公开(公告)号：US20150262722A1

公开(公告)日：2015-09-17

申请号：US14727027

申请日：2015-06-01

Applicant: X-RAY OPTICAL SYSTEMS, INC.

Inventor： Zewu CHEN ,  David M. GIBSON ,  Walter M. GIBSON ,  Adam BAILEY ,  R. Scott SEMKEN ,  Kai XIN ,  John H. BURDETT, Jr.

IPC: G21K1/06 ,  G01N23/20 ,  H05G1/04

CPC classification number: G21K1/06 ,  G01N23/20008 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/1003 ,  G01N2223/315 ,  G01N2223/423 ,  G21K2201/062 ,  G21K2201/064 ,  H05G1/04

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced having a characteristic first energy, and bremsstrahlung energy; a first x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam; and a second x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam to a second energy. The first x-ray optic may monochromate characteristic energy from the source spot, and the second x-ray optic may monochromate bremsstrahlung energy from the source spot. The x-ray optics may be curved diffracting optics, for receiving the diverging x-ray beam from the x-ray tube and focusing the beam at the sample spot. Detection is also provided to detect and measure various toxins in, e.g., manufactured products including toys and electronics.

Abstract translation: 一种用X射线束照射样品斑点的X射线分析装置。 提供具有源极点的X射线管，从该源点产生具有特征的第一能量和bre致辐射能量的发散X射线束; 第一x射线光学器件接收发散的X射线束并将光束引向样品斑点，同时对光束进行单色; 并且第二x射线光学器件接收发散的X射线束并将光束引向样品斑点，同时将光束单色化为第二能量。 第一个X射线光学元件可以对来自源光斑的特征能量进行单色化，第二个X射线光学元件可以从源光点单色bre致辐射能量。 x射线光学元件可以是弯曲的衍射光学器件，用于从X射线管接收发散的X射线束并将光束聚焦在样品点处。 还提供检测以检测和测量例如包括玩具和电子产品在内的制造产品中的各种毒素。

公开(公告)号：US20150247811A1

公开(公告)日：2015-09-03

申请号：US14634834

申请日：2015-03-01

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: G01N23/223 ,  G01B15/02

CPC classification number: G01N23/223 ,  G01B15/02 ,  G01N23/085 ,  G01N23/2076 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/064 ,  H01J35/08 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

Abstract: This disclosure presents systems for total reflection x-ray fluorescence measurements that have x-ray flux and x-ray flux density several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection and/or for total-reflection fluorescence analysis.The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray brightness and therefore greater x-ray flux.The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density.

Abstract translation: 本公开提供了具有x射线通量和x射线通量密度比现有x射线技术大几个数量级的全反射x射线荧光测量的系统。 因此，这些可用于诸如微量元素检测和/或全反射荧光分析的应用。 较高的亮度部分地通过使用x射线靶的设计来实现，所述X射线靶包括与具有高导热性的衬底紧密热接触制造的一个或多个选定的x射线产生材料的多个微结构。 这允许用更高电子密度或更高能量电子轰击靶，这导致更大的x射线亮度和因此更大的x射线通量。 然后，高亮度/高通量源可以耦合到x射线反射光学系统，其可将高通量x射线聚焦到可以小至1微米的点，导致高通量密度。

公开(公告)号：US20150028229A1

公开(公告)日：2015-01-29

申请号：US14514277

申请日：2014-10-14

Applicant: Phoseon Technology, Inc.

Inventor： Doug Childers

IPC: G21K5/00 ,  G21K1/06

CPC classification number: G21K5/00 ,  C03C25/12 ,  F26B3/28 ,  F26B13/00 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065

Abstract: A device for UV curing a coating or printed ink on a workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.

