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111.发明授权公开(公告)号：US09507248B2
公开(公告)日：2016-11-29
申请号：US13681744
申请日：2012-11-20
Applicant: Gigaphoton Inc.
Inventor： Shinji Okazaki , Hakaru Mizoguchi , Junichi Fujimoto , Takashi Matsunaga , Kouji Kakizaki , Osamu Wakabayashi
CPC classification number: G03B27/522 , G03F7/70408
Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.
Abstract translation: 双光束干涉装置可以包括其上可以设置晶片的晶片台，分束器，用于将第一激光分离成具有沿晶片表面内的第一方向延伸的光束强度分布的第二和第三激光， 以及将第二和第三激光引导到晶片上的光学系统。 从垂直于第一方向的第二方向照射第二激光，从与第一方向垂直但与第二方向不同的第三方向照射第三激光，从而引起第二和第三激光的干涉 光在晶圆上。 该装置增加了双光束干涉曝光的精度。
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公开(公告)号：US09497841B2
公开(公告)日：2016-11-15
申请号：US14945096
申请日：2015-11-18
Applicant: GIGAPHOTON INC.
Inventor： Tatsuya Yanagida , Osamu Wakabayashi
CPC classification number: H05G2/008 , H01S3/005 , H01S3/0602 , H01S3/08054 , H01S3/107 , H01S3/1115 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2316 , H01S3/235 , H05G2/006
Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.
Abstract translation: 远端紫外线（EUV）发生系统被配置为通过提高等离子体产生的效率来提高激光系统的能量对EUV能量的转换效率。 EUV生成系统包括被配置为将目标朝向室内的等离子体产生区域输出的目标生成单元。 激光系统被配置为产生第一预脉冲激光束，第二预脉冲激光束和主脉冲激光束，使得靶被第一预脉冲激光束照射，第二预脉冲激光 光束和主脉冲激光束。 此外，EUV生成系统包括：控制器，被配置为控制激光系统，使得第二预脉冲激光束的能量密度等于或高于1J / cm 2，并且等于或低于主脉冲的能量密度 激光束。
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公开(公告)号：US09468082B2
公开(公告)日：2016-10-11
申请号：US14814983
申请日：2015-07-31
Applicant: GIGAPHOTON INC.
Inventor： Hideyuki Hayashi , Kazuhiro Suzuki , Osamu Wakabayashi
CPC classification number: H05G2/008 , H01S3/005 , H01S3/10015 , H01S3/10038 , H01S3/2316 , H05G2/006
Abstract: An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.
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公开(公告)号：US09425576B2
公开(公告)日：2016-08-23
申请号：US14487796
申请日：2014-09-16
Applicant: GIGAPHOTON INC.
Inventor： Tooru Abe , Takeshi Ohta , Hiroaki Tsushima , Osamu Wakabayashi
CPC classification number: H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
Abstract translation: 准分子激光装置包括气体供给单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 激光气体和第二激光气体到激光室的内部。 气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，以及气体供给单元提供第一激光器的部分气体置换控制 可以选择性地执行气体和第二激光气体到激光室的内部和排气单元部分地从激光室内部排出气体。
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公开(公告)号：US09402297B2
公开(公告)日：2016-07-26
申请号：US14724737
申请日：2015-05-28
Applicant: GIGAPHOTON INC.
Inventor： Osamu Wakabayashi , Tatsuya Yanagida , Hakaru Mizoguchi
IPC: H05G2/00
Abstract: An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
Abstract translation: 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统 用于控制激光束的光束强度分布。
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Patent Agency Ranking
116.发明授权Laser beam controlling device and extreme ultraviolet light generating apparatus 有权激光束控制装置和极紫外光发生装置公开(公告)号：US09386675B2
公开(公告)日：2016-07-05
申请号：US14724636
申请日：2015-05-28
Applicant: GIGAPHOTON INC.
Inventor： Toru Suzuki , Osamu Wakabayashi
CPC classification number: H05G2/008 , G02B17/0892 , G02B27/0068 , G02B27/108 , G02B27/141 , H01S3/005 , H01S3/2391 , H05G2/003
Abstract: A laser beam controlling device may include: a guide laser device; a guide laser beam wavefront adjuster provided in a beam path of the guide laser beam outputted from the guide laser device; a beam combiner configured to adjust travel directions of a laser beam outputted from a laser system and the guide laser beam outputted from the guide laser beam wavefront adjuster to coincide with each other, a both beam wavefront adjuster provided in a beam path of both the laser beam and the guide laser beam outputted from the beam combiner, a beam monitor provided in a beam path of both the laser beam and the guide laser beam outputted from the both beam wavefront adjuster, and a controller configured to control the guide laser beam wavefront adjuster and the both beam wavefront adjuster based on detection results at the beam monitor with respect to both the laser beam and the guide laser beam.
Abstract translation: 激光束控制装置可以包括：导向激光装置; 引导激光束波前调整器，设置在从引导激光装置输出的引导激光束的光束路径中; 配置为调整从激光系统输出的激光束的行进方向和从引导激光束波前调整器输出的引导激光束彼此重合的光束组合器，设置在两个激光束的光束路径中的两个光束波前调整器 从束组合器输出的光束和引导激光束，设置在从两光束波前调整器输出的激光束和引导激光束的光束路径中的光束监视器，以及控制器，被配置为控制引导激光束波前调整器 以及基于在激光束和引导激光束两者的光束监视器处的检测结果的两个光束波前调整器。
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公开(公告)号：US09271382B2
公开(公告)日：2016-02-23
申请号：US14215492
申请日：2014-03-17
Applicant: GIGAPHOTON INC.
