公开(公告)号：US08861062B2

公开(公告)日：2014-10-14

申请号：US13365087

申请日：2012-02-02

Applicant: Sason Sourani ,  Moshe Medina

Inventor： Sason Sourani ,  Moshe Medina

IPC: G02B26/08 ,  B81B7/00

CPC classification number: H02N1/006 ,  B81B3/0043 ,  B81B7/00 ,  B81B7/008 ,  B81B2201/033 ,  B81B2201/034 ,  B81B2201/042 ,  B81B2203/0109 ,  B81B2203/0181 ,  B81B2203/058 ,  G02B7/1821 ,  G02B26/0841 ,  H02N1/008

Abstract: A Micro Electro Mechanical Systems (MEMS) device comprising: a rotor, comprising a first plurality of rotor teeth and a second plurality of rotor teeth, formed in at least two layers of silicon-on-insulator (SOI) substrate, wherein each rotor tooth belonging to the first plurality of rotor teeth is formed in a first layer and each rotor tooth of the second plurality of rotor teeth is formed in a second layer; and a stator comprising a first plurality of stator teeth and a second plurality of stator teeth, formed in at least two layers of SOI substrate, wherein each stator tooth belonging to the first plurality of stator teeth is formed in a first layer, and each stator tooth of the second plurality of stator teeth is formed in a second layer.

Abstract translation: 一种微机电系统（MEMS）装置，包括：转子，包括形成在至少两层绝缘体上硅（SOI）衬底中的第一多个转子齿和第二多个转子齿，其中每个转子齿 属于第一多个转子齿的第一多个转子齿形成在第一层中，并且第二多个转子齿的每个转子齿形成在第二层中; 以及定子，其包括形成在至少两层SOI衬底中的第一多个定子齿和第二多个定子齿，其中属于所述第一多个定子齿的每个定子齿形成在第一层中，并且每个定子 第二多个定子齿的齿形成在第二层中。

公开(公告)号：US20140152325A1

公开(公告)日：2014-06-05

申请号：US14236966

申请日：2011-08-09

Applicant: Katsutoshi Narita

Inventor： Katsutoshi Narita

IPC: G01B7/14

CPC classification number: G01B7/14 ,  B81B3/0086 ,  B81B2201/033 ,  G01C19/5733

Abstract: The displacement amount monitoring electrode structure includes a fixed electrode and a movable electrode each having a comb-teeth shape including a base part and electrode fingers extending from the base part in a direction parallel to a substrate. The fixed electrode and the movable electrode face each other such that the electrode fingers are meshed together. The fixed electrode is fixed to the substrate and the movable electrode can be displaced in the direction. The displacement amount monitoring electrode structure monitors a displacement amount of a detection mass to be driven at a target amplitude based on a change amount of a capacitance between the fixed electrode and the movable electrode. A change sensitivity of the change amount of the capacitance with respect to a displacement amount of the movable electrode, becomes larger after the displacement of the movable electrode reaches a target amount corresponding to the target amplitude.

Abstract translation: 位移量监视电极结构包括固定电极和可动电极，每个固定电极和可动电极具有梳状形状，其包括基底部分和电极指，该电极指沿平行于基底的方向从基部延伸。 固定电极和可动电极彼此面对，使得电极指彼此啮合。 固定电极固定在基板上，可动电极可以向该方向移位。 位移量监视电极结构基于固定电极和可动电极之间的电容的变化量来监视要以目标振幅驱动的检测质量的位移量。 电容变化量相对于可动电极的位移量的变化灵敏度在可动电极的位移达到与目标振幅对应的目标量后变大。

公开(公告)号：US08712229B2

公开(公告)日：2014-04-29

申请号：US13843817

申请日：2013-03-15

Applicant: DigitalOptics Corporation MEMS

Inventor： Robert J. Calvet ,  Xiaolei Liu ,  Roman C. Gutierrez ,  Ankur Jain ,  Guiqin Wang

