公开(公告)号：US06777259B2

公开(公告)日：2004-08-17

申请号：US10129505

申请日：2002-05-06

Applicant: Kia Silverbrook

Inventor： Kia Silverbrook

IPC: H01L21784

CPC classification number: H01L23/315 ,  B29C33/0022 ,  B29C43/36 ,  B29C2035/0822 ,  B29C2043/503 ,  B81B2201/0235 ,  B81B2207/056 ,  B81C1/00269 ,  B81C1/00333 ,  B81C1/00904 ,  B81C2201/034 ,  B81C2203/0127 ,  G01P1/023 ,  G01P15/0802 ,  H01L23/16 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/48465 ,  H01L2924/10253 ,  H01L2924/15747 ,  H01L2924/181 ,  H01L2924/3011 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

Abstract: An accelerometer chip (202) has a molded thermoplastic cap (210) applied on one surface to provide a cavity into which the cantilevered mass (204) of the accelerometer may move. An array of caps is applied to a wafer of accelerometer chips (202) before singulation of the wafer.

Abstract translation: 加速度计芯片（202）具有在一个表面上施加的模制的热塑性帽（210），以提供加速度计的悬臂式物体（204）能够移动的空腔。 在晶片分离之前，将一组盖子施加到加速度计芯片（202）的晶片上。

公开(公告)号：US20040146611A1

公开(公告)日：2004-07-29

申请号：US10727124

申请日：2003-12-03

Applicant: The Procter & Gamble Company

Inventor： Francisco Arias ,  Faiz Feisal Sherman ,  Grover David Owens

IPC: C12C001/027

CPC classification number: A61B5/1411 ,  A61B5/14514 ,  A61B5/150022 ,  A61B5/150282 ,  A61B5/150419 ,  A61B5/150984 ,  A61M37/0015 ,  A61M2037/0038 ,  A61M2037/0053 ,  B81B2201/055 ,  B81C1/00111 ,  B81C2201/034

Abstract: A method for manufacturing microneedle structures is disclosed using soft lithography and photolithography, in which micromold structures made of a photoresist material or PDMS are created. The micromold manufacturing occurs quite quickly, using inexpensive materials and processes. Once the molds are available, using moldable materials such as polymers, microneedle arrays can be molded or embossed in relatively fast procedures. In some cases a sacrificial layer is provided between the forming micromold and its substrate layer, for ease of separation. The microneedles themselves can be solid projections, hollow nullmicrotubes,null or shallow nullmicrocups.null Electrodes can be formed on the microneedle arrays, including individual electrodes per hollow microtube.

Abstract translation: 公开了使用软光刻和光刻技术制造微针结构的方法，其中制造由光致抗蚀剂材料或PDMS制成的微型结构。 使用廉价的材料和工艺，微型制造相当快速地发生。 一旦模具可用，使用可模塑材料如聚合物，微针阵列可以以相对较快的程序模制或压花。 在一些情况下，为了易于分离，在成形微胶体与其基底层之间提供牺牲层。 微针本身可以是固体突起，中空的“微管”或浅的“微型杯”。 电极可以形成在微针阵列上，包括每个中空微管的单个电极。

公开(公告)号：US06752942B2

公开(公告)日：2004-06-22

申请号：US10016614

申请日：2001-10-30

Applicant: Enoch Kim ,  Younan Xia ,  Milan Mrksich ,  Rebecca J. Jackman ,  Xiao-Mei Zhao ,  Stephen P. Smith ,  Mara G. Prentiss ,  George M. Whitesides ,  Christian Marzolin

Inventor： Enoch Kim ,  Younan Xia ,  Milan Mrksich ,  Rebecca J. Jackman ,  Xiao-Mei Zhao ,  Stephen P. Smith ,  Mara G. Prentiss ,  George M. Whitesides ,  Christian Marzolin

IPC: B29C4102

CPC classification number: B81C1/00206 ,  A61K47/6957 ,  B01J19/0046 ,  B01J2219/00382 ,  B01J2219/00416 ,  B01J2219/0043 ,  B01J2219/00466 ,  B01J2219/00605 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00619 ,  B01J2219/00626 ,  B01J2219/0063 ,  B01J2219/00637 ,  B01J2219/00648 ,  B01J2219/00659 ,  B01J2219/00713 ,  B29C31/04 ,  B29C33/42 ,  B29C37/0053 ,  B29C39/24 ,  B29C43/021 ,  B29C67/246 ,  B29D11/00346 ,  B29D11/00663 ,  B29K2105/0002 ,  B29L2011/0016 ,  B81B2201/0214 ,  B81C1/00031 ,  B81C99/0085 ,  B81C2201/034 ,  B82Y30/00 ,  C40B60/14 ,  G01N21/7703 ,  G01N2021/7776 ,  G02B6/138 ,  H05K3/0079 ,  H05K3/061

