002-11-21

申请号：US10150590

申请日：2002-05-17

Inventor： Adam E. Norton

IPC: G01J004/00

CPC classification number: G02B17/0884 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/42 ,  G01N21/211 ,  G01N21/47 ,  G02B17/08 ,  G02B17/0852

Abstract: Achromatic optics may be employed in spectroscopic measurement systems. The achromatic optics comprises a spherical mirror receiving a beam of radiation in a direction away from its axis and a pair of lenses: a positive lens and a negative meniscus lens. The negative meniscus lens corrects for the spherical aberration caused by off-axis reflection from the spherical mirror. The positive lens compensates for the achromatic aberration introduced by the negative lens so that the optics, as a whole, is achromatic over visible and ultraviolet wavelengths. Preferably, the two lenses combined have zero power or close to zero power. By employing a spherical mirror, it is unnecessary to employ ellipsoidal or paraboloidal mirrors with artifacts of diamond turning which limit the size of the spot of the sample that can be measured in ellipsometry, reflectometry or scatterometry.

公开(公告)号：US20020105646A1

公开(公告)日：2002-08-08

申请号：US09742029

申请日：2000-12-20

Inventor： Guoheng Zhao ,  Kenneth P. Gross ,  Rodney Smedt ,  Mehrdad Nikoonahad

IPC: G01J004/00

CPC classification number: G01N21/21 ,  G01B11/00 ,  G01N21/4788 ,  G01N21/956

Abstract: A periodic structure is illuminated by polychromatic electromagnetic radiation. Radiation from the structure is collected and divided into two rays having different polarization states. The two rays are detected from which one or more parameters of the periodic structure may be derived. In another embodiment, when the periodic structure is illuminated by a polychromatic electromagnetic radiation, the collected radiation from the structure is passed through a polarization element having a polarization plane. The element and the polychromatic beam are controlled so that the polarization plane of the element are at two or more different orientations with respect to the plane of incidence of the polychromatic beam. Radiation that has passed through the element is detected when the plane of polarization is at the two or more positions so that one or more parameters of the periodic structure may be derived from the detected signals. At least one of the orientations of the plane of polarization is substantially stationary when the detection takes place. To have as small a footprint as possible, one employs an optical device that includes a first element directing a polychromatic beam of electromagnetic radiation to the structure and a second optical element collecting radiation from the structure where the two elements form an integral unit or are attached together to form an integrated unit. To reduce the footprint, the measurement instrument and the wafer are both moved. In one embodiment, both the apparatus and the wafer undergo translational motion transverse to each other. In a different arrangement, one of the two motions is translational and the other is rotational. Any one of the above-described embodiments may be included in an integrated processing and detection apparatus which also includes a processing system processing the sample, where the processing system is responsive to the output of any one of the above embodiments for adjusting a processing parameter.

公开(公告)号：US20020097406A1

公开(公告)日：2002-07-25

申请号：US09956841

申请日：2001-09-20

Inventor： John Fielden ,  Ady Levy ,  Kyle A. Brown ,  Gary Bultman ,  Mehrdad Nikoonahad ,  Dan Wack

IPC: G01N021/00 ,  G01J004/00 ,  G01B011/28

CPC classification number: G03F7/70708 ,  G01N21/211 ,  G01N21/47 ,  G01N21/55 ,  G01N21/636 ,  G01N21/64 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N21/956 ,  G01N2021/646 ,  G01N2021/8825 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70658 ,  G03F7/707 ,  H01J2237/31701 ,  H01L22/12 ,  H01L2924/0002 ,  Y10T117/1004 ,  H01L2924/00

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a thickness of a structure on a specimen and at least one additional property of the specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract translation: 提供了用于监测半导体制造工艺的方法和系统。 系统可以包括被配置为支撑样本并耦合到测量装置的台。 测量装置可以包括照明系统和检测系统。 照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。 例如，系统可以被配置为确定样本的多个属性，包括但不限于样本上的结构的厚度和样本的至少一个附加特性。 以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

公开(公告)号：US20020075480A1

公开(公告)日：2002-06-20

申请号：US09982159

申请日：2001-10-19

Applicant: Matsushita Electric Industrial co. Ltd.

Inventor： Tatsurou Kawamura

IPC: G01J004/00

CPC classification number: G01N21/21

Abstract: In order to obtain a simple and highly reliable method of polarimetry, there is provided a method of polarimetry characterized by calculating an angle of rotation from discrete 2 or 3 measuring points, and performing again the measurement on the measuring point which is not effective.

