-
公开(公告)号：US4595570A
公开(公告)日：1986-06-17
申请号：US772208
申请日：1985-09-05
Applicant: Kenji Fukuta , Takaoki Kaneko , Yoshinobu Takahashi
Inventor： Kenji Fukuta , Takaoki Kaneko , Yoshinobu Takahashi
CPC classification number: H01J37/32357 , B01J3/006 , B05D3/144 , B29C59/14
Abstract: An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber. A plasma introducing port is formed in the wall of the reaction chamber. A plasma-irradiating pipe is connected to the plasma introducing port for injecting the plasma into the reaction chamber to irradiate the surfaces of the works. A discharge port is formed in the wall of the reaction chamber to reduce the internal pressure of the reaction chamber. A plasma diffuser includes a rotatable vane for diffusing the flow of plasma to distribute uniform density of plasma in the reaction chamber. A plurality of deflecting plates projecting from the inner wall of the reaction chamber toward the interior thereof may also be provided to diffuse the flow of plasma in the reaction chamber. In a method, a plurality of the works are rotated in relation to each other about a common axis, and also individual works are rotated independently from each other about their own axes.
Abstract translation: 一种用于等离子体处理的装置，其能够通过在真空反应室内用微波放电等离子体照射工件的表面来等离子体处理树脂材料的工作。 在反应室的壁上形成等离子体引入口。 等离子体照射管连接到等离子体引入口，用于将等离子体注入到反应室中以照射工件的表面。 在反应室的壁上形成排出口，以减小反应室的内部压力。 等离子体扩散器包括用于扩散等离子体流以在反应室中分配均匀密度的等离子体的可旋转叶片。 还可以设置从反应室的内壁向其内部突出的多个偏转板，以使等离子体的流动扩散到反应室中。 在一种方法中，多个作品围绕公共轴线相对于彼此旋转，并且单个作品围绕其自己的轴线彼此独立地旋转。
-
公开(公告)号：US4405435A
公开(公告)日：1983-09-20
申请号：US296314
申请日：1981-08-26
Applicant: Hideki Tateishi , Tsuneaki Kamei , Katsuo Abe , Shigeru Kobayashi , Susumu Aiuchi , Masashi Nakatsukasa , Nobuyuki Takahashi , Ryuji Sugimoto
Inventor： Hideki Tateishi , Tsuneaki Kamei , Katsuo Abe , Shigeru Kobayashi , Susumu Aiuchi , Masashi Nakatsukasa , Nobuyuki Takahashi , Ryuji Sugimoto
CPC classification number: B01J3/006 , C23C14/566 , Y10S414/137 , Y10S414/139
Abstract: An apparatus for performing continuous treatment in vacuum including an inlet chamber, a first intermediate chamber, at least one vacuum treating chamber, a second intermediate chamber and a withdrawing chamber arranged in the indicated order in a direction in which base plates are successively transferred. An opening device normally closed and opened when a base plate is transferred therethrough is mounted on a wall at the inlet of the inlet chamber, between the adjacent chambers and on a wall at the outlet side of the withdrawing chamber. A conveyor device for conveying each base plate in a horizontal direction through the opening device is mounted in each of the chambers, and an evacuating device is also mounted in each chamber. A base plate storing device for storing a plurality of base plates in a magazine is mounted in the first and second intermediate chambers. At least one vacuum treating device is mounted in the vacuum treating chamber.
Abstract translation: 一种用于在真空中进行连续处理的装置，包括入口室，第一中间室，至少一个真空处理室，第二中间室和排出室，其按照依次传送基板的方向以指示的顺序排列。 安装在入口室入口的壁上，在相邻的室之间和在抽出室的出口侧的壁上的壁上安装有一个通常关闭和打开底板的打开装置。 用于通过打开装置沿水平方向输送每个基板的输送装置安装在每个室中，并且排气装置也安装在每个室中。 在第一和第二中间室中安装有用于将多个基板存储在盒中的基板存储装置。 至少一个真空处理装置安装在真空处理室中。
-
公开(公告)号：US4335079A
公开(公告)日：1982-06-15
申请号：US198779
申请日：1980-10-20
Applicant: John E. Vander Mey
Inventor： John E. Vander Mey
IPC: B01J3/00 , B01J10/02 , B01J19/28 , C07C303/00 , B01J3/02
CPC classification number: B01J10/02 , B01J19/28 , B01J3/006 , C07C309/62 , B01J2219/00123 , B01J2219/1942
Abstract: A continuous process is disclosed which comprises introducing a sulfonatable or sulfatable organic liquid onto a rotating reaction surface as a thin film, rotating the reaction surface at a velocity such that the thin film is continuously moved toward the periphery of the reaction surface, dividing the reaction surface into a plurality of areas, depositing within each area a controlled quantity of gaseous sulfur trioxide over the liquid film, maintaining the pressure during the reaction at subatmospheric levels, controlling the temperature of the reaction surface, moving the reaction product by centrifugal action to the periphery of the reaction surface and continuously collecting the reaction product.An apparatus for carrying out such a process is also disclosed.
