公开(公告)号：US20240044820A1

公开(公告)日：2024-02-08

申请号：US18484161

申请日：2023-10-10

Applicant: ASML Netherlands B.V.

Inventor： Kuo-Feng TSENG ,  Zhonghua DONG ,  Yixiang WANG ,  Zhong-wei CHEN

IPC: G01N23/2206 ,  G01N23/2251 ,  G01N23/203

CPC classification number: G01N23/2206 ,  G01N23/2251 ,  G01N23/203 ,  G01N2223/6116 ,  G01N2223/3307

Abstract: Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.

公开(公告)号：US20240044639A1

公开(公告)日：2024-02-08

申请号：US18486811

申请日：2023-10-13

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria PELLEMANS ,  Arie Jeffrey DEN BOEF

IPC: G01B11/24 ,  G03F7/00

CPC classification number: G01B11/24 ,  G03F7/70633 ,  G03F7/7085 ,  G03F7/70191

Abstract: A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.

公开(公告)号：US11892776B2

公开(公告)日：2024-02-06

申请号：US17415101

申请日：2019-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Jacobus Matheus Baselmans ,  Duan-Fu Stephen Hsu ,  Willem Jan Bouman ,  Frank Jan Timmermans ,  Marie-claire Van Lare

IPC: G03F7/00

CPC classification number: G03F7/70308

Abstract: Apparatuses and techniques for suppressing a zeroth order portion of a configured radiation beam. In some embodiments, an extreme ultraviolet (EUV) lithographic apparatus for forming an image on a substrate by use of an EUV radiation beam that is configured by a patterning device comprising a pattern of reflective regions and partially reflective regions, wherein the partially reflective regions are configured to suppress and apply a phase shift to a portion of the EUV radiation beam, may include a projection system. The projection system may be configured to suppress a zeroth order portion of a configured EUV radiation beam, and direct an unsuppressed portion of a configured EUV radiation beam towards a substrate to form an image on the substrate.

公开(公告)号：US20240038485A1

公开(公告)日：2024-02-01

申请号：US18486106

申请日：2023-10-12

Applicant: ASML Netherlands B.V.

Inventor： Stijn Wilem Herman Karel STEENBRINK

IPC: H01J37/244 ,  H01J37/317 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/3177 ,  H01J37/28 ,  H01J2237/1516 ,  H01J2237/0453 ,  H01J2237/2817

Abstract: Disclosed herein is a charged-particle apparatus configured to inspect a sample with a charged-particle beam. The charged-particle apparatus comprises a detector assembly or an array of multipole elements. The charged-particle apparatus comprises an electronic device, a power source configured to output radiation, and a power converter configured to receive radiation from the power source, to convert the received radiation into electrical energy and to output the electrical energy to the electronic device. The power source is electrically isolated from the power converter.

公开(公告)号：US20240037890A1

公开(公告)日：2024-02-01

申请号：US18267748

申请日：2021-11-24

Applicant: ASML Netherlands B.V.

Inventor： Haoyi LIANG ,  Bing MA ,  Zhichao CHEN ,  Marc Jurian KEA

IPC: G06V10/24 ,  G06T3/40 ,  G06T5/00 ,  G06T7/50 ,  G06T7/62 ,  G06T7/70

CPC classification number: G06V10/24 ,  G06T3/40 ,  G06T5/002 ,  G06T7/50 ,  G06T7/62 ,  G06T7/70

Abstract: Systems and methods of image alignment are disclosed herein. The method of image alignment may comprise obtaining an image of a sample, obtaining information associated with a corresponding reference image, generating a modified rendered image by blurring a rendered image of the corresponding reference image such that a topology of the rendered image is substantially preserved, wherein a degree of blurring is based on a characteristic of the topology, and aligning the image of the sample with the blurred rendered image. The method may further comprise aligning the image of the sample with the corresponding reference image based on an alignment between the image of the sample and the blurred rendered image.

公开(公告)号：US11886096B2

公开(公告)日：2024-01-30

申请号：US17909223

申请日：2021-02-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Vitaliy Prosyentsov ,  Yongfeng Ni

IPC: G02F1/35 ,  G02F1/365 ,  G03F7/00

CPC classification number: G02F1/3503 ,  G02F1/365 ,  G03F7/7015 ,  G02F2201/34 ,  G02F2202/32

Abstract: An assembly including a non-linear element configured for generating broadband radiation from input radiation coupled into the non-linear element. The assembly further includes an optical element positioned downstream of the non-linear element configured to reflect a fraction of the broadband radiation back into the non-linear element. The non-linear element can be a nonlinear fiber, such as a hollow-core photonic crystal fiber (HC-PCF).