Abstract: Chemically or biochemically active agents or other species are patterned on a substrate surface by providing a micromold having a contoured surface and forming, on a substrate surface, a chemically or biochemically active agent or fluid precursor of a structure. A chemically or biochemically active agent or fluid precursor also can be transferred from indentations in an applicator to a substrate surface. The substrate surface can be planar or non-planar. Fluid precursors of polymeric structures, inorganic ceramics and salts, and the like can be used to form patterned polymeric articles, inorganic salts and ceramics, reactive ion etch masks, etc. at the surface. The articles can be formed in a pattern including a portion having a lateral dimension of less than about 1 millimeter or smaller. The indentation pattern of the applicator can be used to transfer separate, distinct chemically or biochemically active agents or fluid precursors to separate, isolated regions of a substrate surface. Waveguide arrays, combinatorial chemical or biochemical libraries, etc. can be made. Differences in refractive index of waveguide and cladding can be created by subjecting the waveguide and cladding, made of identical prepolymeric material, to different polymerization or cross-linking conditions. Interferometers are defined by coupling arrays of waveguides, where coupling can be controlled by altering the difference in refractive index between cladding and waveguide at any desired location of the array. Alteration and refractive index can be created photochemically, chemically, or the like. Sensors also are disclosed, including biochemical sensors.

Abstract translation: 化学或生物化学活性剂或其它物质通过提供具有轮廓表面的微胶体并在基底表面上形成结构的化学或生物化学活性剂或流体前体而在基底表面上图案化。 化学或生物化学活性剂或流体前体也可以从敷料器中的凹陷转移到基底表面。 衬底表面可以是平面的或非平面的。 聚合物结构，无机陶瓷和盐等的流体前体可用于在表面形成图案化聚合物制品，无机盐和陶瓷，反应离子蚀刻掩模等。 制品可以形成为包括横向尺寸小于约1毫米或更小的部分的图案。 涂抹器的压痕图案可以用于将单独的，不同的化学或生物化学活性剂或流体前体转移到基底表面的分离的，分离的区域。 可以制作波导阵列，组合化学或生物化学库等。 可以通过将由相同的预聚物材料制成的波导和包层进行不同的聚合或交联条件来产生波导和包层的折射率差异。 干涉仪通过耦合波导阵列来定义，其中可以通过改变阵列的任何所需位置处的包层和波导之间的折射率差来控制耦合。 改变和折射率可以通过光化学，化学等方式产生。 还公开了传感器，包括生化传感器。

公开(公告)号：US06750083B2

公开(公告)日：2004-06-15

申请号：US10129499

申请日：2002-05-06

Applicant: Kia Silverbrook

Inventor： Kia Silverbrook

IPC: H01L2144

CPC classification number: B81C1/00333 ,  B29C33/0022 ,  B29C43/36 ,  B29C2035/0822 ,  B29C2043/503 ,  B81C1/00904 ,  B81C2201/034 ,  B81C2203/0109 ,  B81C2203/0127 ,  H01L21/4803 ,  H01L23/04 ,  H01L2924/0002 ,  H01L2924/16235 ,  H01L2924/00

Abstract: A method of using protective caps (160) applied to a first side of a wafer (150) in the production of microfabricated devices (152), such as micro-electro-mechanical systems (MEMS) devices. One cap (160) covers each microfabricated device or group respectively, such that a gap remains between adjacent protective caps. One or more etches are applied to the gaps between the caps to remove material and separate the wafer into separate units.

Abstract translation: 在制造微机电系统（MEMS）装置的微加工装置（152）中使用施加到晶片（150）的第一侧的保护帽（160）的方法。 一个盖（160）分别覆盖每个微加工装置或组，使得相邻保护盖之间保留间隙。 将一个或多个蚀刻施加到盖之间的间隙以移除材料并将晶片分离成单独的单元。

公开(公告)号：US20040040653A1

公开(公告)日：2004-03-04

申请号：US10230882

申请日：2002-08-28

Inventor： Ralph G. Nuzzo ,  William Robert Childs

IPC: B32B003/00

CPC classification number: B81C1/0046 ,  B81C2201/034 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T428/24562 ,  Y10T428/24628

Abstract: A method of making a microstructure includes forming a pattern in a surface of a silicon-containing elastomer, oxidizing the pattern, contacting the pattern with a substrate; and bonding the oxidized pattern and the substrate such that the pattern and the substrate are irreversibly attached. The silicon-containing elastomer may be removably attached to a transfer pad.

