公开(公告)号：US20090170014A1

公开(公告)日：2009-07-02

申请号：US12399483

申请日：2009-03-06

Applicant: YUICHI SHIBAZAKI

Inventor： YUICHI SHIBAZAKI

IPC: G03F1/00 ,  G03F7/20 ,  G03B27/62 ,  G03B27/54

CPC classification number: G03F1/38 ,  G03F7/201 ,  G03F7/2035 ,  G03F7/703 ,  G03F7/70358 ,  G03F9/00 ,  G03F9/70 ,  G03F9/7023

Abstract: A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β, and circumference ratio is taken as π, then the conditions for D≧(β×L)/π are satisfied.

Abstract translation: 使用圆筒状的荫罩通过投影光学系统在基板上形成图案的图像。 掩模具有图案形成表面，其上形成图案并且围绕预定轴线放置，并且掩模能够以预定轴线为旋转轴线旋转，与基板的移动同步 至少预定的一维方向。 当图案形成表面上的掩模的直径取为D时，将一维方向上的基板的最大长度设为L，投影光学系统的投影比为β，圆周 以pi为比例，则满足D> =（betaxL）/ pi的条件。

公开(公告)号：US07279693B2

公开(公告)日：2007-10-09

申请号：US11196191

申请日：2005-08-02

Applicant: Michael Goldstein ,  Peter J. Silverman

Inventor： Michael Goldstein ,  Peter J. Silverman

IPC: A61N5/06

CPC classification number: G03F7/7005 ,  G03F7/201

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

公开(公告)号：US20070159611A1

公开(公告)日：2007-07-12

申请号：US11685646

申请日：2007-03-13

Applicant: Michael Goldstein ,  Peter Silverman

Inventor： Michael Goldstein ,  Peter Silverman

IPC: G03B27/42

CPC classification number: G03F7/7005 ,  G03F7/201

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract translation: 用于极紫外（EUV）光刻系统的照明系统可以包括多个EUV光源。 当照射面罩时，系统可以组合来自多个源的光。

公开(公告)号：US07015529B2

公开(公告)日：2006-03-21

申请号：US10453229

申请日：2003-06-03

Applicant: Donald L. Yates ,  Garry A. Mercaldi

Inventor： Donald L. Yates ,  Garry A. Mercaldi

IPC: H01L29/78

CPC classification number: H01L28/92 ,  G03F7/0035 ,  G03F7/201 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/0275 ,  H01L21/32139 ,  H01L27/10852 ,  H01L28/84 ,  H01L28/91

Abstract: Container structures for use in integrated circuits and methods of their manufacture without the use of mechanical planarization such as chemical-mechanical planarization (CMP), thus eliminating CMP-induced defects and variations. The methods utilize localized masking of holes for protection of the inside of the holes during non-mechanical removal of exposed surface layers. The localized masking is accomplished through differential exposure of a resist layer to electromagnetic or thermal energy. The container structures are adapted for use in memory cells and apparatus incorporating such memory cells, as well as other integrated circuits.

公开(公告)号：US20050221203A1

公开(公告)日：2005-10-06

申请号：US11085274

申请日：2005-03-22

Applicant: Gen Fujii

Inventor： Gen Fujii

IPC: G03F7/004 ,  G03F7/20 ,  G03F9/00 ,  H01L21/208 ,  H01L21/28 ,  H01L21/3205 ,  H01L21/336 ,  H01L21/77 ,  H01L29/49

CPC classification number: H01L29/4908 ,  G03F7/0043 ,  G03F7/201 ,  H01L21/28008 ,  H01L21/32051 ,  H01L27/1285 ,  H01L27/1292 ,  H01L29/66765

Abstract: To provide a display device which can be manufactured with higher efficiency in the use of material through a simplified manufacturing process, and a method for manufacturing the display device. Another object is to provide a technique by which patterns of a wiring the like which constitutes the display device can be formed to a desired shape with good control. In a method for forming a pattern according to the present invention, a mask is formed over a light-transmitting substrate; a first region including a photocatalyst is formed over the substrate and the mask; the photocatalyst is irradiated with light through the substrate to modify a part of the first region; a second region is formed; and a composition containing a pattern forming material is discharged to the second region, thus, a pattern is formed. The mask does not transmit light.

Abstract translation: 提供一种能够通过简化的制造工艺在材料使用中以更高效率制造的显示装置，以及用于制造显示装置的方法。 另一个目的是提供一种技术，通过该技术可以以良好的控制将构成显示装置的布线图案形成为期望的形状。 在根据本发明的图案形成方法中，在透光性基板上形成掩模， 在基板和掩模上形成包括光催化剂的第一区域; 所述光催化剂用光照射通过所述基板以改变所述第一区域的一部分; 形成第二区域; 并且含有图案形成材料的组合物被排出到第二区域，因此形成图案。 面罩不透光。

公开(公告)号：US06897942B2

公开(公告)日：2005-05-24

申请号：US10759603

申请日：2004-01-20

Applicant: Naomasa Shiraishi

Inventor： Naomasa Shiraishi

IPC: G03F1/00 ,  G03F7/20 ,  G03F9/00 ,  G03B27/54 ,  G03B27/42 ,  G03B27/72

CPC classification number: G03F9/7088 ,  G03F7/201 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/70333 ,  G03F7/70358 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891

Abstract: An exposure apparatus and method to expose an object with an illumination beam irradiated on a mask from a light source disposes an optical unit between the light source and an optical integrator of an illumination optical system to illuminate the mask with an illumination beam, of which an intensity distribution on a Fourier transform plane with respect to a pattern on the mask has an increased intensity portion apart from the optical axis relative to a portion of the intensity distribution on the optical axis.

