Identification and Analysis of Materials and Molecular Structures

    公开(公告)号:US20170191939A1

    公开(公告)日:2017-07-06

    申请号:US15464114

    申请日:2017-03-20

    Applicant: Ondax, Inc.

    CPC classification number: G01N21/65 G01N21/3581 G01N2201/06113 G01N2201/068

    Abstract: Provided are methods and systems for identification and analysis of materials and molecular structures. An apparatus for identification and analysis of materials and molecular structures may include a laser. The laser may, in turn, include an amplified spontaneous emission-suppressed single-frequency laser excitation source. The apparatus may further comprise a plurality of filters. The plurality of filters may include reflective volume holographic grating blocking filters. The apparatus may also comprise an optical unit and an optical spectrometer. The optical unit may be configured to deliver excitation energy to a sample substance and capture Raman signal scattering from the sample substance. The optical spectrometer may be disposed in a path of the Raman signal and configured to measure a spectrum of the Raman signal and generate a detection signal. Finally, the apparatus may comprise a processing unit configured to analyze the spectrum.

    Multi-channel backside wafer inspection

    公开(公告)号:US09689804B2

    公开(公告)日:2017-06-27

    申请号:US14577374

    申请日:2014-12-19

    Inventor: Yakov Bobrov

    Abstract: A system for inspecting a backside surface of a wafer with multi-channel focus control includes a set of inspection sub-systems including a first inspection sub-system positioned and an additional inspection sub-system. The first and additional inspection sub-systems include an optical assembly, an actuation assembly, where the optical assembly is disposed on the actuation assembly, and a positional sensor configured to sense a position characteristic between a portion of the optical assembly and the backside surface of the wafer. The system also includes a controller configured to acquire one or more wafer profile maps of the backside surface of the wafer and adjust a first focus position of the first inspection sub-system or an additional focus position of the additional inspection sub-system based on the received one or more wafer profile maps.

    TESTING DIFFRACTION OR DIFFUSION OF A LIGHT BEAM

    公开(公告)号:US20170160209A1

    公开(公告)日:2017-06-08

    申请号:US14957643

    申请日:2015-12-03

    Applicant: Apple Inc.

    CPC classification number: G01N21/958 G01N2201/06113

    Abstract: An apparatus for testing diffraction or diffusion of a light beam is provided. The apparatus includes a photosensitive semiconductor, shaped to define an aperture. At least one anode, and a plurality of cathodes, are coupled to the semiconductor. An optical element, configured to modify an angular spread of a light beam that traverses the optical element, is disposed within the aperture. A detector is configured to detect electric currents that pass between the cathodes and the anode in response to a portion of the light beam exiting the optical element and hitting the semiconductor. Other embodiments are also described.

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