Abstract translation: 用于在诸如光纤的工件上UV涂覆或印刷油墨的装置包括布置成具有共同定位焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。

公开(公告)号：US08934085B2

公开(公告)日：2015-01-13

申请号：US12726081

申请日：2010-03-17

Applicant: Udo Dinger ,  Christopher Weth

Inventor： Udo Dinger ,  Christopher Weth

IPC: G03B27/54 ,  G03F7/20 ,  G02B5/08 ,  G02B5/09

CPC classification number: G03F7/70175 ,  G02B5/0891 ,  G02B5/09 ,  G03F7/70083 ,  G03F7/70116 ,  G03F7/702 ,  G21K2201/064

Abstract: A bundle-guiding optical collector collects an emission of a radiation source and forms a radiation bundle from the collected emission. A reflective surface of the collector is the first bundle-forming surface downstream of the radiation source. The reflective surface is formed such that it converts the radiation source into a family of images in a downstream plane. The family of images includes a plurality of radiation source images which are offset to each other in two dimensions (x, y) in a direction perpendicular to the beam direction of the transformed radiation bundle and are arranged relative to each other in a non-rotationally symmetric manner relative to the beam direction of the transformed radiation bundle. The transformed radiation bundle in the downstream plane has a non-rotationally symmetric bundle edge contour relative to the beam direction of the transformed radiation bundle. The result is a collector in which the radiation bundle shape generated by the collector. In other words, the illumination distribution generated by the collector in a defined manner in the plane downstream of the collector has a shape which is freely selectable to the greatest possible extent.

Abstract translation: 束引导光学收集器收集辐射源的发射并从收集的发射形成辐射束。 收集器的反射表面是辐射源下游的第一束形成表面。 反射表面形成为使得其在下游平面中将辐射源转换成一系列图像。 图像系列包括在垂直于变换辐射束的光束方向的方向上以二维（x，y）彼此偏移的多个辐射源图像，并且以非旋转方式相对于彼此布置 相对于变换辐射束的束方向的对称方式。 下游平面中的变换的辐射束相对于变换的辐射束的光束方向具有非旋转对称的束边缘轮廓。 其结果是由收集器产生的辐射束形状的收集器。 换句话说，集电体在集电体下游的平面中以规定的方式产生的照明分布具有可以最大可能地自由选择的形状。

公开(公告)号：US20140328468A1

公开(公告)日：2014-11-06

申请号：US14349732

申请日：2012-10-03

Applicant: X-RAY OPTICAL SYSTEMS, INC.

Inventor： Steven M. Pomerantz ,  John H. Burdett ,  Rory D. Delaney

IPC: G01N23/10

CPC classification number: G21F5/015 ,  G01N23/10 ,  G01N23/223 ,  G01N2223/074 ,  G01N2223/076 ,  G01N2223/301 ,  G01N2223/308 ,  G01N2223/309 ,  G21K2201/062 ,  G21K2201/064

Abstract: A mobile transport and shielding apparatus, which holds an x-ray analyzer for transport between operating sites, and also serves as a shielded, operational station for holding the x-ray analyzer during operation thereof. The x-ray analyzer is removably insertable into the apparatus and is operable either within the mobile transport and shielding apparatus, or outside of the apparatus. The apparatus may provide means to control, power, cool, and/or charge the x-ray analyzer during operation of the analyzer; and also means to transport the analyzer (e.g., a handle).

Abstract translation: 一种移动式运输和屏蔽装置，其保持用于在操作现场之间运输的x射线分析仪，并且还用作在其操作期间保持x射线分析仪的屏蔽操作台。 X射线分析仪可移除地插入设备中，并且可在移动传输和屏蔽设备内或设备外部操作。 该装置可以提供在分析仪操作期间对x射线分析仪进行控制，供电，冷却和/或充电的装置; 并且还用于运送分析器（例如，手柄）。

公开(公告)号：US08848870B2

公开(公告)日：2014-09-30

申请号：US13373644

申请日：2011-11-23

Applicant: Lutz Bruegemann ,  Carsten Michaelsen ,  Keisuke Saito

Inventor： Lutz Bruegemann ,  Carsten Michaelsen ,  Keisuke Saito

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/064

Abstract: An X-ray optical configuration for irradiation of a sample (1) with an X-ray beam having a line-shaped cross-section, wherein the configuration contains an X-ray source (2) and a beam-conditioning X-ray optics, is characterized in that the X-ray source (2) comprises a brilliant point source (4) and the X-ray optics comprises an X-ray optical element (3) which conditions X-ray light emitted by the point source in such a fashion that the X-ray beam is rendered parallel in one direction perpendicular to the beam propagation direction and remains divergent in a direction which is perpendicular thereto and also to the beam propagation direction. An X-ray optical element of this type enables use of both point-shaped and line-shaped beam geometries without complicated and time-consuming conversion work.

