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    Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective
    115.
    发明授权
    Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective 有权
    具有这种反射镜的镜面投影物镜，以及用于具有这种投射物镜的微光刻的投影曝光装置

    公开(公告)号：US09575224B2

    公开(公告)日：2017-02-21

    申请号：US13846785

    申请日：2013-03-18

    Applicant: Carl Zeiss SMT GmbH

    Inventor： Rolf Freimann ,  Norman Baer ,  Guido Limbach ,  Thure Boehm ,  Gero Wittich

    IPC: F21V9/04 ,  F21V9/06 ,  G02B5/08 ,  G02B5/20 ,  B82Y10/00 ,  G21K1/06

    CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061

    Abstract: A mirror (1a; 1a′; 1b; 1b; 1c; 1c′) with a substrate (S) and a layer arrangement configured such that light (32) having a wavelength below 250 nm and incident on the mirror at at least an angle of incidence of between 0° and 30° is reflected with more than 20% of its intensity. The layer arrangement has at least one surface layer system (P′″) having a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include a high refractive index layer (H′″) and a low refractive index layer (L′″). The layer arrangement has at least one graphene layer. Use of graphene (G, SPL, B) on optical elements reduces surface roughness to below 0.1 nm rms HSFR and/or protects the EUV element against a radiation-induced volume change of more than 1%. Graphene is also employed as a barrier layer to prevent layer interdiffusion.

    Abstract translation: 具有衬底（S）的反射镜（1a; 1a'; 1b; 1b; 1c; 1c'）和被配置为使得波长低于250nm的光（32）至少以角度入射到反射镜上的层 0°和30°之间的发生率反映在其强度的20％以上。 层布置具有至少一个表层系统（P“），其具有至少两个单独层的周期（P3）的周期性序列，其中周期（P3）包括高折射率层（H”“）和 低折射率层（L“”）。 层布置具有至少一个石墨烯层。 石墨烯（G，SPL，B）在光学元件上的使用将表面粗糙度降低到低于0.1nm rms HSFR，和/或保护EUV元件免受辐射诱导的体积变化超过1％。 石墨烯也被用作阻挡层以防止层相互扩散。

    High brightness X-ray absorption spectroscopy system
    116.
    发明授权
    High brightness X-ray absorption spectroscopy system 有权
    高亮度X射线吸收光谱系统

    公开(公告)号：US09448190B2

    公开(公告)日：2016-09-20

    申请号：US14636994

    申请日：2015-03-03

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

    IPC: H01J35/08 ,  G01N23/207 ,  H01J35/14 ,  G01N23/06

    CPC classification number: G01N23/2076 ,  G01N23/085 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  H01J35/08 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

    Abstract: This disclosure presents systems for x-ray absorption fine structure (XAFS) measurements that have x-ray flux and flux density several orders of magnitude greater than existing compact systems. These are useful for laboratory or field applications of x-ray absorption near-edge spectroscopy (XANES) or extended x-ray fine absorption structure (EXFAS) spectroscopy. The higher brightness is achieved by using designs for x-ray targets that comprise a number of aligned microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment with higher electron density and/or higher energy electrons, leading to greater x-ray brightness and high flux. The high brightness x-ray source is then coupled to an x-ray reflecting optical system to collimate the x-rays, and a monochromator, which selects the exposure energy. Absorption spectra of samples using the high flux monochromatic x-rays can be made using standard detection techniques.

    Abstract translation: 本公开提供了x射线吸收精细结构（XAFS）测量的系统，其具有比现有紧凑系统大几个数量级的x射线通量和通量密度。 这些对于x射线吸收近边缘光谱（XANES）或扩展X射线精细吸收结构（EXFAS）光谱的实验室或现场应用是有用的。 通过使用X射线靶的设计来实现更高的亮度，所述X射线靶包括与具有高导热性的基底紧密热接触制造的x射线产生材料的多个对准微结构。 这允许用更高电子密度和/或更高能量的电子进行轰击，导致更大的x射线亮度和高通量。 然后将高亮度x射线源耦合到X射线反射光学系统以准直x射线，以及选择曝光能量的单色仪。 使用高通量单色x射线的样品的吸收光谱可以使用标准检测技术进行。

    MULTILAYER MIRROR
    117.
    发明申请
    MULTILAYER MIRROR 审中-公开
    MULTILERER MIRROR

    公开(公告)号：US20160202396A1

    公开(公告)日：2016-07-14

    申请号：US15078105

    申请日：2016-03-23

    Applicant: Carl Zeiss SMT GmbH

    Inventor： Aksel GOEHNERMEIER ,  Gisela VON BLANCKENHAGEN

    IPC: G02B5/08 ,  G03F7/20 ,  G21K1/06

    CPC classification number: G02B5/0816 ,  G02B5/0891 ,  G03F7/702 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061

    Abstract: A multilayer mirror for reflecting extreme ultraviolet (EUV) radiation, the mirror has a substrate and a stack of layers formed on the substrate. The stack of layers comprises layers including a low index material and a high index material, the low index material having a lower real part of the refractive index than the high index material at a given operating wavelength λ. The mirror provides a first peak of reflectivity of 20% or more at a first wavelength λ1 in a first wavelength band extending from 6 nm to 7 nm and a second peak of reflectivity of 20% or more at a second wavelength λ2 in a second wavelength band extending from 12.5 nm to 15 nm.

