公开(公告)号：US20090104103A1

公开(公告)日：2009-04-23

申请号：US12336017

申请日：2008-12-16

Applicant: Noriyuki AGATA ,  Shinya KIKUGAWA ,  Yutaka SHIMIZU ,  Kazumi YOSHIDA ,  Masatoshi NISHIMOTO

Inventor： Noriyuki AGATA ,  Shinya KIKUGAWA ,  Yutaka SHIMIZU ,  Kazumi YOSHIDA ,  Masatoshi NISHIMOTO

IPC: C01B33/12

CPC classification number: C03C3/06 ,  C03C2201/02 ,  C03C2201/32 ,  C03C2201/50 ,  C30B7/10 ,  C30B29/18 ,  Y10T117/1008

Abstract: An object of the present invention is to provide an artificial quartz member inhibited from suffering the decrease in transmittance in a laser light wavelength region which is caused by long-term irradiation with a laser light having a wavelength of 200 nm or shorter; and a process for producing the artificial quartz member. The invention provides an artificial quartz member for use as an optical element to be irradiated with a laser light having a wavelength of 200 nm or shorter, having an aluminum content of 200 ppb or lower.

Abstract translation: 本发明的目的在于提供一种人造石英部件，该人造石英部件由于长时间照射波长为200nm以下的激光而导致的激光波长区域的透射率降低; 以及人造石英部件的制造方法。 本发明提供一种人造石英部件，其用作要用200ppm或更低的铝含量的波长为200nm或更短的激光照射的光学元件。

公开(公告)号：US20090098997A1

公开(公告)日：2009-04-16

申请号：US12282567

申请日：2007-03-26

Applicant: Toshihiro Kasai

Inventor： Toshihiro Kasai

IPC: C03C3/04 ,  C03B8/00

CPC classification number: C03B19/12 ,  C03C1/008 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/22

Abstract: A process for the production of a self-supporting glass film is described. The method includes the steps of preparing a mixture containing a colloidal silica sol, at least one alkanolamine organic additive and an organic binder; coating the mixture onto a base material; drying the coated mixture to form a precursor film on the base material; releasing the precursor film from the base material; and firing the released precursor film to form a self-supporting glass film. Self-supporting glass films produced by the disclosed process are also described.

Abstract translation: 描述了制造自支撑玻璃膜的方法。 该方法包括制备含有胶体二氧化硅溶胶，至少一种链烷醇胺有机添加剂和有机粘合剂的混合物的步骤; 将混合物涂覆在基材上; 干燥涂覆的混合物以在基材上形成前体膜; 从基材释放前体膜; 并焙烧释放的前体膜以形成自支撑玻璃膜。 还描述了通过公开的方法制备的自支撑玻璃膜。

公开(公告)号：US07427387B2

公开(公告)日：2008-09-23

申请号：US11405584

申请日：2006-04-18

Applicant: Yoshio Katsuro ,  Keiji Yamahara ,  Takashi Yamaguchi ,  Yutaka Mori

Inventor： Yoshio Katsuro ,  Keiji Yamahara ,  Takashi Yamaguchi ,  Yutaka Mori

IPC: C01B33/12 ,  C01B33/18 ,  C01B33/157 ,  C01B33/158 ,  C03C3/06 ,  C08K3/36

CPC classification number: C03C1/006 ,  C03B19/01 ,  C03B19/09 ,  C03B19/1065 ,  C03B19/1095 ,  C03B2201/03 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2203/26

Abstract: Subjects for the invention are to obtain a quartz powder having a high purity and high quality and a process for producing the same and to obtain a glass molding formed by melting and molding the powder and extremely reduced in bubble inclusion.The invention provides a quartz powder, preferably a synthetic quartz powder obtained by the sol-gel method, which, upon heating from room temperature to 1,700° C., generates gases in which the amount of CO is 300 nl/g or smaller and the amount of CO2 is 30 nl/g or smaller.