Abstract translation: 公开了一种连续的方法，其包括将可磺化或可硫化的有机液体作为薄膜引入到旋转的反应表面上，以使得薄膜连续移动到反应表面的周边的速度旋转反应表面， 将表面沉积到多个区域中，在液体膜内在每个区域内沉积受控量的气态三氧化硫，将反应期间的压力维持在低于大气压的水平，控制反应表面的温度，通过离心作用将反应产物移动到 反应表面的周边，并连续收集反应产物。 还公开了一种用于执行这种处理的装置。
-
公开(公告)号：US4306515A
公开(公告)日：1981-12-22
申请号：US10166
申请日：1979-02-07
Applicant: Otto Winkler
Inventor： Otto Winkler
CPC classification number: C23C14/564 , B01J3/006
Abstract: The vacuum treating device, comprises a housing defining an interior treatment chamber which is connected to a pump for evacuating the chamber. The carrier for holding a product is mounted within the housing in opposition to a holder for the material which is to be vaporized to form a coating. The support structure is mounted within the housing at a spaced location from each of the walls thereof and it provides means for supporting a heatable foil material. In addition, a heater is provided for heating the foil which is located between the foil and the corresponding wall and advantageously comprises a heater which is heatable by an electric current. The heater may be a device, for example, which produces a gas discharge using an electrode. The construction includes an interior frame having posts for supporting the electrical heater and provisions for supporting the foil which advantageously comprises individual magnets which are positioned over the metal frame.
Abstract translation: 真空处理装置包括限定内部处理室的外壳，该室与泵连接以排空室。 用于保持产品的托架安装在壳体内，与用于形成涂层的材料的保持器相对。 支撑结构安装在壳体内与其每个壁隔开的位置处，并且其提供用于支撑可加热箔材料的装置。 此外，提供加热器，用于加热位于箔和对应的壁之间的箔，并且有利地包括可通过电流加热的加热器。 加热器可以是例如使用电极产生气体放电的装置。 该结构包括具有用于支撑电加热器的支柱的内部框架和用于支撑箔片的装置，其有利地包括位于金属框架上方的单个磁体。
-
115.发明授权
公开(公告)号：US4305725A
公开(公告)日：1981-12-15
申请号：US198833
申请日：1980-10-20
Applicant: Nicholas F. Gubitose , Michael J. Zelinka
Inventor： Nicholas F. Gubitose , Michael J. Zelinka
Abstract: A method and apparatus for outgassing raw materials includes the steps of and means for heating the material to a temperature of about 800.degree. C. and maintaining that temperature for a first bake out period during which the material is maintained at a pressure of about 200 millitorr and for a second bake out period during which the material is maintained at a pressure of about 5 millitorr or less. During the first bake out period, an inert gas is backstreamed through the raw material.
Abstract translation: 用于脱气原料的方法和装置包括以下步骤和装置：将材料加热到约800℃的温度，并将该温度保持在第一烘烤期间，在此期间材料保持在约200毫托 以及在第二烘烤期间，材料保持在约5毫托或更低的压力。 在第一次烘烤期间，惰性气体通过原料回流。
-
Patent Agency Ranking
公开(公告)号：US4205623A
公开(公告)日：1980-06-03
申请号：US905406
申请日：1978-05-15
Applicant: Gunard O. B. Mahl
Inventor： Gunard O. B. Mahl
Abstract: A thin-film deposition apparatus comprises a cabinet having a vessel mounted therein which defines a vacuum chamber adapted to retain processed articles. A vacuum unit is mounted in the cabinet to communicate with an opening defined in the vacuum chamber whereby the chamber may be evacuated upon actuation of the pump of the vacuum unit. A door is movably mounted on a front panel of the cabinet for movement between closed and opened positions and a fan is preferably mounted on the cabinet and above the door to blow a laminar airflow over the front panel of the cabinet.
