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公开(公告)号:US20200057394A1
公开(公告)日:2020-02-20
申请号:US16587483
申请日:2019-09-30
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor: Matthias KRUIZINGA , Maarten Mathijs Marinus JANSEN , Jorge Manuel AZEREDO LIMA , Erik Willem BOGAART , Derk Servatius Gertruda BROUNS , Marc BRUIJN , Richard Joseph BRULS , Jeroen DEKKERS , Paul JANSSEN , Mohammad Reza KAMALI , Ronald Harm Gunther KRAMER , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Matthew LIPSON , Erik Roelof LOOPSTRA , Joseph H. LYONS , Stephen ROUX , Gerrit VAN DEN BOSCH , Sander VAN DEN HEIJKANT , Sandra VAN DER GRAAF , Frits VAN DER MEULEN , Jérôme François SylvainVirgile VAN LOO , Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号:US20240036485A1
公开(公告)日:2024-02-01
申请号:US18269191
申请日:2021-12-02
Applicant: ASML Netheriands B. V. , ASML Holding N.V.
Inventor: Arjan Johannes Anton BEUKMAN , Sebastianus Adrianus GOORDEN , Stephen ROUX , Sergel SOKOLOV , Filippo ALPEGGIANI
CPC classification number: G03F9/7065 , G03F7/70625 , G03F9/7046
Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
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公开(公告)号:US20230273531A1
公开(公告)日:2023-08-31
申请号:US18016225
申请日:2021-06-29
Applicant: ASML Holding N.V.
Inventor: Mohamed SWILLAM , Justin Lloyd KREUZER , Stephen ROUX
CPC classification number: G03F7/706845 , G03F7/706849 , G03F7/706851 , G03F7/70233
Abstract: A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical element directs radiation toward a target to generate scattered radiation from the target. The first detector receives a first portion of the scattered radiation and generates a first detection signal based on the received first portion. The multimode waveguide interferes a second portion of the scattered radiation using modes of the multimode waveguide. The second detector receives the interfered second portion and generates a second detection signal based on the received interfered second portion. The processor receives the first and second detection signals. The processor analyzes the received first portion, the received interfered second portion, and a propagation property of the multimode waveguide. The processor determines the property of the target based on the analysis.
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公开(公告)号:US20240077308A1
公开(公告)日:2024-03-07
申请号:US18260817
申请日:2022-01-04
Applicant: ASML Holding N.V.
Inventor: Mohamed SWILLAM , Justin Lloyd KREUZER , Stephen ROUX , Michael Leo NELSON , Muhsin ERALP
CPC classification number: G01B11/272 , G03F7/20
Abstract: A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to generate first and second beams of radiation. The first and second beams have first and second different non-zero diffraction orders, respectively. The optical system directs the first and second beams toward a target structure such that first and second scattered beams of radiation are generated based on the first and second beams, respectively. The metrology system adjusts a phase difference of the first and second scattered beams. The optical element interferes the first and second scattered beams at an imaging detector that generates a detection signal. The processor receives and analyzes the detection signal to determine a property of the target structure based on the adjusted phase difference.
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公开(公告)号:US20220057723A1
公开(公告)日:2022-02-24
申请号:US17415715
申请日:2019-12-12
Applicant: ASML Holding N.V.
IPC: G03F7/20
Abstract: An apparatus for reticle sub-field thermal control in a lithography system is disclosed. The apparatus includes a clamp configured to fix an object. The clamp includes a plurality of gas distribution features that are spatially arranged in a pattern. The apparatus further includes a gas pressure controller configured to individually control a gas flow rate through each of the plurality of gas distribution features to spatially modulate a gas pressure distribution in a space between the clamp and the object. The gas distribution features include a plurality of trenches or holes arranged in an array form.
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公开(公告)号:US20240361703A1
公开(公告)日:2024-10-31
申请号:US18769032
申请日:2024-07-10
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor: Mohamed SWILLAM , Stephen ROUX , Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Arie Jeffrey DEN BOEF
CPC classification number: G03F7/70633 , G02B6/1225 , G02B26/0833
Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.
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公开(公告)号:US20230266255A1
公开(公告)日:2023-08-24
申请号:US18012801
申请日:2021-06-09
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor: Ilse VAN WEPEREN , Arjan Johannes Anton BEUKMAN , Mohamed SWILLAM , Justin Lloyd KREUZER , Stephen ROUX
IPC: G01N21/956
CPC classification number: G01N21/956 , G01N2021/95676
Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.
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公开(公告)号:US20230059471A1
公开(公告)日:2023-02-23
申请号:US17796640
申请日:2021-01-21
Applicant: ASML Holding N.V.
Inventor: Mohamed SWILLAM , Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Stephen ROUX , Yevgeniy Konstantinovich SHMAREV
Abstract: A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tenability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.
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公开(公告)号:US20220350268A1
公开(公告)日:2022-11-03
申请号:US17765214
申请日:2020-09-25
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor: Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Robert John SOCHA , Stephen ROUX , Simon Reinald HUISMAN
Abstract: A structure of a semiconductor device with a sub-segmented grating structure as a metrology mark and a method for configuring the metrology mark. The method for configuring a metrology mark may be used in a lithography process. The method may include determining an initial characteristic function of an initial metrology mark disposed within a layer stack. The method also includes perturbing one or more variables of the plurality of subsegments of the metrology mark (e.g., pitch, duty cycle, and/or line width of the plurality of subsegments) and further perturbing a thickness of one or more layers within the layer stack. The method further includes iteratively performing the perturbations until a minimized characteristic function of an initial metrology mark is determined to set a configuration for the plurality of subsegments.
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公开(公告)号:US20240319617A1
公开(公告)日:2024-09-26
申请号:US18578168
申请日:2022-06-28
Applicant: ASML Holding N.V.
Inventor: Mohamed SWILLAM , Wei GUO , Stephen ROUX
IPC: G03F7/00 , G01N21/956 , G02F1/295
CPC classification number: G03F7/706849 , G01N21/956 , G02F1/2955 , G03F7/7065 , G03F7/706837 , G03F7/706845 , G03F7/706847 , G03F7/70925 , G01N2201/068
Abstract: A metrology system includes a radiation source (708), a phased array (722a,b;724a,b;726;734), a detector, and a comparator. The phased array includes optical elements (706), waveguides (704), and phase modulators (702). The phased array generates a beam of radiation and directs the beam toward a surface of an object. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves combine to form the beam. The detector receives radiation scattered from the surface and generates a detection signal based on the received radiation. The comparator analyzes the detection signal and determines a location of a defect on the surface based on the analyzing.
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