IPC: G03B17/00

CPC classification number: H04N5/2254 ,  B81B3/0037 ,  B81B2201/033 ,  B81B2203/053 ,  G02B7/04 ,  G03B3/10 ,  G03B5/00 ,  G03B2205/0007 ,  G03B2205/0084

Abstract: In one embodiment, an actuator includes a moving frame coupled to a fixed frame by a plurality of elongated parallel motion flexures for generally parallel motion relative to the fixed frame and between an as-fabricated position and a deployed position. The flexures are disposed at a first angle relative to a line extending perpendicularly to both the moving frame and the fixed frame when the moving frame is disposed in the as-fabricated position, and at a second angle relative to that same line when the moving frame is disposed in the deployed position. Arcuate movement of the first frame relative to the second frame is controlled by constraining the first angle to a value of less than about half of the sum of the first and second angles.

Abstract translation: 在一个实施例中，致动器包括通过多个细长的平行运动挠曲件联接到固定框架的移动框架，用于相对于固定框架大致平行的运动，以及在制造位置和展开位置之间。 当运动框架设置在制造位置时，挠曲件相对于垂直于移动框架和固定框架延伸的线以第一角度设置，并且当移动框架 被布置在展开位置。 第一框架相对于第二框架的弓形运动通过将第一角度约束到小于第一和第二角度之和的大约一半的值来控制。

公开(公告)号：US20140097723A1

公开(公告)日：2014-04-10

申请号：US14101280

申请日：2013-12-09

Applicant: DigitalOptics Corporation MEMS

Inventor： Roman C. Gutierrez ,  Ankur Jain

IPC: H02N2/00

CPC classification number: H02N2/005 ,  B81B7/0006 ,  B81B2201/033 ,  B81B2203/0154 ,  B81B2207/07

Abstract: A device may comprise a flexure formed of a first semiconductor material. A first trench may be formed in the flexure. The first trench may separate the first semiconductor material into a first portion and a second portion thereof. An oxide layer may be formed in the first trench. The oxide layer may extend over a top portion of the first semiconductor material. A second semiconductor material may be formed on the oxide layer. The first trench and the oxide layer may cooperate to electrically isolate the first portion and the second portion from one another.

Abstract translation: 装置可以包括由第一半导体材料形成的挠曲。 可以在弯曲部中形成第一沟槽。 第一沟槽可以将第一半导体材料分离成第一部分和第二部分。 可以在第一沟槽中形成氧化物层。 氧化物层可以在第一半导体材料的顶部上延伸。 可以在氧化物层上形成第二半导体材料。 第一沟槽和氧化物层可以协作以将第一部分和第二部分彼此电隔离。

公开(公告)号：US08687255B2

公开(公告)日：2014-04-01

申请号：US13057411

申请日：2009-07-06

Applicant: Stefan Finkbeiner ,  Tjalf Pirk ,  Christoph Friese

Inventor： Stefan Finkbeiner ,  Tjalf Pirk ,  Christoph Friese

IPC: G02B26/08

CPC classification number: B81C1/00166 ,  B81B2201/033 ,  B81C2201/014

Abstract: A method for manufacturing a micromechanical component is described, including the steps of: forming a first etch stop layer on a base substrate, the first etch stop layer being formed in such a way that it has a first pattern of through-cutouts; forming a first electrode-material layer on the first etch stop layer; forming a second etch stop layer on the first electrode-material layer, the second etch stop layer being formed in such a way that it has a second pattern of through-cutouts differing from the first pattern; forming a second electrode-material layer on the second etch stop layer; forming a patterned mask on the second electrode-material layer; and carrying out a first etching step in a first direction and a second etching step in a second direction counter to the first direction in order to etch at least one first electrode unit out of the first electrode-material layer and to etch at least one second electrode unit out of the second electrode-material layer. Also described are micromechanical components.

