公开(公告)号：US20230400782A1

公开(公告)日：2023-12-14

申请号：US18033530

申请日：2021-10-14

Applicant: ASML Holding N.V.

Inventor： Douglas C. CAPPELLI

IPC: G03F7/00

CPC classification number: G03F7/706849 ,  G03F7/706845 ,  G03F7/706847

Abstract: An inspection system, a lithographic apparatus, and a method are provided. The inspection system includes an illumination system, an optical system, a shutter system, an objective system and a detector. The illumination system is configured to generate an illumination beam. The optical system is configured to split the illumination beam into a first sub-beam and a second sub-beam. The shutter system is configured to independently control a transmittance of the first sub-beam and the second subbeam. The objective system is configured to receive the first sub-beam and the second beam from the optical system and direct the first sub-beam and the second sub-beam towards a substrate having a target structure. The detector is configured to receive an image or a diffracted image of the target structure.

公开(公告)号：US20230359127A1

公开(公告)日：2023-11-09

申请号：US18026115

申请日：2021-08-24

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Hans BUTLER ,  Arie Jeffrey DEN BOEF ,  Mark Constant Johannes BAGGEN ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Richard Carl ZIMMERMAN

IPC: G03F7/00

CPC classification number: G03F7/70625 ,  G03F7/706835

Abstract: A metrology tool that includes a substrate table to hold a substrate; a projection system configured to project a beam on a target portion of the substrate; an actuator configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.

公开(公告)号：US20230273531A1

公开(公告)日：2023-08-31

申请号：US18016225

申请日：2021-06-29

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Justin Lloyd KREUZER ,  Stephen ROUX

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/706845 ,  G03F7/706849 ,  G03F7/706851 ,  G03F7/70233

Abstract: A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical element directs radiation toward a target to generate scattered radiation from the target. The first detector receives a first portion of the scattered radiation and generates a first detection signal based on the received first portion. The multimode waveguide interferes a second portion of the scattered radiation using modes of the multimode waveguide. The second detector receives the interfered second portion and generates a second detection signal based on the received interfered second portion. The processor receives the first and second detection signals. The processor analyzes the received first portion, the received interfered second portion, and a propagation property of the multimode waveguide. The processor determines the property of the target based on the analysis.

公开(公告)号：US20230236518A1

公开(公告)日：2023-07-27

申请号：US18008283

申请日：2021-06-09

Applicant: ASML Netherlands B.V. ,  ASML HOLDING N.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Koos VAN BERKEL ,  Marcus Adrianus VAN DE KERKHOF ,  Roger Franciscus Mattheus Maria HAMELINCK ,  Shahab SHERVIN ,  Marinus Augustinus Christiaan VERSCHUREN ,  Johannes Bernardus Charles ENGELEN ,  Matthias KRUIZINGA ,  Tammo UITTERDIJK ,  Oleksiy Sergiyovich GALAKTIONOV ,  Kjeld Gertrudus Hendrikus JANSSEN ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Peter VAN DELFT

IPC: G03F7/00

CPC classification number: G03F7/70825 ,  G03F7/70708

Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

公开(公告)号：US20230185204A1

公开(公告)日：2023-06-15

申请号：US17910933

申请日：2021-03-16

Applicant: ASML HOLDING N.V.

Inventor： Joe TRANCHO ,  William Pierce CHAPIN ,  Ryan Richard WESTOVER ,  Gerald W. MCDOOM ,  Edward HORTON

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70825 ,  G03F9/7046

Abstract: An optical apparatus and a lithographic apparatus including the optical apparatus. The optical apparatus includes a substrate having an aperture for passing light; a transmissive optical element covering the aperture of the substrate; and an optical contact bond between the substrate and transmissive optical element, the optical contact bond being spaced from the aperture a sufficient distance such that stress forces in the transmissive optical element from the optical contact bond to the aperture are below an acceptable stress threshold. The optical contact bond geometry herein, for example, minimizes a contact area and provides a quasi-kinematic (near-exactly constrained) interface between the substrate and the optical element.

