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    Photoresist dispense pump
    11.
    发明授权
    Photoresist dispense pump 有权
    光电分配泵

    公开(公告)号：US6071094A

    公开(公告)日：2000-06-06

    申请号：US191801

    申请日：1998-11-13

    Applicant: Cheng-Hung Yu ,  Ming-Der Chou ,  Ching-Tsai Luo ,  Tung-Hsing Tien

    Inventor： Cheng-Hung Yu ,  Ming-Der Chou ,  Ching-Tsai Luo ,  Tung-Hsing Tien

    IPC: B05C11/10 ,  F04B43/08 ,  G03F7/16 ,  H01L21/00 ,  F04B45/027 ,  F04B53/10

    CPC classification number: H01L21/6715 ,  B05C11/1002 ,  B05C11/1047 ,  F04B43/088 ,  G03F7/16

    Abstract: A photoresist dispense pump receives photoresist from two pipelines, a first pipeline and a second pipeline, and pumps out the photoresist through a third pipeline. The photoresist dispense pump contains a first bellows and a second bellows receiving photoresist from the second pipeline, wherein the first bellows and the second bellows are separated by a partition. Photoresist is fed into the third pipeline from the second bellows. On the center region of the partition, there is a central diaphragm that allows photoresist to flow in a direction from the first bellows toward the second bellows, but not in the reverse direction.

    Abstract translation: 光致抗蚀剂分配泵从两个管道接收光致抗蚀剂，第一管道和第二管道，并通过第三管道泵出光致抗蚀剂。 光刻胶分配泵包含第一波纹管和从第二管线接收光致抗蚀剂的第二波纹管，其中第一波纹管和第二波纹管被分隔开。 光阻胶从第二个波纹管进入第三个管道。 在隔板的中心区域，有一个中心隔膜，允许光致抗蚀剂在从第一波纹管朝向第二波纹管的方向上流动，但不反向流动。

    METHOD FOR FABRICATING AN IMAGE SENSOR
    16.
    发明申请
    METHOD FOR FABRICATING AN IMAGE SENSOR 有权
    制作图像传感器的方法

    公开(公告)号：US20090294888A1

    公开(公告)日：2009-12-03

    申请号：US12128600

    申请日：2008-05-28

    Applicant: Hsin-Ting Tsai ,  Cheng-Hung Yu

    Inventor： Hsin-Ting Tsai ,  Cheng-Hung Yu

    IPC: H01L31/0216 ,  G03F7/20

    CPC classification number: H01L27/14685 ,  G03F7/2022 ,  H01L27/14627 ,  H01L27/14643

    Abstract: A method for fabricating an image sensor is disclosed. First, a semiconductor substrate is provided, in which a photosensitive region is defined on the semiconductor substrate. At least one photosensitive material is then formed on the semiconductor substrate, and a first exposure process is performed to form a tapered pattern in the photosensitive material. A second exposure process is performed to form a straight foot pattern in the photosensitive material, and a developing process is performed to remove the tapered pattern and straight foot pattern to form the photosensitive material into a plurality of photosensitive blocks. A reflow process is conducted thereafter to form the photosensitive blocks into a plurality of microlenses.

    Abstract translation: 公开了一种用于制造图像传感器的方法。 首先，提供半导体衬底，其中光敏区被限定在半导体衬底上。 然后在半导体衬底上形成至少一种感光材料，并进行第一曝光处理以在感光材料中形成锥形图案。 执行第二曝光处理以在感光材料中形成直脚图案，并且进行显影处理以去除锥形图案和直脚图案以将感光材料形成为多个感光块。 此后进行回流处理以将感光块形成多个微透镜。

    METHOD OF PREVENTING COLOR STRIATION IN FABRICATING PROCESS OF IMAGE SENSOR AND FABRICATING PROCESS OF IMAGE SENSOR
    17.
    发明申请
    METHOD OF PREVENTING COLOR STRIATION IN FABRICATING PROCESS OF IMAGE SENSOR AND FABRICATING PROCESS OF IMAGE SENSOR 审中-公开
    图像传感器制作过程中颜色碰撞的方法及图像传感器的制作工艺

    公开(公告)号：US20090124037A1

    公开(公告)日：2009-05-14

    申请号：US11939326

    申请日：2007-11-13

    Applicant: Cheng-Hung Yu

    Inventor： Cheng-Hung Yu

    IPC: H01L31/0232

    CPC classification number: H01L27/14685

    Abstract: A fabricating process of an image sensor is provided. A substrate having thereon a circuit of the image sensor and an insulating layer is provided, wherein the insulating layer has therein a pad opening exposing a metal pad of the circuit. A filling layer is formed in the pad opening, and a color filter array is formed over the insulating layer. A planarization layer is formed over the substrate covering the color filter array, and a microlens array is formed on the planarization layer. The filling layer is then removed.