Abstract translation: 一种用于用具有线状横截面的X射线束照射样品（1）的X射线光学构造，其中所述构造包含X射线源（2）和束调节X射线光学器件 的特征在于，所述X射线源（2）包括辉光点源（4），所述X射线光学元件包括X射线光学元件（3），所述X射线光学元件（3）对所述X射线光学元件 使得X射线束在垂直于光束传播方向的一个方向上平行，并且在与其垂直的方向以及波束传播方向上保持发散。 这种类型的X射线光学元件使得能够使用点状和线形的几何形状，而不需要复杂和耗时的转换工作。

公开(公告)号：US20140192339A1

公开(公告)日：2014-07-10

申请号：US14210625

申请日：2014-03-14

Applicant: Carl Zeiss SMT GmbH

Inventor： Ingo Saenger ,  Joerg Zimmermann ,  Daniel Kraehmer ,  Johannes Ruoff ,  Martin Meier ,  Frank Schlesener ,  Christoph Hennerkes ,  Wolfgang Singer

IPC: G03F7/20 ,  G02B27/28 ,  G02B19/00

CPC classification number: G03F7/702 ,  B82Y10/00 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0071 ,  G02B19/0095 ,  G02B27/286 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70566 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation from a first focus into a second focus with angles of impingement in a predefined angular spectrum.

Abstract translation: 用于微光刻的投影曝光装置的收集器包括多个反射部分，其以这样的方式被实施和布置，使得它们可以在将来自第一焦点的辐射聚焦到第二焦点期间被撞击，其中预定角度的冲击 角谱。

公开(公告)号：US20140056414A1

公开(公告)日：2014-02-27

申请号：US13971322

申请日：2013-08-20

Applicant: Canon Kabushiki Kaisha

Inventor： Atsushi Komoto ,  Kohei Okamoto

IPC: G21K1/06

CPC classification number: G21K1/062 ,  G21K1/06 ,  G21K2201/064

Abstract: An X-ray waveguide having a curved structure formed of a core and two claddings that sandwich the core and are mutually opposed, wherein when a y-axis is defined using as an origin a center of a circle, which defines a curvature radius of an interface a between a cladding A present on an inner circumference side of the curved structure of the two claddings, and the core, perpendicular to a tangent at an arbitrary point S and in a direction from the origin toward the interface b, a refractive index real part of the core in the interface a at a y0 is larger than a refractive index real part of the core in the interface b at a y1, and the refractive indexes become equal or larger as the y is increased.

Abstract translation: 一种X射线波导，其具有由芯和两个包层构成的弯曲结构，所述两个包层夹着所述芯并且彼此相对，其中当以y为中心定义y轴时，所述圆的中心限定为 在存在于两个包层的弯曲结构的内周侧的包层A与垂直于任意点S的切线以及从原点朝向界面b的方向上的芯之间界定a，折射率实数 在y0处的界面a中的芯的一部分大于y1处的界面b中的芯的折射率实部，并且随着y增加，折射率变得等于或大。

公开(公告)号：US08624208B2

公开(公告)日：2014-01-07

申请号：US13048454

申请日：2011-03-15

Applicant: Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC: G21K5/00

CPC classification number: G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外光发生系统可包括：室 入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个 光学元件 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US08575577B1

公开(公告)日：2013-11-05

申请号：US13534951

申请日：2012-06-27

Applicant: Mikhail V. Gubarev ,  Brian D. Ramsey ,  Darell E. Engelhaupt

Inventor： Mikhail V. Gubarev ,  Brian D. Ramsey ,  Darell E. Engelhaupt

IPC: G21G5/00 ,  A61N5/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B23/06 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/068

Abstract: Neutron optics based on the two-reflection geometries are capable of controlling beams of long wavelength neutrons with low angular divergence. The preferred mirror fabrication technique is a replication process with electroform nickel replication process being preferable. In the preliminary demonstration test an electroform nickel optics gave the neutron current density gain at the focal spot of the mirror at least 8 for neutron wavelengths in the range from 6 to 20 Å. The replication techniques can be also be used to fabricate neutron beam controlling guides.

Abstract translation: 基于双反射几何的中子光学器件能够以较低的角度散度来控制长波长中子束。 优选的镜面制造技术是具有电铸镍复制工艺的复制方法。 在初步示范测试中，电铸镍光学器件在6到20埃的中子波长处给出了镜面焦点处的中子电流密度增益至少为8。 复制技术也可用于制造中子束控制指导。