Abstract translation: 描述了一种用于制造微机械部件的方法，包括以下步骤：在基底基板上形成第一蚀刻停止层，第一蚀刻停止层以这样的方式形成：其具有第一图形的通孔; 在所述第一蚀刻停止层上形成第一电极材料层; 在所述第一电极材料层上形成第二蚀刻停止层，所述第二蚀刻停止层以这样的方式形成：其具有不同于所述第一图案的通孔的第二图案; 在所述第二蚀刻停止层上形成第二电极材料层; 在所述第二电极材料层上形成图案化掩模; 并且在与第一方向相反的第二方向上沿第一方向和第二蚀刻步骤进行第一蚀刻步骤，以便从第一电极材料层中蚀刻至少一个第一电极单元并蚀刻至少一个第二 电极单元排出第二电极材料层。 还描述了微机械部件。

公开(公告)号：US08623222B2

公开(公告)日：2014-01-07

申请号：US13652851

申请日：2012-10-16

Applicant: Yu Sun ,  Keekyoung Kim

Inventor： Yu Sun ,  Keekyoung Kim

IPC: C23F1/00

CPC classification number: B81C99/002 ,  B25J9/104 ,  B81B2201/0292 ,  B81B2201/031 ,  B81B2201/033

Abstract: The present invention relates to a design and microfabrication method for microgrippers that are capable of grasping micro and nano objects of a large range of sizes and two-axis force sensing capabilities. Gripping motion is produced by one or more electrothermal actuators. Integrated force sensors along x and y directions enable the measurement of gripping forces as well as the forces applied at the end of microgripper arms along the normal direction, both with a resolution down to nanoNewton. The microfabrication method enables monolithic integration of the actuators and the force sensors.

Abstract translation: 本发明涉及一种微抓爪的设计和微细加工方法，其能够抓住大范围尺寸和双轴力感测能力的微型和纳米物体。 夹持运动由一个或多个电热致动器产生。 沿x和y方向的集成力传感器可以测量夹紧力以及沿着法向方向施加在微夹臂末端的力，并且分辨率低至纳摩顿。 微加工方法可实现致动器和力传感器的整体集成。

公开(公告)号：US08605375B2

公开(公告)日：2013-12-10

申请号：US12946466

申请日：2010-11-15

Applicant: Roman C. Gutierrez ,  Ankur Jain

Inventor： Roman C. Gutierrez ,  Ankur Jain

IPC: G02B7/00

CPC classification number: H02N2/005 ,  B81B7/0006 ,  B81B2201/033 ,  B81B2203/0154 ,  B81B2207/07

Abstract: A device may comprise a flexure formed of a first semiconductor material. A first trench may be formed in the flexure. The first trench may separate the first semiconductor material into a first portion and a second portion thereof. An oxide layer may be formed in the first trench. The oxide layer may extend over a top portion of the first semiconductor material. A second semiconductor material may be formed on the oxide layer. The first trench and the oxide layer may cooperate to electrically isolate the first portion and the second portion from one another.

Abstract translation: 装置可以包括由第一半导体材料形成的挠曲。 可以在弯曲部中形成第一沟槽。 第一沟槽可以将第一半导体材料分离成第一部分和第二部分。 可以在第一沟槽中形成氧化物层。 氧化物层可以在第一半导体材料的顶部上延伸。 可以在氧化物层上形成第二半导体材料。 第一沟槽和氧化物层可以协作以将第一部分和第二部分彼此电隔离。

公开(公告)号：US20130278108A1

公开(公告)日：2013-10-24

申请号：US13842832

申请日：2013-03-15

Applicant: DigitalOptics Corporation MEMS

Inventor： Xiaolei Liu ,  Xiaojun Huang ,  Robert J. Calvet

IPC: H02N1/00 ,  B81C3/00

CPC classification number: H02N1/008 ,  B81B2201/033 ,  B81C1/00825 ,  B81C3/00 ,  G02B7/08 ,  G03B3/10 ,  G03B2205/0007 ,  G03B2205/0053 ,  G03B2205/0061 ,  Y10T29/49002

Abstract: Techniques are disclosed for systems and methods to provide shock impact mitigation for MEMS structures. A MEMS structure may include one or more actuators. An actuator may include a first frame having a spine, where the spine includes a body and a tip. The actuator may include a second frame connected to the first frame and including a shock stop, where the shock stop includes a surface in proximity to the spine tip. An actuator may include a shock cushion spring fixed relative to the spine tip and situated substantially between the spine tip and the shock stop surface, where the shock cushion spring is adapted to protect the spine tip from contact with the shock stop surface.