公开(公告)号：US06663820B2

公开(公告)日：2003-12-16

申请号：US09808534

申请日：2001-03-14

Applicant: Francisco Arias ,  Faiz Feisal Sherman ,  Grover David Owens

Inventor： Francisco Arias ,  Faiz Feisal Sherman ,  Grover David Owens

IPC: B29C3508

CPC classification number: A61B5/1411 ,  A61B5/14514 ,  A61B5/150022 ,  A61B5/150282 ,  A61B5/150419 ,  A61B5/150984 ,  A61M37/0015 ,  A61M2037/0038 ,  A61M2037/0053 ,  B81B2201/055 ,  B81C1/00111 ,  B81C2201/034

Abstract: A method for manufacturing microneedle structures is disclosed using soft lithography and photolithography, in which micromold structures made of a photoresist material or PDMS are created. The micromold manufacturing occurs quite quickly, using inexpensive materials and processes. Once the molds are available, using moldable materials such as polymers, microneedle arrays can be molded or embossed in relatively fast procedures. In some cases a sacrificial layer is provided between the forming micromold and its substrate layer, for ease of separation. The microneedles themselves can be solid projections, hollow “microtubes,” or shallow “microcups.” Electrodes can be formed on the microneedle arrays, including individual electrodes per hollow microtube.

公开(公告)号：US20030071016A1

公开(公告)日：2003-04-17

申请号：US10267953

申请日：2002-10-08

Inventor： Wu-Sheng Shih ,  James E. Lamb III ,  Mark Daffron

IPC: C03C025/68

CPC classification number: B82Y10/00 ,  B29C33/3857 ,  B29C33/62 ,  B81C99/009 ,  B81C2201/034 ,  B82Y40/00 ,  G03F7/0002

Abstract: Novel nonstick molds and methods of forming and using such molds are provided. The molds are formed of a nonstick material such as those selected from the group consisting of fluoropolymers, fluorinated siloxane polymers, silicones, and mixtures thereof. The nonstick mold is imprinted with a negative image of a master mold, where the master mold is designed to have a topography pattern corresponding to that desired on the surface of a microelectronic substrate. The nonstick mold is then used to transfer the pattern or image to a flowable film on the substrate surface. This film is subsequently cured or hardened, resulting in the desired pattern ready for further processing.

Abstract translation: 提供了新型不粘模具以及形成和使用这种模具的方法。 模具由不粘材料形成，例如选自含氟聚合物，氟化硅氧烷聚合物，硅酮及其混合物的那些。 不粘模具印有主模具的负像，其中主模具被设计成具有对应于微电子衬底表面上期望的形状图案。 然后使用不粘模具将图案或图像转印到基底表面上的可流动的薄膜上。 随后该膜被固化或硬化，导致所需的图案准备进一步加工。

公开(公告)号：US20030019833A1

公开(公告)日：2003-01-30

申请号：US10150895

申请日：2002-05-15

Applicant: California Institute of Technology

Inventor： Marc A. Unger ,  Hou-Pu Chou ,  Todd A. Thorsen ,  Axel Scherer ,  Stephen R. Quake

IPC: C23F001/00

CPC classification number: B29C51/00 ,  B01L3/502707 ,  B01L3/50273 ,  B01L3/502738 ,  B01L2300/0861 ,  B01L2300/0887 ,  B01L2300/123 ,  B01L2400/046 ,  B01L2400/0481 ,  B01L2400/0655 ,  B33Y80/00 ,  B81B5/00 ,  B81B2201/036 ,  B81B2201/054 ,  B81C1/00119 ,  B81C2201/019 ,  B81C2201/034 ,  C12Q1/6874 ,  F04B43/043 ,  F15C1/06 ,  F15C5/00 ,  F16K11/20 ,  F16K13/00 ,  F16K31/126 ,  F16K99/0001 ,  F16K99/0015 ,  F16K99/0046 ,  F16K99/0048 ,  F16K99/0051 ,  F16K99/0059 ,  F16K2099/0074 ,  F16K2099/0076 ,  F16K2099/0078 ,  F16K2099/008 ,  F16K2099/0094 ,  Y10T137/0491 ,  Y10T137/0497 ,  Y10T137/2224 ,  Y10T137/87249 ,  Y10T156/10 ,  Y10T428/24479 ,  Y10T428/24744 ,  C12Q2535/125

Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

公开(公告)号：US20020174936A1

公开(公告)日：2002-11-28

申请号：US09865925

申请日：2001-05-25

Applicant: Motorola, Inc.