Abstract translation: 为了获得简单高可靠的极化法，提供了一种偏振方法，其特征在于从离散的2或3个测量点计算旋转角度，并再次对无效的测量点进行测量。

公开(公告)号：US20020030807A1

公开(公告)日：2002-03-14

申请号：US09797597

申请日：2001-05-22

Inventor： Shunji Maeda ,  Atsushi Yoshida ,  Yukihiro Shibata ,  Minoru Yoshida ,  Sachio Uto ,  Hiroaki Shishido ,  Toshihiko Nakata

IPC: G01N021/00 ,  G01J004/00

CPC classification number: G01N21/956

Abstract: A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.

Abstract translation: 用于检测高分辨率的精细电路图案以检测缺陷部分的缺陷检查装置被构造成具有用于检测样本的图像的物镜，用于通过物镜照射样品的激光照明单元，用于减少 激光照明的相干性，累积型检测器和用于处理检测到的图像信号的单元。

公开(公告)号：US20020027657A1

公开(公告)日：2002-03-07

申请号：US09845763

申请日：2001-05-02

Inventor： Hakon Mikkelsen ,  Horst Engel ,  Lambert Danner ,  Christof Stey

IPC: G01J004/00

CPC classification number: G01B11/0641 ,  G01N21/211

Abstract: The invention concerns an optical measurement arrangement having an ellipsometer, in which an incident beam (16) of polarized light is directed at an angle of incidence nullnull0null onto a measurement location (M) on the surface of a specimen (P). Information concerning properties of the specimen (P), preferably concerning layer thicknesses and optical material properties such as refractive index n, extinction coefficient k, and the like, is obtained from an analysis of a return beam (17) reflected from the specimen (P). The incident beam (16) is directed by a mirror objective (15) onto the surface of the specimen (P). The return beam (17) is also captured by the mirror objective (15). The result is to create an optical measurement arrangement, operating on the ellipsometric principle, which has a simple, compact configuration and permits a high measurement accuracy down to the sub-nanometer range.

Abstract translation: 本发明涉及具有椭偏仪的光学测量装置，其中偏振光的入射光束（16）以入射角α<0°的角度被引导到样本（P）的表面上的测量位置（M）上， 。 从样品（P）反射的返回光束（17）的分析中可以得到关于样品（P）的性质的信息，优选涉及层厚度和光学材料性质如折射率n，消光系数k等。 ）。 入射光束（16）由镜面物镜（15）引导到样品（P）的表面上。 返回光束（17）也被镜面物镜（15）捕获。 其结果是创建一个以椭偏仪原理工作的光学测量装置，其具有简单紧凑的结构，并允许高达亚纳米范围的高测量精度。

公开(公告)号：US20020021442A1

公开(公告)日：2002-02-21

申请号：US09748004

申请日：2000-12-27

Applicant: Japan as represented by Secretary of Agency of Industrial Science and Technology

Inventor： Yasumasa Takao ,  Mutsuo Sando ,  Makio Naito ,  Keizo Uematsu

IPC: G01J004/00

CPC classification number: G01N21/23

Abstract: This invention relates to a method of measuring the internal structure (packing structure or dispersion condition of particulate material) of a composite filled with particles having an irregular matrix by observations based on its optical anisotropy, in which the internal structure (packing structure or dispersion condition of particulate material) of the composite obtained by mixing particulate material as raw material with a liquid material is made visible by utilizing the photoelasticity based on local rearrangement of liquid material molecules or difference of refractive indices of the particulate material and liquid material, and the structure thereof are observed, and an evaluation device using this principle of measurement.

Abstract translation: 本发明涉及一种通过基于其光学各向异性观察来测量填充有具有不规则矩阵的颗粒的复合材料的内部结构（填料结构或颗粒材料的分散状态）的方法，其中内部结构（填料结构或分散条件 通过利用基于液体材料分子的局部重排或颗粒材料和液体材料的折射率差异的光弹性而将通过将颗粒材料作为原料与液体材料混合而获得的复合材料获得的复合材料可见， ，以及使用该测量原理的评价装置。

公开(公告)号：US20020018205A1

公开(公告)日：2002-02-14

申请号：US09944831

申请日：2001-08-31

Inventor： David E. Aspnes ,  Jon Opsal

IPC: G01J004/00

CPC classification number: G01J3/02 ,  G01J3/0229 ,  G01J3/0232 ,  G01N21/211 ,  G01N2021/213

Abstract: An ellipsometer, and a method of ellipsometry, for analyzing a sample using a broad range of wavelengths, includes a light source for generating a beam of polychromatic light having a range of wavelengths of light for interacting with the sample. A polarizer polarizes the light beam before the light beam interacts with the sample. A rotating compensator induces phase retardations of a polarization state of the light beam wherein the range of wavelengths and the compensator are selected such that at least a first phase retardation value is induced that is within a primary range of effective retardations of substantially 135null to 225null, and at least a second phase retardation value is induced that is outside of the primary range. An analyzer interacts with the light beam after the light beam interacts with the sample. A detector measures the intensity of light after interacting with the analyzer as a function of compensator angle and of wavelength, preferably at all wavelengths simultaneously. A processor determines the polarization state of the beam as it impinges the analyzer from the light intensities measured by the detector.

