Silica glass member for semiconductor and production method thereof
    1.
    发明申请
    Silica glass member for semiconductor and production method thereof 失效
    半导体二氧化硅玻璃及其制造方法

    公开(公告)号:US20030101748A1

    公开(公告)日:2003-06-05

    申请号:US10300739

    申请日:2002-11-21

    CPC classification number: C30B35/00 C03C3/06 C03C15/00 C03C2201/02 C03C2203/52

    Abstract: A silica glass member for semiconductor in which each concentration of Fe, Cu, Cr and Ni is 5 ppb or less and the concentration of an OH group is 30 ppm or less and which has a viscosity of 1013.0 poise or more at 1200null C. is provided as a silica glass member for semiconductor having high heat-resistance and higher purity.

    Abstract translation: Fe,Cu,Cr和Ni的各浓度为5ppb以下,OH基浓度为30ppm以下,在1200℃下的粘度为1013.0泊以上的半导体用硅玻璃构件。 被提供为具有高耐热性和高纯度的半导体用石英玻璃构件。

Patent Agency Ranking