Abstract translation: 用光源照射在掩模上的照射光束曝光物体的曝光装置和方法将光学单元设置在照明光学系统的光源和光学积分器之间，以照明光束照射掩模，其中， 相对于掩模上的图案，傅里叶变换平面上的强度分布相对于光轴上的强度分布的一部分具有与光轴相距的增加的强度部分。

公开(公告)号：US20040227919A1

公开(公告)日：2004-11-18

申请号：US10759604

申请日：2004-01-20

Applicant: Nikon Corporation

Inventor： Naomasa Shiraishi

IPC: G03B027/54

CPC classification number: G03F9/7088 ,  G03F7/201 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/70333 ,  G03F7/70358 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891

Abstract: An exposure apparatus and method to expose an object with an illumination beam irradiated on a mask from a light source disposes an optical unit between the light source and an optical integrator of an illumination optical system to illuminate the mask with an illumination beam, of which an intensity distribution on a Fourier transform plane with respect to a pattern on the mask has an increased intensity portion apart from the optical axis relative to a portion of the intensity distribution on the optical axis.

公开(公告)号：US06710855B2

公开(公告)日：2004-03-23

申请号：US10202007

申请日：2002-07-25

Applicant: Naomasa Shiraishi

Inventor： Naomasa Shiraishi

IPC: G03B2754

CPC classification number: G03F9/7088 ,  G03F7/201 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/70333 ,  G03F7/70358 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891

Abstract: An exposure apparatus and method to expose an object with an illumination beam irradiated on a mask from a light source disposes an optical unit between the light source and an optical integrator of an illumination optical system to illuminate the mask with an illumination beam, of which an intensity distribution on a Fourier transform plane with respect to a pattern on the mask has an increased intensity portion apart from the optical axis relative to a portion of the intensity distribution on the optical axis.

Abstract translation: 用光源照射在掩模上的照射光束曝光物体的曝光装置和方法将光学单元设置在照明光学系统的光源和光学积分器之间，以照明光束照射掩模，其中， 相对于掩模上的图案，傅里叶变换平面上的强度分布相对于光轴上的强度分布的一部分具有与光轴相距的增加的强度部分。

公开(公告)号：US06665050B2

公开(公告)日：2003-12-16

申请号：US10195421

申请日：2002-07-16

Applicant: Naomasa Shiraishi

Inventor： Naomasa Shiraishi

IPC: G03B2742

CPC classification number: G03F9/7088 ,  G03F7/201 ,  G03F7/70066 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/70333 ,  G03F7/70358 ,  G03F7/7055

Abstract: An exposure method of exposing a mask pattern having linear features in orthogonal first and second directions onto an object including the steps of disposing a diffraction optical element that diffracts light in different directions from an optical axis of the illumination optical system between the light source and an optical integrator in the illumination optical system; distributing the diffracted light at regions apart from the optical axis on a predetermined plane substantially conjugate with a pupil plane of the projection optical system to form on the predetermined plane an intensity distribution having increased intensity portions relative to a portion on first and second axes defined to intersect each other at the optical axis along the first and second directions; and projecting the illuminated pattern having the intensity distribution onto the object.

Abstract translation: 一种将在正交的第一和第二方向上具有线性特征的掩模图案曝光到物体上的曝光方法，包括以下步骤：在光源和光源之间设置衍射光学元件，该衍射光学元件沿着照明光学系统的光轴在不同方向衍射光 照明光学系统中的光学积分器; 在与投影光学系统的瞳平面基本共轭的预定平面上将衍射光分布在与光轴分开的区域，以在预定平面上形成强度分布，其强度分布相对于第一和第二轴上的部分被限定为 沿着第一和第二方向在光轴处彼此相交; 并将具有强度分布的照明图案投射到物体上。

公开(公告)号：US06636293B1

公开(公告)日：2003-10-21

申请号：US09377615

申请日：1999-08-19

Applicant: Naomasa Shiraishi

Inventor： Naomasa Shiraishi

IPC: G03B2742

CPC classification number: G03F9/7088 ,  G03F7/201 ,  G03F7/701 ,  G03F7/7025

Abstract: A method and apparatus for transferring a fine pattern (12) on a mask (11) onto a substrate (17) by a projection exposure apparatus including an illumination optical system (1-10) for irradiating an illuminating light on the mask (11), and a projection optical system (13) for projecting an image of the fine pattern (12) on the illuminated mask onto the substrate (17). The illuminating light is irradiated at least in the form of a pair of light beams opposedly inclined with respect to the mask through a pair of transparent windows (6a, 6b) of a spatial filter (6) whereby either one of the ±first-order diffracted beams and the 0-order diffracted beam produced from the fine pattern (12) of the mask (11) illuminated by each light beam are respectively passed apart by the equal distance from the optical axis of the projection optical system at or near to the Fourier transform plane within the projection optical system with respect to the fine pattern (12) of the mask (11), thereby forming on the substrate (17) a high-resolution projected image of a strong light-and-dark contrast with a high degree of focus depth.

Abstract translation: 一种用于通过包括照射光学系统（1-10）的投影曝光装置将掩模（11）上的精细图案（12）传送到基板（17）上的方法和装置，用于将照明光照射在掩模（11）上， 以及投影光学系统（13），用于将照射的掩模上的精细图案（12）的图像投影到基板（17）上。 照明光至少以通过空间滤光片（6）的一对透明窗（6a，6b）相对于掩模相对倾斜的一对光束的形式照射，由此±一阶 衍射光束和由每个光束照射的掩模（11）的精细图案（12）产生的0级衍射光束分别从投影光学系统的光轴在等于或接近于 相对于掩模（11）的精细图案（12）在投影光学系统内的傅立叶变换平面，从而在基板（17）上形成具有高的亮 - 暗对比度的高分辨率投影图像 焦点深度。