公开(公告)号：US20020012123A1

公开(公告)日：2002-01-31

申请号：US09871220

申请日：2001-05-31

Inventor： Lanhua Wei ,  Hanyou Chu ,  Jon Opsal

IPC: G01R031/26 ,  H01L021/66 ,  G01J004/00

CPC classification number: G01N21/211 ,  G01B11/065 ,  G01N21/9501 ,  H01L22/12

Abstract: This invention relates to ellipsometry and reflectometry optical metrology tools that are used to evaluate semiconductor wafers and is directed to reducing errors associated with material surrounding a desired measurement area or pad, either by minimizing the uncertainties in positioning the measurement beam or by taking into account the effects of the surrounding material in analyzing the measured data. One aspect the present invention utilizes a technique where initially one purposefully aims to place the optical spot of the measurement beam a few microns away from the center of the target pad. Then a series of measurements are made with each measurement separated by a small stage jog as the optical spot is scanned over the measurement pad. Provided the surrounding material is the same on both sides of the pad, one finds that the data invariably has either a cup or inverted nullUnull shape or an inverted cup or nullUnull shape when viewed as a function of position. The minimum or maximum of the curve is then used to identify the center of the pad. Another aspect the present invention makes use of a novel method of data analysis that allows for the correction of the effects of the surrounding material in analyzing the data. In essence, the data collected at the center of the pad is treated as being created by a superposition of light coming from the pad material itself and light coming from the surrounding material. The influence of the two materials is weighted by the proportion of the light that reflects off the pad as compared with the light that reflects off of the surrounding material. Given knowledge of both the dimensions of the pad and the size and profile of the beam spot, the resulting signal may be mathematically modeled according to the present invention to account for both the contribution of the light reflected from the pad and the light reflected from the surrounding material.

Abstract translation: 本发明涉及用于评估半导体晶片的椭偏仪和反射光学测量工具，并且旨在通过最小化定位测量光束的不确定性或通过考虑到测量光束的位置来减少与期望的测量区域或焊盘周围的材料相关的误差 周围材料在测量数据分析中的作用。 本发明的一个方面利用一种技术，其中最初一个目的是将测量光束的光点远离目标焊盘的中心几微米。 然后，通过在测量垫上扫描光点，通过小阶段点动分离每个测量进行一系列测量。 如果周围的材料在垫的两侧是相同的，那么可以发现当视为位置的函数时，数据总是具有杯状或倒置的“U”形或倒杯或“U”形。 然后使用曲线的最小或最大值来识别垫的中心。 本发明的另一方面利用了一种新的数据分析方法，其允许在分析数据时校正周围材料的影响。 实质上，在垫的中心处收集的数据被视为由来自垫材料本身的光和来自周围材料的光的叠加而产生的。 与从周围材料反射的光相比，两种材料的影响被反射离开焊盘的光的比例加权。 考虑到焊盘的尺寸和光束点的尺寸和轮廓两者的知识，可以根据本发明对所得到的信号进行数学建模，以考虑从焊盘反射的光的贡献和从焊盘反射的光的贡献 周边材料。

公开(公告)号：US20040257567A1

公开(公告)日：2004-12-23

申请号：US10849740

申请日：2004-05-20

Inventor： John A. Woollam ,  Corey L. Bungay ,  Thomas E. Tiwald ,  Martin M. Liphardt ,  Ronald A. Synowicki ,  Gregory K. Pribil ,  Craig M. Herzinger ,  Blaine D. Johs ,  James N. Hilfiker

IPC: G01J004/00

CPC classification number: G01N21/211 ,  G01N2021/213

Abstract: Simultaneous use of wavelengths in at least two ranges selected from RADIO, MICRO, FIR, IR, NIR-VIS-NUV, UV, DUV, VUV EUV, XRAY in a regression procedure to evaluate parameters in mathematical dispersion structures to model dielectric functions.

Abstract translation: 在回归过程中同时使用从RADIO，MICRO，FIR，IR，NIR-VIS-NUV，UV，DUV，VUV EUV，XRAY中选择的至少两个范围的波长，以评估数学色散结构中的参数来建模介电函数。