Abstract translation: 本发明的目的是获得具有高纯度和高质量的石英粉及其制造方法，并获得通过熔融和成型粉末形成并且气泡夹杂物极度降低的玻璃模制品。 本发明提供一种石英粉末，优选通过溶胶 - 凝胶法获得的合成石英粉末，其在室温至1700℃加热时产生CO的量为300nl / g或更小的气体， CO 2 2的量为30nl / g以下。

公开(公告)号：US07082789B2

公开(公告)日：2006-08-01

申请号：US10300739

申请日：2002-11-21

Applicant: Masanobu Ezaki ,  Lian-Sheng Pan ,  Seiji Taniike

Inventor： Masanobu Ezaki ,  Lian-Sheng Pan ,  Seiji Taniike

IPC: C03B20/00

CPC classification number: C30B35/00 ,  C03C3/06 ,  C03C15/00 ,  C03C2201/02 ,  C03C2203/52

Abstract: A silica glass member for semiconductor in which each concentration of Fe, Cu, Cr and Ni is 5 ppb or less and the concentration of an OH group is 30 ppm or less and which has a viscosity of 1013.0 poise or more at 1200° C. is provided as a silica glass member for semiconductor having high heat-resistance and higher purity.

Abstract translation: Fe，Cu，Cr和Ni的各浓度为5ppb以下，OH基浓度为30ppm以下，粘度为10〜13.0的半导体用硅玻璃构件， 作为半导体用石英玻璃构件，具有高耐热性和高纯度，提供了1200℃以上的波峰或更多。

公开(公告)号：US07063826B2

公开(公告)日：2006-06-20

申请号：US10758395

申请日：2004-01-16

Applicant: Yoshio Katsuro ,  Keiji Yamahara ,  Takashi Yamaguchi ,  Yutaka Mori

Inventor： Yoshio Katsuro ,  Keiji Yamahara ,  Takashi Yamaguchi ,  Yutaka Mori

IPC: C01B33/158 ,  C01B33/18

CPC classification number: C03C1/006 ,  C03B19/01 ,  C03B19/09 ,  C03B19/1065 ,  C03B19/1095 ,  C03B2201/03 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2203/26

Abstract: Subjects for the invention are to obtain a quartz powder having a high purity and high quality and a process for producing the same and to obtain a glass molding formed by melting and molding the powder and extremely reduced in bubble inclusion.The invention provides a quartz powder, preferably a synthetic quartz powder obtained by the sol-gel method, which, upon heating from room temperature to 1,700° C., generates gases in which the amount of CO is 300 nl/g or smaller and the amount of CO2 is 30 nl/g or smaller.

Abstract translation: 本发明的目的是获得具有高纯度和高质量的石英粉及其制造方法，并获得通过熔融和成型粉末形成并且气泡夹杂物极度降低的玻璃模制品。 本发明提供一种石英粉末，优选通过溶胶 - 凝胶法获得的合成石英粉末，其在室温至1700℃加热时产生CO的量为300nl / g或更小的气体， CO 2 2的量为30nl / g以下。

公开(公告)号：US20040250572A1

公开(公告)日：2004-12-16

申请号：US10782935

申请日：2004-02-23

Applicant: Carl Zeiss SMT AG

Inventor： Ralf Lindner ,  Frank Stietz ,  Udo Nothelfer ,  Eric Eva

IPC: C03B019/06

CPC classification number: C03C3/06 ,  C03B19/1423 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2207/36 ,  C03C2201/02 ,  C03C2203/40 ,  Y02P40/57

Abstract: A method for producing a quartz glass material with high resistance to radiation-induced density modifications when exposed to ultraviolet radiation at about 193 nm and energy densities of the order of the working energy densities of optical systems for microlithography, in which the peroxy defect level in the quartz glass material is minimized. In this way the creation of closely neighbored hydroxyl groups can be inhibited, which have been identified as an essential cause for radiation induced density reduction of the quartz glass material.

Abstract translation: 一种用于制造在暴露于约193nm的紫外线辐射下具有高耐辐射诱导密度变化的石英玻璃材料的方法，以及用于微光刻的光学系统的工作能量密度级的能量密度，其中过氧缺陷水平 石英玻璃材料最小化。 以这种方式，可以抑制紧密相邻的羟基的产生，这已被认为是石英玻璃材料的辐射诱导密度降低的重要原因。

公开(公告)号：US20040161375A1

公开(公告)日：2004-08-19

申请号：US10758395

申请日：2004-01-16

Applicant: MITSUBISHI CHEMICAL CORPORATION

Inventor： Yoshio Katsuro ,  Keiji Yamahara ,  Takashi Yamaguchi ,  Yutaka Mori

IPC: C03C003/06 ,  C01B033/12

CPC classification number: C03C1/006 ,  C03B19/01 ,  C03B19/09 ,  C03B19/1065 ,  C03B19/1095 ,  C03B2201/03 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2203/26