Abstract translation: 公开了为MEMS结构提供减震冲击的系统和方法的技术。 MEMS结构可以包括一个或多个致动器。 致动器可以包括具有脊柱的第一框架，其中脊柱包括主体和尖端。 致动器可以包括连接到第一框架并且包括冲击停止件的第二框架，其中冲击停止件包括靠近脊尖的表面。 致动器可以包括相对于脊尖固定的冲击缓冲弹簧，其基本上位于脊柱末端和冲击阻止表面之间，其中冲击缓冲弹簧适于保护脊尖不与冲击阻止表面接触。

公开(公告)号：US20130220016A1

公开(公告)日：2013-08-29

申请号：US13779002

申请日：2013-02-27

Applicant: STMicroelectronics S.r.l.

Inventor： Barbara Simoni ,  Carlo Valzasina

IPC: G01P15/125 ,  B81C1/00

CPC classification number: G01P15/125 ,  B81B3/0094 ,  B81B2201/0235 ,  B81B2201/0242 ,  B81B2201/033 ,  B81B2203/04 ,  B81B2203/058 ,  B81C1/00198 ,  G01P15/0802

Abstract: A microelectromechanical sensor that in one embodiment includes a supporting structure, having a substrate and electrode structures anchored to the substrate; and a sensing mass, movable with respect to the supporting structure so that a distance between the sensing mass and the substrate is variable. The sensing mass is provided with movable electrodes capacitively coupled to the electrode structures. Each electrode structure comprises a first fixed electrode and a second fixed electrode mutually insulated by a dielectric region and arranged in succession in a direction substantially perpendicular to a face of the substrate.

Abstract translation: 一种微机电传感器，其在一个实施例中包括支撑结构，其具有衬底和锚定到衬底的电极结构; 以及相对于支撑结构可移动的感测质量，使得感测质量块和衬底之间的距离是可变的。 感测质量体具有与电极结构电容耦合的可动电极。 每个电极结构包括第一固定电极和第二固定电极，所述第一固定电极和第二固定电极通过电介质区域相互绝缘并且在基本上垂直于所述衬底的表面的方向上相继布置。

公开(公告)号：US20130215325A1

公开(公告)日：2013-08-22

申请号：US13843817

申请日：2013-03-15

Applicant: DigitalOptics Corporation MEMS

Inventor： Robert J. Calvet ,  Xiaolei Liu ,  Roman C. Gutierrez ,  Ankur Jain ,  Guiqin Wang

IPC: H04N5/225 ,  G02B7/04

CPC classification number: H04N5/2254 ,  B81B3/0037 ,  B81B2201/033 ,  B81B2203/053 ,  G02B7/04 ,  G03B3/10 ,  G03B5/00 ,  G03B2205/0007 ,  G03B2205/0084

Abstract: In one embodiment, an actuator includes a moving frame coupled to a fixed frame by a plurality of elongated parallel motion flexures for generally parallel motion relative to the fixed frame and between an as-fabricated position and a deployed position. The flexures are disposed at a first angle relative to a line extending perpendicularly to both the moving frame and the fixed frame when the moving frame is disposed in the as-fabricated position, and at a second angle relative to that same line when the moving frame is disposed in the deployed position, Arcuate movement of the first frame relative to the second frame is controlled by constraining the first angle to a value of less than about half of the sum of the first and second angles.

Abstract translation: 在一个实施例中，致动器包括通过多个细长的平行运动挠曲件联接到固定框架的移动框架，用于相对于固定框架大致平行的运动，以及在制造位置和展开位置之间。 当运动框架设置在制造位置时，挠曲件相对于垂直于移动框架和固定框架延伸的线以第一角度设置，并且当移动框架 被布置在展开位置中，第一框架相对于第二框架的弓形运动通过将第一角度约束到小于第一和第二角度之和的大约一半的值来控制。