公开(公告)号：US20120033216A1

公开(公告)日：2012-02-09

申请号：US13271014

申请日：2011-10-11

Applicant: Fang Huang

Inventor： Fang Huang

IPC: G01J4/00

CPC classification number: G01N21/23 ,  G01N2021/214 ,  G01N2201/0683

Abstract: A treatment pattern (such as a focused spot, an image, or an interferogram) projected on a treatment target may lose precision if the treatment beam must pass through a birefringent layer before reaching the target. In the general case, the birefringent layer splits the treatment beam into ordinary and extraordinary components, which propagate in different directions and form two patterns, displaced from each other, at the target layer. The degree of birefringence and the orientation of the optic axis, which influence the amount of displacement, often vary between workpieces or between loci on the same workpiece. This invention measures the orientation of the optic axis and uses the data to adjust the treatment beam incidence direction, the treatment beam polarization, or both to superpose the ordinary and extraordinary components into a single treatment pattern at the target, preventing the birefringent layer from causing the pattern to be blurred or doubled.

Abstract translation: 投影在治疗对象上的治疗方式（例如聚焦点，图像，或干涉图）如果在到达目标物体之前必须通过双折射层，则可能失去精度。 在一般情况下，双折射层将处理束分裂成普通和非凡的分量，其在不同方向上传播并在目标层处形成两个相互置换的图案。 影响位移量的光轴的双折射度和取向通常在工件之间或同一工件上的轨迹之间变化。 本发明测量光轴的取向，并使用该数据来调整治疗光束入射方向，治疗束偏振或两者以将普通和非凡成分叠加成靶上的单一处理图案，防止双折射层引起 模式被模糊或加倍。

公开(公告)号：US20120033215A1

公开(公告)日：2012-02-09

申请号：US13186144

申请日：2011-07-19

Applicant: Daniel Kandel ,  Vladimir Levinski ,  Guy Cohen

Inventor： Daniel Kandel ,  Vladimir Levinski ,  Guy Cohen

IPC: G01B11/06 ,  G01J4/00

CPC classification number: G03F7/70633 ,  G03F7/70683

Abstract: A multi-layer overlay target for use in imaging based metrology is disclosed. The overlay target includes a plurality of target structures including three or more target structures, each target structure including a set of two or more pattern elements, wherein the target structures are configured to share a common center of symmetry upon alignment of the target structures, each target structure being invariant to N degree rotation about the common center of symmetry, wherein N is equal to or greater than 180 degrees, wherein each of the two or more pattern elements has an individual center of symmetry, wherein each of the two or more pattern elements of each target structure is invariant to M degree rotation about the individual center of symmetry, wherein M is equal to or greater than 180 degrees.

Abstract translation: 公开了一种用于基于成像的计量学的多层覆盖目标。 覆盖目标包括包括三个或更多个目标结构的多个目标结构，每个目标结构包括一组两个或多个模式元素，其中目标结构被配置为在目标结构对准时共享公共对称中心，每个目标结构 目标结构相对于公共对称中心不变为N度旋转，其中N等于或大于180度，其中两个或更多个图案元素中的每一个具有单独的对称中心，其中两个或更多个图案 每个目标结构的元素对于单个对称中心的M度旋转是不变的，其中M等于或大于180度。

公开(公告)号：US08088615B2

公开(公告)日：2012-01-03

申请号：US11631846

申请日：2005-07-06

Applicant: Dominique Ausserre

Inventor： Dominique Ausserre

IPC: C12Q1/68 ,  C12M1/34 ,  G01J4/00

CPC classification number: G01N21/21

Abstract: The invention concerns an optical component for observing a sample, which includes a substrate and at least one complex index layer of predetermined thickness, designed to show a high intensity or color contrast for optical path variations, reliefs, nanometric thicknesses and diameters when it is observed by incoherent light reflection convergent around the normal incidence under polarization extinction conditions. The upper index layer has specific surface properties providing it with selective affinity relative to at least one characteristic of the sample. An analysis system includes such a component, an analysis method using the component and uses of the method.