    Abstract translation: 用于反射极紫外（EUV）辐射的多层反射镜，反射镜具有在基板上形成的基底和一叠层。 层叠层包括低折射率材料和高折射率材料的层，低折射率材料在给定的工作波长λ下具有比高折射率材料更低的折射率部分。 反射镜在从第一波长λ1延伸到6nm至7nm的第一波长λ1处提供20％以上的反射率的第一峰值，而在第二波长处的第二波长λ2处提供20％以上的反射率的第二峰值 带从12.5nm延伸到15nm。

    Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror
    119.
    发明授权
    Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror 有权
    偏转镜和用于微光刻的投影曝光装置，包括这种偏转镜

    公开(公告)号：US09341958B2

    公开(公告)日：2016-05-17

    申请号：US14032724

    申请日：2013-09-20

    Applicant: CARL ZEISS SMT GmbH

    Inventor： Hartmut Enkisch ,  Stephan Muellender ,  Martin Endres

    IPC: G03B27/54 ,  G03F7/20 ,  G02B17/06 ,  G21K1/06 ,  B82Y10/00

    CPC classification number: G03F7/702 ,  B82Y10/00 ,  G02B17/06 ,  G02B17/0663 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70316 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

    Abstract: A deflection mirror (1, 501, etc.) for a microlithography projection exposure apparatus for illuminating an object field in an object plane of the projection exposure apparatus (1067) using the deflection mirror with grazing incidence. This deflection mirror has a substrate (3, 503, etc.) and at least one layer system (5, 505, etc.), and during operation light impinges on said mirror at a multiplicity of angles of incidence, wherein the layer system is designed such that, for light having a wavelength of less than 30 nm, for an angle of incidence of between 55° and 70°, the variation of the reflectivity is less than 20%, in particular less than 12%.

    Abstract translation: 一种用于使用具有掠入射的偏转镜照射投影曝光设备（1067）的物平面中的物场的微光刻投影曝光设备的偏转镜（1,501等）。 该偏转镜具有衬底（3,503等）和至少一个层系（5,505等），并且在操作期间，光以多个入射角撞击在所述反射镜上，其中层系是 设计成使得对于波长小于30nm的光，对于入射角在55°和70°之间的反射率的变化小于20％，特别是小于12％。

    COLOR X-RAY HISTOLOGY FOR MULTI-STAINED BIOLOGIC SAMPLE
    120.
    发明申请
    COLOR X-RAY HISTOLOGY FOR MULTI-STAINED BIOLOGIC SAMPLE 有权
    多色生物样品的颜色X射线分类

    公开(公告)号：US20140301528A1

    公开(公告)日：2014-10-09

    申请号：US14354855

    申请日：2012-10-29

    Applicant: THE UNIVERSITY OF CHICAGO

    Inventor： Patrick La Riviere

    IPC: G01N23/04

    CPC classification number: G01N23/04 ,  A61B6/032 ,  A61B6/482 ,  A61B6/508 ,  B82Y10/00 ,  G01N23/046 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/0766 ,  G01N2223/6126 ,  G06T19/00 ,  G06T2210/41 ,  G21K2201/061 ,  G21K2201/064

    Abstract: Systems and methods are provided for staining tissue with multiple biologically specific heavy metal stains and then performing X-ray imaging, either in projection or tomography modes, using either a plurality of illumination energies or an energy sensitive detection scheme. The resulting energy-weighted measurements can then be used to decompose the resulting images into quantitative images of the distribution of stains. The decomposed images may be false-colored and recombined to make virtual X-ray histology images. The techniques thereby allow for effective differentiation between two or more X-ray dyes, which had previously been unattainable in 3D imaging, particularly 3D imaging of features at the micron resolution scale. While techniques are described in certain example implementations, such as with microtomography, the techniques are scalable to larger fields of view, allowing for use in 3D color, X-ray virtual histology of pathology specimens.

    Abstract translation: 提供了用多个生物特异性重金属染色染色组织的系统和方法，然后使用多个照明能量或能量敏感检测方案，以投影或断层摄影模式进行X射线成像。 然后，所得到的能量加权测量可用于将所得图像分解成污渍分布的定量图像。 分解图像可能是假色的并重新组合以制作虚拟X射线组织学图像。 因此，这些技术允许两种或多种X射线染料之间的有效区分，其先前在3D成像中是不可实现的，特别是在微米分辨率刻度上的特征的3D成像。 虽然技术在某些示例实现中被描述，例如利用微影像技术，但是这些技术可扩展到更大的视野，允许在3D颜色，病理标本的X射线虚拟组织学中使用。

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