Inventor： Jeremy W. Burdon ,  Manuel Oliver

IPC: C03B029/00

CPC classification number: B81C1/00119 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00824 ,  B32B18/00 ,  B81B2201/058 ,  B81C2201/019 ,  B81C2201/034 ,  C04B35/62218 ,  C04B2235/6567 ,  C04B2235/667 ,  C04B2237/341 ,  C04B2237/343 ,  C04B2237/348 ,  C04B2237/365 ,  C04B2237/366 ,  C04B2237/368 ,  C04B2237/62 ,  C04B2237/66 ,  C04B2237/704 ,  C04B2237/76 ,  H05K1/0306 ,  H05K3/0014 ,  H05K2203/0582 ,  H05K2203/0759

Abstract: A cast-on-resist (COR) method of forming a ceramic layer (114) with a recessed pattern is provided according to a preferred exemplary embodiment of the present invention. The COR method is comprised of depositing a resist (102) on a substrate (104) and selectively exposing the resist (102) to a radiation source such that a first portion (106) of the resist (102) having a positive image of the pattern is soluble in a solvent and a second portion (108) of the resist (102) having a negative image of the pattern is insoluble in the solvent. The COR method is further comprised of immersing the resist (102) in the solvent to remove the first portion (106) to form a casting substrate (110) having the negative image of the pattern, applying ceramic slurry (112) on the casting substrate (110), curing the ceramic slurry (112) on the casting substrate (110) and removing the ceramic layer (114) from the casting substrate (110) after the curing.

Abstract translation: 根据本发明的优选示例性实施例提供了形成具有凹陷图案的陶瓷层（114）的耐蚀刻（COR）方法。 COR方法包括在衬底（104）上沉积抗蚀剂（102）并选择性地将抗蚀剂（102）暴露于辐射源，使得抗蚀剂（102）的第一部分（106）具有正像 图案可溶于溶剂，并且具有图案的负像的抗蚀剂（102）的第二部分（108）不溶于溶剂。 COR方法还包括将抗蚀剂（102）浸入溶剂中以去除第一部分（106）以形成具有图案的负像的流延基底（110），将陶瓷浆料（112）施加到流延基底 （110），固化所述铸塑基材（110）上的陶瓷浆料（112）并在固化后从所述铸塑基材（110）除去所述陶瓷层（114）。

公开(公告)号：US06368838B1

公开(公告)日：2002-04-09

申请号：US09373334

申请日：1999-08-12

Applicant: Rahul Singhvi ,  Amit Kumar ,  George M. Whitesides ,  Donald E. Ingber ,  Gabriel P. Lopez ,  Daniel I. C. Wang ,  Gregory N. Stephanopoulos

Inventor： Rahul Singhvi ,  Amit Kumar ,  George M. Whitesides ,  Donald E. Ingber ,  Gabriel P. Lopez ,  Daniel I. C. Wang ,  Gregory N. Stephanopoulos

IPC: C12N1102

CPC classification number: C12N1/00 ,  B01J19/0046 ,  B01J2219/00382 ,  B01J2219/00385 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00617 ,  B01J2219/00619 ,  B01J2219/00621 ,  B01J2219/00626 ,  B01J2219/0063 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01J2219/0072 ,  B81B2201/0214 ,  B81C1/00206 ,  B81C2201/034 ,  B82Y5/00 ,  B82Y30/00 ,  C12N5/0068 ,  C12N5/067 ,  C12N2535/10 ,  C12Q1/02 ,  C40B60/14

Abstract: Methods and a device are provided for adhering cells in a specific and predetermined position. The device comprises a plate defining a surface and a plurality of cytophilic islands that adhere cells which are isolated by cytophobic regions to which cells do not adhere. The cytophobic regions can be wide enough such that less than 10 percent of the cells adhered to the cytophilic islands are allowed to form bridges across the cytophobic regions and contact each other. Further, the islands or the regions or both may be formed of a self-assembled monolayer (SAM). The methods are for forming a patterned surface for a population of cells and for selectively manipulating individual cells formed on the surface of the plate of the device. Furthermore, the device is used in immobilization of cells at a surface and for controlling shape of the cells.

Abstract translation: 提供了用于将细胞粘附在特定和预定位置的方法和装置。 该装置包括限定表面的板和附着由细胞不粘附细胞渗透区域分离的细胞的多个细胞色素岛。 细胞疏植区域可以足够宽，使得少于10％的细胞粘附到细胞色素岛被允许跨细胞疏漏区域形成桥接并彼此接触。 此外，岛或区域或两者可以由自组装单层（SAM）形成。 这些方法用于形成用于细胞群的图案化表面并且用于选择性地操纵形成在装置的板的表面上的单个细胞。 此外，该装置用于在表面固定细胞并用于控制细胞的形状。