公开(公告)号：US20240012342A1

公开(公告)日：2024-01-11

申请号：US18035008

申请日：2021-11-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Sebastianus Adrianus GOORDEN ,  Simon Gijsbert Josephus MATHIJSSEN ,  Leendert Jan KARSSEMEIJER ,  Manouk RIJPSTRA ,  Ralph BRINKHOF ,  Kaustuve BHATTACHARYYA

IPC: G03F9/00 ,  G03F7/00

CPC classification number: G03F9/7046 ,  G03F7/706831 ,  G03F7/70625 ,  G03F7/706837

Abstract: A method for a metrology process, the method includes obtaining first measurement data relating to a first set of measurement conditions and determining a first measurement recipe based on the first measurement data. At least one performance indicator is determined from one or more components of the first measurement data obtained from a component analysis or statistical decomposition. Alternatively, at least one performance indicator is determined from a comparison of one or more first measurement values relating to the first measurement recipe and one or more second measurement values relating to a second measurement recipe, where second measurement recipe is different to the first measurement data and relates a second set of measurement conditions, the second set of measurement conditions being different to the first set of measurement conditions.

公开(公告)号：US20240012337A1

公开(公告)日：2024-01-11

申请号：US18229984

申请日：2023-08-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo TEL ,  Mark John MASLOW ,  Koenraad VAN INGEN SCHENAU ,  Patrick WARNAAR ,  Abraham SLACHTER ,  Roy ANUNCIADO ,  Simon Hendrik Celine VAN GORP ,  Frank STAALS ,  Marinus JOCHEMSEN

IPC: G03F7/00 ,  G06T7/00 ,  H01L21/66 ,  G06F30/20

CPC classification number: G03F7/70625 ,  G06T7/0004 ,  H01L22/20 ,  G06F30/20 ,  H01L21/00

Abstract: A method for determining a metric of a feature on a substrate obtained by a semiconductor manufacturing process involving a lithographic process, the method including: obtaining an image of at least part of the substrate, wherein the image includes at least the feature; determining a contour of the feature from the image; determining a plurality of segments of the contour; determining respective weights for each of the plurality of segments; determining, for each of the segments, an image-related metric; and determining the metric of the feature in dependence on the weights and the calculated image-related metric of each of the segments.

公开(公告)号：US20240005463A1

公开(公告)日：2024-01-04

申请号：US18369775

申请日：2023-09-18

Applicant: ASML Netherlands B.V.

Inventor： Shakeeb Bin HASAN ,  Maikel Robert GOOSEN

IPC: G06T5/10 ,  G06T5/50 ,  H01J37/22 ,  H01J37/28

CPC classification number: G06T5/10 ,  G06T5/50 ,  H01J37/222 ,  H01J37/28 ,  G06T2207/10061 ,  G06T2207/20056 ,  G06T2207/20192 ,  G06T2207/30148 ,  H01J2237/223

Abstract: Disclosed herein is a method of reducing a sample charging effect in a scanning electron microscope (SEM) image, the method comprising: obtaining a first SEM image from a first electron beam scan with a parameter being a first quantity; obtaining a second SEM image from a second electron beam scan with the parameter being a second quantity different from the first quantity; and generating a reduced sample charging effect image based on convolution equations comprising a representation of the first SEM image, a representation of the second SEM image, a first point spread function corresponding to the first SEM image and a second point spread function corresponding to the second SEM image.

公开(公告)号：US20240005457A1

公开(公告)日：2024-01-04

申请号：US18031601

申请日：2021-09-27

Applicant: ASML Netherlands B.V.

Inventor： Hairong LEI ,  Wei FANG

IPC: G06T5/00 ,  G06T7/13

CPC classification number: G06T5/003 ,  G06T7/13 ,  G06T5/002 ,  G06T2207/20192 ,  G06T2207/20084 ,  G06T2207/30148 ,  G06T2207/10061 ,  G06T2207/20081

Abstract: Described herein is a method, and system for training a deblurring model and deblurring an image (e.g., SEM image) of a patterned substrate using the deblurring model and depth data associated with multiple layers of the patterned substrate. The method includes obtaining, via a simulator using a target pattern as input, a simulated image of the substrate, the target pattern comprising a first target feature to be formed on a first layer, and a second target feature to be formed on a second layer located below the first layer; determining, based on depth data associated with multiple layers of the substrate, edge range data for features of the substrate; and adjusting, using the simulated image and the edge range data associated with the target pattern as training data, parameters of a base model to generate the deblurring model to a deblur image of a captured image.