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公开(公告)号：US20160270199A1
公开(公告)日：2016-09-15
申请号：US15161628
申请日：2016-05-23
Applicant: GIGAPHOTON INC.
Inventor： Fumio IWAMOTO , Takashi SAITO , Tsukasa HORI , Osamu WAKABAYASHI
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/005
Abstract: An aspect of the present disclosure may include a gas lock cover secured to a nozzle holder and provided downstream of a nozzle. The gas lock cover may cover a periphery of an exit of the nozzle and be structured to guide gas supplied from a gas supply unit. The gas lock cover may include a hollow cylindrical part provided downstream of the nozzle and having an exit opening for outputting droplets that are outputted from the nozzle and pass through an internal cavity of the cylindrical part. The gas lock cover may include a channel for transmitting the gas supplied from the gas supply unit, the channel being structured to orient a flow of the transmitted gas so as to flow to the exit opening of the cylindrical part through the internal cavity of the cylindrical part.
Abstract translation: 本公开的一个方面可以包括固定到喷嘴保持器并设置在喷嘴下游的气体锁盖。 气体锁定盖可以覆盖喷嘴的出口的周边，并被构造成引导从气体供应单元供应的气体。 气体锁定盖可以包括设置在喷嘴下游的中空圆柱形部分，并且具有用于输出从喷嘴输出并穿过圆柱形部分的内部空腔的液滴的出口。 气体锁定盖可以包括用于传送从气体供应单元供应的气体的通道，该通道被构造成使透过气体的流动定向，以便通过圆筒形的内部空腔流到圆柱形部分的出口 部分。
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公开(公告)号：US09429847B2
公开(公告)日：2016-08-30
申请号：US15064019
申请日：2016-03-08
Applicant: Gigaphoton Inc.
Inventor： Toshihiro Nishisaka , Yukio Watanabe , Osamu Wakabayashi , Kouji Kakizaki , Michio Shinozaki
CPC classification number: G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
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公开(公告)号：US20160249443A1
公开(公告)日：2016-08-25
申请号：US15143066
申请日：2016-04-29
Applicant: Gigaphoton Inc.
Inventor： Yutaka SHIRAISHI , Toshiyuki HIRASHITA , Shinya IKESAKA
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/005 , H05G2/008
Abstract: A target supply device may include: a target generator configured to accommodate a liquid target material and having a nozzle with a nozzle hole from which the liquid target material is outputted; and a filter disposed in the target generator and made of glass, the glass reacting with the liquid target material, so that a solid reaction product is generated. The filter may include a first through-hole configured to allow the liquid target material to pass therethrough, and an inner surface of the first through-hole may be coated with a material which is not easy to react with the liquid target material.
Abstract translation: 目标供给装置可以包括：目标发生器，被配置为容纳液体目标材料，并具有喷嘴，喷嘴孔从所述喷嘴孔输出所述液体目标材料; 以及设置在靶发生器中并由玻璃制成的过滤器，玻璃与液体靶材料反应，从而产生固体反应产物。 过滤器可以包括构造成允许液体目标材料通过的第一通孔，并且第一通孔的内表面可以涂覆有不容易与液体目标材料反应的材料。
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公开(公告)号：US20160248215A1
公开(公告)日：2016-08-25
申请号：US15145016
申请日：2016-05-03
Applicant: Gigaphoton Inc.
Inventor： Natsushi SUZUKI , Osamu WAKABAYASHI , Hiroaki TSUSHIMA , Masanori YASHIRO
CPC classification number: H01S3/036 , B01D53/0446 , B01D53/346 , B01D53/685 , B01D53/82 , B01D53/86 , B01D2251/404 , B01D2251/602 , B01D2253/108 , B01D2255/20753 , B01D2255/20761 , B01D2257/2027 , B01D2258/0216 , B01D2259/40003 , H01S3/104 , H01S3/225
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
Abstract translation: 气体激光装置可以包括：激光室，其通过第一控制阀连接到第一激光气体供应源，第一激光气体供应源提供含有卤素气体的第一激光气体，并通过第二控制阀连接到第二激光气体供应源， 具有比第一激光气体低的卤素气体浓度的第二激光气体; 净化塔，其从至少一部分从激光室排出的气体中除去至少一部分卤素气体和卤素化合物; 增压泵，其通过第三控制阀连接到激光室，其将通过净化塔的气体的压力升高到高于激光室的工作气体压力的气体压力; 以及控制器，其基于从所述增压泵通过所述第三控制阀向所述激光室供给的第一量的气体计算第二量的所述第一激光气体，所述第一激光气体将被供给到所述激光室并控制 基于计算第二量的结果的第一控制阀。
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145.发明申请公开(公告)号：US20160248213A1
公开(公告)日：2016-08-25
申请号：US15146259
申请日：2016-05-04
Applicant: Gigaphoton Inc.