Abstract translation: 本发明涉及用于观察样品的光学部件，其包括衬底和至少一个预定厚度的复合折射率层，被设计为当观察到光路变化，浮雕，纳米厚度和直径时显示出高的强度或颜色对比度 通过非相干光反射在极化消光条件下收敛于正常入射。 上部折射率层具有相对于样品的至少一个特征提供选择性亲和力的比表面特性。 分析系统包括这样的组件，使用该组件的分析方法和该方法的用途。

公开(公告)号：US20110310388A1

公开(公告)日：2011-12-22

申请号：US13108892

申请日：2011-05-16

Applicant: Andrew V. Hill ,  Amnon Manassen ,  Daniel Kandel ,  Vladimir Levinski ,  Joel Seligson ,  Alexander Svizher ,  David Y. Wang ,  Lawrence D. Rotter ,  Johannes D. de Veer

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Daniel Kandel ,  Vladimir Levinski ,  Joel Seligson ,  Alexander Svizher ,  David Y. Wang ,  Lawrence D. Rotter ,  Johannes D. de Veer

IPC: G01J4/00

CPC classification number: G02B27/141 ,  G01N21/474 ,  G01N21/4788 ,  G01N2021/4792 ,  G02B27/145 ,  G03F7/70633

Abstract: Systems and methods for discrete polarization scatterometry are provided.

Abstract translation: 提供了离散极化散射法的系统和方法。

公开(公告)号：US20110299081A1

公开(公告)日：2011-12-08

申请号：US13139530

申请日：2009-12-10

Applicant: John S. Manka ,  Ying Wang

Inventor： John S. Manka ,  Ying Wang

IPC: G01J4/00

CPC classification number: G01N21/211 ,  G01N33/02

Abstract: The present invention relates to a method of identifying in a fluid by measuring the amount of optical rotation the fluid causes in a beam of polarized light. The invention further provides for the use of an optional optically active marker in the fluids in order the impact the amount of rotation the fluid will cause. The invention provides a convenient and reliable means for identifying the fluid before, during and/or after the fluid's use.

公开(公告)号：US20110292390A1

公开(公告)日：2011-12-01

申请号：US13198170

申请日：2011-08-04

Applicant: Yukihiro Shibata ,  Shunji Maeda

Inventor： Yukihiro Shibata ,  Shunji Maeda

IPC: G01N21/88 ,  G01J4/00

CPC classification number: G01N21/94 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/9513

Abstract: A defect inspection apparatus includes an illumination optical system, a detection optical system which includes a reflecting objective lens, and wavelength separation optics for conducting wavelength separation, and after the wavelength separation, branching the scattered light into at least a first detection optical path and a second detection optical path. The detection optical system further includes, on the first detection optical path, a first sensor, and on the second detection optical path, a second sensor. A signal processor is provided which, in accordance with at least one of a first signal obtained from the first sensor and a second signal obtained from the second sensor, discriminates defects or defect candidates present on a surface of a sample.

Abstract translation: 缺陷检查装置包括照明光学系统，包括反射物镜的检测光学系统和用于进行波长分离的波长分离光学器件，并且在波长分离之后，将散射光分支成至少第一检测光路和 第二检测光路。 检测光学系统还在第一检测光路上包括第一传感器，并且在第二检测光路上还包括第二传感器。 提供一种信号处理器，其根据从第一传感器获得的第一信号和从第二传感器获得的第二信号中的至少一个识别存在于样品表面上的缺陷或缺陷候选物。

公开(公告)号：US08059274B2

公开(公告)日：2011-11-15

申请号：US11952223

申请日：2007-12-07

Applicant: Robert Splinter

Inventor： Robert Splinter

IPC: G01J4/00

CPC classification number: G01B9/02091 ,  A61B5/0066 ,  A61B5/6852 ,  G01B9/0205 ,  G01B2290/70 ,  G01N21/23

Abstract: An optical sensor that provides lateral viewing while maintaining light polarization is disclosed according to one embodiment of the invention. The sensor includes a sensor body, at least one waveguide and at least one refractive optical element. The sensor body may includes proximal end and a distal end. The waveguide includes a proximal end coincident near the proximal end of the sensor body and a distal end coincident at a point near the distal end of the sensor body. The waveguide may include one or more fiber optic. The waveguide may be positioned within the sensor body. The refractive optical element may be positioned within the sensor near the distal end of the waveguide and may be configured to refract light received from the distal end of the waveguide outward from the sensor. The refractive optical element may include one or more prisms.