Inventor： Masato Moriya , Osamu Wakabayashi
CPC classification number: H05G2/008 , H01S3/0078 , H01S3/10023 , H01S3/1003 , H01S3/10069 , H01S3/1306 , H01S3/2232 , H01S3/2316 , H01S2301/02
Abstract: A laser apparatus may include a master oscillator configured to output a pulse laser beam, an amplifier disposed in a light path of the pulse laser beam, a wavelength selection element disposed in the light path of the pulse laser beam and configured to transmit light of a selection wavelength at higher transmittance than transmittance of light of other wavelengths, and a controller configured to change the selection wavelength of the wavelength selection element.
Abstract translation: 激光装置可以包括配置成输出脉冲激光束的主振荡器，设置在脉冲激光束的光路中的放大器，配置在脉冲激光束的光路中的波长选择元件， 选择波长比其他波长的光的透射率高的透射率，以及配置为改变波长选择元件的选择波长的控制器。
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公开(公告)号：US09225139B2
公开(公告)日：2015-12-29
申请号：US14531876
申请日：2014-11-03
Applicant: Gigaphoton Inc.
Inventor： Akihiko Kurosu , Junichi Fujimoto , Yosuke Ishizuka , Takashi Matsunaga , Osamu Wakabayashi
CPC classification number: H01S3/036 , F16C32/047 , H01S3/02 , H01S3/041 , H01S3/223 , H01S3/2232 , H01S3/2258
Abstract: A discharge-pumped gas laser device may include a laser chamber, a pair of discharge electrodes provided in the laser chamber, a fan with a magnetic bearing being provided in the laser chamber and configured to be capable of circulating a gas in the laser chamber, a housing configured to contain the laser chamber, and a magnetic bearing controller connected to the magnetic bearing electrically, being capable of controlling the magnetic bearing, and provided in the housing separately from the laser chamber.
Abstract translation: 放电泵浦气体激光装置可以包括激光室，设置在激光室中的一对放电电极，具有磁性轴承的风扇设置在激光室中并且能够使激光室中的气体循环， 被配置为容纳激光室的壳体，以及与磁性轴承电连接的磁性轴承控制器，其能够控制磁性轴承，并且与激光室分开设置在壳体中。
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公开(公告)号：US20150246848A1
公开(公告)日：2015-09-03
申请号：US14715189
申请日：2015-05-18
Inventor： Hiroshi Ikenoue , Osamu Wakabayashi , Hakaru Mizoguchi
CPC classification number: C03C23/0025 , B23K26/034 , B23K26/0622 , C03B33/0222 , H01S3/0092 , H01S3/0971 , H01S3/10015 , H01S3/1055 , H01S3/115 , H01S3/1301 , H01S3/134 , H01S3/2232 , H01S3/2308 , H01S3/2375 , H01S3/2391 , Y02P40/57
Abstract: Included are a laser light source (10) configured to output pulsed laser light with an intensity peak in a wavelength range from 8 μm to 11 μm and a pulse width of 30 ns or less, an optical system (40) configured to condense the pulsed laser light toward a workpiece (70) and allow the workpiece to be irradiated with the condensed pulsed laser light, and a controller (60) configured to control a repetition frequency of the pulsed laser light that is to be outputted from the laser light source (10) to be 25 kHz or greater. This suppresses thermal diffusion and increases an absorption coefficient of a laser irradiated part of the workpiece (70), and suppresses a formed hole from being in a tapered shape and suppresses formation of uplifting around the hole upon performing of minute drilling.
Abstract translation: 包括：激光源（10），被配置为输出具有8μm至11μm的波长范围内的强度峰值和30ns或更小的脉冲宽度的脉冲激光;光学系统（40），被配置为使脉冲 激光朝向工件（70）并且允许工件用凝结的脉冲激光照射;以及控制器（60），其被配置为控制将从激光光源输出的脉冲激光的重复频率（ 10）为25kHz以上。 这抑制了热扩散并增加了工件（70）的激光照射部分的吸收系数，并且抑制了形成为锥形的孔，并且在进行微小钻孔时抑制了在孔附近形成隆起。
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公开(公告)号：US08927951B2
公开(公告)日：2015-01-06
申请号：US14084558
申请日：2013-11-19
Applicant: Gigaphoton Inc.
Inventor： Hiroshi Umeda , Takashi Ohara , Osamu Wakabayashi
IPC: H05G2/00
Abstract: A target supply device may include a tank having a nozzle, a first electrode provided with a first through-hole, a second electrode provided with a second through-hole, a third electrode disposed within the tank, an anchoring portion configured to anchor the first electrode and the second electrode to the tank so that insulation among the nozzle, the first electrode, and the second electrode is maintained, and so that a center axis of the nozzle is positioned within the first through-hole and the second through-hole, a first projecting portion that is an integrated part of at least one of the first electrode and the second electrode and that is configured to project toward the nozzle, and a second projecting portion that is an integrated part of at least the second electrode and that is configured to project so as to be positioned between the first electrode and the second electrode.
Abstract translation: 目标供给装置可以包括具有喷嘴的罐，设置有第一通孔的第一电极，设置有第二通孔的第二电极，设置在罐内的第三电极，锚定部分， 电极和第二电极连接到罐，使得保持喷嘴，第一电极和第二电极之间的绝缘，并且使得喷嘴的中心轴线位于第一通孔和第二通孔内， 第一突出部，其是第一电极和第二电极中的至少一个的一体部分，并且被构造成朝向喷嘴突出;第二突出部，其是至少第二电极的一体部分， 被配置成突出以便定位在第一电极和第二电极之间。
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