Inventor： Yasufumi KAWASUJI
CPC classification number: H01S3/02 , H01S3/005 , H01S3/0071 , H01S3/2308 , H05G2/003 , H05G2/008
Abstract: A laser apparatus of the present disclosure may include: a frame; a first amplifier positioned to the frame; a first input optical system positioned to the frame and configured to cause a pulse laser beam generated by an external device to enter the first amplifier; and a first output optical system positioned to the frame and configured to cause a pulse laser beam having exited from the first amplifier in a first direction to exit in a second direction that is different from the first direction.
Abstract translation: 本公开的激光装置可以包括：框架; 定位在所述框架上的第一放大器; 第一输入光学系统，定位于所述框架并且被配置为使由外部设备产生的脉冲激光束进入所述第一放大器; 以及第一输出光学系统，其定位到所述框架并且被配置为使得在第一方向上从所述第一放大器退出的脉冲激光束在与所述第一方向不同的第二方向上退出。
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Patent Agency Ranking
146.发明申请EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权极光超紫外光发生装置及极光紫外线发光装置的控制方法公开(公告)号：US20160227638A1
公开(公告)日：2016-08-04
申请号：US15096769
申请日：2016-04-12
Applicant: GIGAPHOTON INC.
Inventor： Tsukasa HORI , Fumio IWAMOTO , Hiroshi UMEDA
IPC: H05G2/00
Abstract: In an example of the present invention is an extreme ultraviolet light generation apparatus including: a droplet supply device configured to successively supply droplets; a charging electrode being configured to control charging of droplets supplied from the droplet supply unit; and a target controller configured to control electric polarities of the droplets supplied from the droplet supply unit by controlling potential of the charging electrode in such a way that successive droplets join together to become a target droplet, wherein the droplets controlled in charging by the charging electrode include a plurality of groups each composed of successive droplets, and, in each of the groups, a droplet at one end is charged positively or negatively, a droplet at the other end is uncharged or charged in a polarity being the same as a polarity of an adjacent droplet in a group adjacent to the droplet at the other end.
Abstract translation: 本发明的一个实例是一种极紫外光发生装置，包括：液滴供给装置，被配置为连续供应液滴; 充电电极被配置为控制从液滴供应单元供应的液滴的充电; 以及目标控制器，其被配置为通过控制充电电极的电位来控制从液滴供给单元提供的液滴的电极性，使得连续的液滴接合在一起成为目标液滴，其中通过充电电极控制的液滴 包括多个由连续的液滴组成的组，并且在每个组中，一端的液滴是正或负的，另一端的液滴不带电或充电，极性与极性相同 在另一端与液滴相邻的组中的相邻液滴。
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公开(公告)号：US09331450B2
公开(公告)日：2016-05-03
申请号：US14663086
申请日：2015-03-19
Applicant: Gigaphoton Inc.
Inventor： Takeshi Asayama , Hakaru Mizoguchi , Kouji Kakizaki , Hiroaki Tsushima , Osamu Wakabayashi , Kazuya Takezawa
CPC classification number: H01S3/038 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/0388 , H01S3/08009 , H01S3/09702 , H01S3/104 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
Abstract: A laser apparatus according to embodiments may include a laser chamber including a laser gain medium; a power source; a first electrode to which a voltage is applied from the power source and a second electrode that is grounded, the first and second electrodes being disposed in the laser chamber; and a connector connected to the power source, and supporting the first electrode in a way that allows the first electrode to move toward a side where the second electrode is disposed.