Abstract translation: 根据本发明的一个实施例公开了一种在保持光偏振的同时提供横向观看的光学传感器。 传感器包括传感器主体，至少一个波导和至少一个折射光学元件。 传感器主体可以包括近端和远端。 波导包括在传感器主体的近端附近重合的近端和在靠近传感器主体的远端的点处重合的远端。 波导可以包括一个或多个光纤。 波导可以定位在传感器主体内。 折射光学元件可以位于传感器的靠近波导的远端附近，并且可以被配置为将从波导的远端接收的光从传感器向外折射。 折射光学元件可以包括一个或多个棱镜。

公开(公告)号：US08045146B2

公开(公告)日：2011-10-25

申请号：US12141955

申请日：2008-06-19

Applicant: Keiya Saito ,  Yasuhiro Yoshitake ,  Shunichi Matsumoto ,  Hidetoshi Nishiyama

Inventor： Keiya Saito ,  Yasuhiro Yoshitake ,  Shunichi Matsumoto ,  Hidetoshi Nishiyama

IPC: G01N21/00 ,  G01J4/00

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2021/8822 ,  G01N2021/8861 ,  G02B21/0032 ,  G02B21/0072

Abstract: The present invention provides an apparatus and a method for reviewing a defect with high throughput by detecting the defect to be reviewed with high sensitivity, comprising: an optical microscope; a correction means; and a scanning electron microscope which reviews the existing defect on the sample; wherein the optical microscope has: an optical height detection system which optically detects a vertical position of an upper surface of the sample placed on the stage; an illumination optical system which illuminates the defect with light; an image detection optical system which converges and detects reflected light or scattered light generated from the defect illuminated by the illumination optical system to obtain an image signal; and a focus adjusting means which adjusts a focus position of the optical microscope based on the vertical position of the upper surface of the sample, which is detected by the optical height detection system.

Abstract translation: 本发明提供一种通过以高灵敏度检测待检查的缺陷来检查具有高通量的缺陷的装置和方法，包括：光学显微镜; 修正手段; 和扫描电子显微镜，用于回顾样品上现有的缺陷; 其中所述光学显微镜具有：光学高度检测系统，其光学地检测放置在所述台上的样品的上表面的垂直位置; 用光照亮缺陷的照明光学系统; 会聚和检测由照明光学系统照射的缺陷产生的反射光或散射光以获得图像信号的图像检测光学系统; 以及焦点调节装置，其基于由光学高度检测系统检测到的样本的上表面的垂直位置来调整光学显微镜的对焦位置。

公开(公告)号：US08013997B2

公开(公告)日：2011-09-06

申请号：US12697079

申请日：2010-01-29

Applicant: Nataliya Nabatova-Gabain ,  Yoko Wasai

Inventor： Nataliya Nabatova-Gabain ,  Yoko Wasai

IPC: G01J4/00

CPC classification number: G01N21/211 ,  G01B11/0641 ,  G01N21/8422

Abstract: Light is irradiated onto a glass substrate of an organic EL element, and the characteristics of an organic film are analyzed. In the sample analyzing apparatus, in such a way that the glass substrate is located on the upper side, the organic EL element is placed on a stage. The light is irradiated towards the glass substrate, and an amplitude ratio and a phase difference which are related to the organic EL element are measured. Also, the sample analyzing apparatus selects a model of a structure corresponding to reflected lights K1 to K3 of the irradiated light and calculates the amplitude ratio and the phase difference. The sample analyzing apparatus compares the measured result and the result calculated from the model, and properly executes the fitting, and determines the best model among the several models and then analyzes the characteristics related to the organic EL element.

Abstract translation: 将光照射到有机EL元件的玻璃基板上，分析有机膜的特性。 在样品分析装置中，以玻璃基板位于上侧，将有机EL元件放置在台上。 将光照射到玻璃基板，并测量与有机EL元件相关的振幅比和相位差。 此外，样本分析装置选择与照射光的反射光K1至K3相对应的结构的模型，并计算振幅比和相位差。 样品分析装置比较测量结果和模型计算结果，并适当地执行拟合，并确定几个模型中的最佳模型，然后分析与有机EL元件相关的特性。

公开(公告)号：US20110188020A1

公开(公告)日：2011-08-04

申请号：US13000229

申请日：2009-05-14

Applicant: Arie Jeffrey Den Boef

Inventor： Arie Jeffrey Den Boef

IPC: G03B27/72 ,  G01J4/00

CPC classification number: G03F7/70633

Abstract: An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarization component that is orthogonal to a polarization direction of the polarized light beam. A detector measures intensity of the orthogonal polarization component. A processing unitise connected to the detector, and is arranged to process the orthogonal polarization component for overlay metrology measurement using asymmetry data derived from the orthogonal polarization component.

Abstract translation: 覆盖测量装置具有用于利用偏振光束照射样本的偏振光源和用于捕获被样品散射的光的光学系统。 光学系统包括偏振器，用于透射与偏振光束的偏振方向正交的正交偏振分量。 检测器测量正交偏振分量的强度。 一种与检测器连接的处理单元，并且被布置为使用从正交偏振分量导出的不对称数据来处理用于覆盖测量测量的正交偏振分量。