Abstract: Subjects for the invention are to obtain a quartz powder having a high purity and high quality and a process for producing the same and to obtain a glass molding formed by melting and molding the powder and extremely reduced in bubble inclusion. The invention provides a quartz powder, preferably a synthetic quartz powder obtained by the sol-gel method, which, upon heating from room temperature to 1,700null C., generates gases in which the amount of CO is 300 nl/g or smaller and the amount of CO2 is 30 nl/g or smaller.

Abstract translation: 本发明的目的是获得具有高纯度和高质量的石英粉及其制造方法，并获得通过熔融和成型粉末形成并且气泡夹杂物极度降低的玻璃模制品。 本发明提供一种石英粉末，优选通过溶胶 - 凝胶法获得的合成石英粉末，其在室温至1700℃加热时产生CO的量为300nl / g或更小的气体， CO 2的量为30nl / g以下。

公开(公告)号：US20030101748A1

公开(公告)日：2003-06-05

申请号：US10300739

申请日：2002-11-21

Applicant: TOSHIBA CERAMICS CO., LTD.

Inventor： Masanobu Ezaki ,  Lian-Sheng Pan ,  Seiji Taniike

IPC: C03B019/06

CPC classification number: C30B35/00 ,  C03C3/06 ,  C03C15/00 ,  C03C2201/02 ,  C03C2203/52

Abstract: A silica glass member for semiconductor in which each concentration of Fe, Cu, Cr and Ni is 5 ppb or less and the concentration of an OH group is 30 ppm or less and which has a viscosity of 1013.0 poise or more at 1200null C. is provided as a silica glass member for semiconductor having high heat-resistance and higher purity.

Abstract translation: Fe，Cu，Cr和Ni的各浓度为5ppb以下，OH基浓度为30ppm以下，在1200℃下的粘度为1013.0泊以上的半导体用硅玻璃构件。 被提供为具有高耐热性和高纯度的半导体用石英玻璃构件。

公开(公告)号：US20020157418A1

公开(公告)日：2002-10-31

申请号：US10101437

申请日：2002-03-18

Inventor： Rahul Ganguli ,  Steven G. Colbern ,  Matthew S. Gleason

IPC: C03B008/02

CPC classification number: C03B19/12 ,  C03C1/006 ,  C03C2201/02 ,  C03C2203/22 ,  C03C2203/27 ,  Y02P40/57

Abstract: This invention resides in a process for making silica articles having few or no visible bubbles by sintering silica gels derived from a sol-gel process. The process incorporates control of pH during hydroxylation and gelation, as well as chlorination at temperatures previously considered unsuitable. The process optionally incorporates addition of dispersant to the silica solution.

Abstract translation: 本发明在于通过烧结衍生自溶胶 - 凝胶法的二氧化硅凝胶来制造具有很少或没有可见气泡的二氧化硅制品的方法。 该过程包括在羟基化和凝胶化期间pH的控制，以及先前认为不合适的温度下的氯化。 该方法任选地将分散剂加入到二氧化硅溶液中。

公开(公告)号：US20020036188A1

公开(公告)日：2002-03-28

申请号：US09964987

申请日：2001-09-26

Inventor： Douglas C. Allan ,  Nicholas F. Borrelli ,  William R. Powell ,  Thomas P. Seward III ,  Charlene M. Smith

IPC: G05G017/00 ,  C03B023/02 ,  B23K026/00

CPC classification number: G03F7/70958 ,  C03B19/06 ,  C03B19/066 ,  C03B19/1065 ,  C03B19/1453 ,  C03B20/00 ,  C03B2207/32 ,  C03C1/006 ,  C03C3/06 ,  C03C23/0025 ,  C03C2201/02 ,  C03C2203/50 ,  G03F7/70058 ,  G03F7/70216 ,  Y10S65/13

Abstract: The invention relates to fused silica having low compaction under high energy irradiation, particularly adaptable for use in photolithography applications.

Abstract translation: 本发明涉及在高能量照射下具有低压实性的熔融二氧化硅，特别适用于光刻应用。