Abstract translation: 根据实施例的激光装置可以包括包括激光增益介质的激光室; 电源; 从电源施加电压的第一电极和接地的第二电极，第一和第二电极设置在激光室中; 以及连接到所述电源的连接器，并且以允许所述第一电极向所述第二电极设置的一侧移动的方式支撑所述第一电极。
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148.发明申请公开(公告)号：US20160044773A1
公开(公告)日：2016-02-11
申请号：US14887450
申请日：2015-10-20
Applicant: GIGAPHOTON INC.
Inventor： Masaki NAKANO , Osamu WAKABAYASHI
IPC: H05G2/00
CPC classification number: H05G2/006 , B05B9/002 , B05B12/02 , B05B17/0607 , B05B17/0615 , G03F7/70033 , G03F7/70041 , G03F7/7085 , H01L21/268 , H01L22/10 , H05G2/003 , H05G2/008
Abstract: A target supply device may include a reservoir configured to hold a target material in its interior in liquid form, a vibrating element configured to apply vibrations to the reservoir, a target sensor configured to detect droplets of the target material outputted from the reservoir, a control unit configured to set parameters based on a result of the detection performed by the target sensor, a function generator configured to generate an electrical signal having a waveform based on the parameters, and a power source configured to apply a driving voltage to the vibrating element in accordance with the electrical signal.
Abstract translation: 目标供应装置可以包括被配置为在其内部保持液体形式的目标材料的储存器，被配置为向储存器施加振动的振动元件，配置成检测从储存器输出的目标材料的液滴的目标传感器， 被配置为基于由所述目标传感器执行的检测结果来设置参数的单元，被配置为生成基于所述参数的具有波形的电信号的功能发生器，以及被配置为向所述振动元件施加驱动电压的电源 符合电信号。
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公开(公告)号：US20160035603A1
公开(公告)日：2016-02-04
申请号：US14854395
申请日：2015-09-15
Inventor： Hiroshi IKENOUE , Osamu WAKABAYASHI
IPC: H01L21/67 , B23K26/00 , B23K26/067
CPC classification number: H01L21/67115 , B23K26/0006 , B23K26/03 , B23K26/0622 , B23K26/067 , B23K26/0676 , B23K26/08 , B23K26/352 , B23K26/354 , H01L21/02532 , H01L21/02675
Abstract: Provided is a laser annealing apparatus that may include: a laser light source section configured to output pulsed laser light to be applied to a thin film formed on a workpiece; a pulse width varying section configured to vary a pulse width of the pulsed laser light; a melt state measuring section configured to detect that the thin film irradiated with the pulsed laser light is in a melt state; and a controlling section configured to determine, based on a result of detection by the melt state measuring section, a duration of time during which the thin film is in the melt state, and to control the pulse width varying section to allow the duration of time to be of a predetermined length.
Abstract translation: 提供一种激光退火装置，其可以包括：激光光源部，被配置为输出施加到形成在工件上的薄膜的脉冲激光; 脉冲宽度变化部，被配置为改变脉冲激光的脉冲宽度; 熔融状态测定部，被配置为检测用脉冲激光照射的薄膜处于熔融状态; 以及控制部，被配置为基于熔融状态测量部的检测结果确定薄膜处于熔融状态的持续时间，并且控制脉冲宽度变化部以允许持续时间 具有预定长度。
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公开(公告)号：US09253866B2
公开(公告)日：2016-02-02
申请号：US14172535
申请日：2014-02-04
Applicant: GIGAPHOTON INC.
Inventor： Hiroshi Someya , Hideto Saito
IPC: H05G2/00
CPC classification number: H05G2/008 , H05G2/006 , Y10T137/8376
Abstract: A gas lock device may include a chamber having a passage section and a connection hole that connects a surface to the passage section, an optical element that is attached to the chamber and seals the passage section, a gas supply apparatus, and a pipe that is attached at one end to the gas supply apparatus and attached at the other end to the chamber, and may define a flow channel communicating with the connection hole.
Abstract translation: 气体锁定装置可以包括具有通道部分和将表面连接到通道部分的连接孔的腔室，附接到腔室并密封通道部分的光学元件，气体供应装置和管子， 在一端连接到气体供应装置并且在另一端附接到腔室，并且可以限定与连接孔连通的流动通道。
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