Abstract translation: 薄膜沉积设备包括一个其中安装有容器的机柜，该容器限定适于保持处理过的物品的真空室。 真空单元安装在机柜中以与限定在真空室中的开口连通，由此在真空单元的泵的致动时腔可被抽真空。 门可移动地安装在机柜的前面板上，用于在关闭位置和打开位置之间移动，并且风扇优选地安装在机柜上并在门上方以将层流气流吹过机壳前面板。
-
公开(公告)号：US4184448A
公开(公告)日：1980-01-22
申请号：US963062
申请日：1978-11-22
Applicant: Hans Aichert , Walter Dietrich , Alfred Hauff , Herbert Stephan , Friedrich Stark
Inventor： Hans Aichert , Walter Dietrich , Alfred Hauff , Herbert Stephan , Friedrich Stark
CPC classification number: C23C14/566 , B01J3/006 , Y10S414/137 , Y10S414/139
Abstract: Apparatus for batch coating of substrates under vacuum including a vacuum chamber with a coating system and a plurality of lock chambers with substrate holders which can be introduced into the vacuum chamber. At least two lock chambers with substrate holders are positioned on a common axis on opposite sides of the vacuum chamber. Each lock chamber is provided on the side facing the vacuum chamber with a lock valve. The vacuum chamber is likewise provided with lock valves on the sides facing the lock chambers whereby the lock chambers can be coupled selectively with the vacuum chamber through the individual lock valves.
Abstract translation: 用于在真空下批量涂布基材的装置，包括具有涂层系统的真空室和具有可被引入真空室中的基板保持件的多个锁定室。 具有衬底保持器的至少两个锁定室位于真空室的相对侧上的公共轴上。 每个锁定室设置在面向真空室的一侧，并具有锁定阀。 真空室同样在面向锁定室的一侧设置有锁定阀，由此锁定室可以通过单独的锁定阀与真空室选择性地联接。
-
公开(公告)号：US4182749A
公开(公告)日：1980-01-08
申请号：US862514
申请日：1977-12-20
Applicant: Malcolm L. H. Green , Vivian J. Hammond
Inventor： Malcolm L. H. Green , Vivian J. Hammond
Abstract: Apparatus for the chemical synthesis of an evaporant and a liquid has a cryogenic pumping device between the evaporant source and the reaction region and a pump causes the liquid to be continuously recirculated until the reaction is completed, the pressure in the evaporation region being maintained substantially lower than that in the reaction region by differential pumping.
Abstract translation: 用于化学合成蒸发器和液体的设备在蒸发源和反应区域之间具有低温泵送装置，并且泵使液体连续再循环直到反应完成，蒸发区域中的压力维持在较低水平 比在反应区域通过差示泵送。
-
公开(公告)号：US3947244A
公开(公告)日：1976-03-30
申请号：US417653
申请日：1973-11-20
Applicant: Lazaros J. Lazaridis
Inventor： Lazaros J. Lazaridis
CPC classification number: B01J3/006 , B01L7/00 , C21D1/773 , F28D15/0233 , F28D15/0266 , F28D15/0275
Abstract: A vacuum furnace heats articles by radiation from a condenser portion of a heat pipe. The heat pipe further includes an adiabatic portion passing through the enclosing wall of the furnace and an evaporator portion outside the enclosure. The evaporator portion is preferably heated by a gas-fired burner which may surround it, and the heat pipe acts as a flux converter accepting heat outside the enclosure and delivering heat inside the enclosure to the articles to be heated. The condenser portion of the heat pipe may be panel-shaped and is disposed adjacent the articles to be heat-treated. In the more elaborate forms of the invention involving condenser panels, the condenser panel, or each condenser panel where several heat pipes are used, is a cylindrical section which partially, or substantially completely, surrounds the articles. The evaporator portion and the condenser portion of the heat pipe are connected by the adiabatic portion which is so arranged that heat loss is minimized at the point where the heat pipe passes through the furnace enclosure.
-
公开(公告)号：US3563049A
公开(公告)日：1971-02-16
申请号：US3563049D
申请日：1969-01-16
Applicant: ALBERT A SCHNERRING , JOHN J LIPARI
Inventor： SCHNERRING ALBERT A
Abstract: APPARATUS CAPABLE OF USE AS AN ASPIRATOR FOR DRAWING A CONSTANT VACUUM AND FOR USE IN CIRCULATING COOLING SYSTEMS. THE APPARATUS IS PORTABLE AND INCLUDES AN ASPIRATOR AND MEANS ASSOCIATED THEREWITH FOR CREATING A VACUUM AT A CONTROLLED CONSTANT RATE.
-
-
-
-
-
-
-
-
-
Search Results
391
records
(took 0.025 seconds)