    Abstract translation: 提供了图像传感器的制造工艺。 提供了其上具有图像传感器和绝缘层的电路的基板，其中绝缘层具有暴露电路的金属焊盘的焊盘开口。 填充层形成在焊盘开口中，并且在绝缘层上形成滤色器阵列。 在覆盖滤色器阵列的基板上形成平坦化层，在平坦化层上形成微透镜阵列。 然后取出填充层。

    Apparatus for on-line cleaning a wafer chuck with laser
    19.
    发明授权
    Apparatus for on-line cleaning a wafer chuck with laser 有权
    用于用激光在线清洁晶片卡盘的装置

    公开(公告)号：US06635844B2

    公开(公告)日：2003-10-21

    申请号：US09683467

    申请日：2002-01-03

    Applicant: Cheng-Hung Yu

    Inventor： Cheng-Hung Yu

    IPC: B23K2600

    CPC classification number: B23K26/128 ,  B08B7/0042 ,  B23K26/064 ,  B23K26/0648 ,  B23K26/0665 ,  B23K26/12 ,  B23K26/123 ,  B23K26/127 ,  B23K26/142

    Abstract: A stepper system, having an apparatus for on-line cleaning a wafer chuck by utilizing laser, has a wafer stage capable of moving horizontally along x-y directions and vertically along z direction, the wafer chuck, having a top surface contaminated by organic materials, fixed on the wafer stage, a laminar flow chamber used to isolate the wafer chuck during the cleaning of the wafer chuck, an excimer laser generation module, a laser beam delivery system and a projection lens system both for guiding the pulse laser to the contaminated top surface of the wafer chuck to decompose the organic materials thereon, and an inert gas supply for providing an inert gas flow to remove the decomposed organic materials from the top surface of the wafer chuck. A control system is further used to control the global or local cleaning of the contaminated top surface.

    Abstract translation: 具有通过利用激光在线清洗晶片卡盘的装置的步进系统具有能够沿xy方向水平移动并且沿z方向垂直移动的晶片载台，具有被有机材料污染的顶面的晶片卡盘固定 在晶片台上，用于在清洁晶片卡盘期间隔离晶片卡盘的层流室，准分子激光产生模块，激光束传输系统和投影透镜系统，用于将脉冲激光引导到受污染的顶表面 的晶片卡盘以分解其上的有机材料，以及用于提供惰性气流以从晶片卡盘的顶表面去除分解的有机材料的惰性气体供应。 进一步使用控制系统来控制污染的顶部表面的全局或局部清洁。

    Structure of printhead
    20.
    发明授权
    Structure of printhead 有权

    公开(公告)号：US06623109B2

    公开(公告)日：2003-09-23

    申请号：US10171284

    申请日：2002-06-13

    Applicant: Tse-Chi Mou ,  Ying-Lun Chang ,  Cheng-Hung Yu ,  Chin-Yi Chou

    Inventor： Tse-Chi Mou ,  Ying-Lun Chang ,  Cheng-Hung Yu ,  Chin-Yi Chou

    IPC: B41J205

    CPC classification number: B41J2/14072 ,  B41J2/14129 ,  B41J2202/03

    Abstract: A structure of a printhead for raising its product acceptance rate and improving its quality is provided. The structure of a printhead includes a base layer, a pattern layer disposed on the base layer, a channel barrier layer having a dry film, an ink channel, a flow channel and plural ink cavities on the pattern layer, and a nozzle plate adhered to the dry film of the channel barrier layer by thermal compression. The pattern layer further includes a flow pattern and a base pattern surrounding a central location for forming thereabove the ink channel.

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