公开(公告)号：US11662198B2

公开(公告)日：2023-05-30

申请号：US16650962

申请日：2018-09-14

Applicant: ASML Holding N.V.

Inventor： Parag Vinayak Kelkar ,  Justin Lloyd Kreuzer

IPC: G01B11/06 ,  G02B5/30 ,  G02B27/28 ,  G03F7/20 ,  G01B11/24

CPC classification number: G01B11/0658 ,  G01B11/24 ,  G02B5/3041 ,  G02B27/283 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70641 ,  G01B2210/56

Abstract: An inspection apparatus, including: an optical system configured to provide a beam of radiation to a surface to be measured and to receive redirected radiation from the surface; and a detection system configured to measure the redirected radiation, wherein the optical system includes an optical element to process the radiation, the optical element including a Mac Neille-type multilayer polarizing coating configured to produce a reduced chromatic offset of the radiation.

公开(公告)号：US11656555B2

公开(公告)日：2023-05-23

申请号：US17605601

申请日：2020-04-14

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Janardan Nath ,  Kalyan Kumar Mankala ,  Todd R. Downey ,  Joseph Harry Lyons ,  Ozer Unluhisarcikli ,  Alexander Harris Ledbetter ,  Nicholas Stephen Apone ,  Tian Gang

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70083 ,  G03F7/70133

Abstract: An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.

公开(公告)号：US20230063156A1

公开(公告)日：2023-03-02

申请号：US17794897

申请日：2020-12-24

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Ronald Peter ALBRIGHT ,  Kursat BAL ,  Vadim Yevgenyevich BANINE ,  Richard Joseph BRULS ,  Sjoerd Frans DE VRIES ,  Olav Waldemar Vladimir FRIJNS ,  Yang-Shan HUANG ,  Zhuangxiong HUANG ,  Johannes Henricus Wilhelmus JACOBS ,  Johannes Hubertus Josephina MOORS ,  Georgi Nanchev NENCHEV ,  Andrey NIKIPELOV ,  Thomas Maarten RAASVELD ,  Manish RANJAN ,  Edwin TE SLIGTE ,  Karl Robert UMSTADTER ,  Eray UZGÖREN ,  Marcus Adrianus VAN DE KERKHOF ,  Parham YAGHOOBI

IPC: G03F7/20

Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

公开(公告)号：US20230035511A1

公开(公告)日：2023-02-02

申请号：US17791641

申请日：2021-01-04

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Ronny DER KINDEREN ,  Tian GANG ,  Todd R. DOWNEY

IPC: G03F7/20

Abstract: A system, method, a lithographic apparatus and a software product configured to determine a drift in an attribute of an illumination and a corresponding drift correction. The system includes a lithographic apparatus that includes at least two sensors, each configured to measure a property related to an illumination region provided for imaging a substrate. Furthermore, a processor is configured to: determine, based on a ratio of the measured property, a drift of the illumination region with respect to a reference position; determine, based on the drift of the illumination region, a drift in an attribute related to the illumination upstream of the illumination region measured by the at least two sensors, and determine, based on the drift in the attribute, the drift correction to be applied to the attribute to compensate for the drift in the attribute.

公开(公告)号：US20230021360A1

公开(公告)日：2023-01-26

申请号：US17790341

申请日：2020-12-04

Applicant: ASML Holding N.V.

Inventor： Matthew LIPSON ,  Mehmet Ali AKBAS

IPC: G03F7/20 ,  C03C27/00 ,  H01L21/683

Abstract: Systems, apparatuses, and methods are provided for manufacturing an electrostatic clamp. An example method can include forming, during a first duration of time comprising a first time, a top clamp comprising a first set of electrodes and a plurality of burls. The method can further include forming, during a second duration of time comprising a second time that overlaps the first time, a core comprising a plurality of fluid channels configured to carry a thermally conditioned fluid. The method can further include forming, during a third duration of time comprising a third time that overlaps the first time and the second time, a bottom clamp comprising a second set of electrodes. In some aspects, the example method can include manufacturing the electrostatic clamp without an anodic bond.