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公开(公告)号：US20110212567A1
公开(公告)日：2011-09-01
申请号：US12714093
申请日：2010-02-26
Applicant: Hsin-Ting TSAI , Cheng-Hung Yu , Chin-Kuang Liu , Kun-Yen Hsu
Inventor： Hsin-Ting TSAI , Cheng-Hung Yu , Chin-Kuang Liu , Kun-Yen Hsu
IPC: H01L31/0232 , H01L31/18 , H01L27/14
CPC classification number: H01L27/14687 , H01L27/14636 , H01L27/14685
Abstract: A method of fabricating an image sensor device is provided. First, a substrate comprising a pixel array region and a pad region is provided. A patterned metal layer and a first planarization layer having an opening exposing the patterned metal layer in the pad region are sequentially formed on the substrate. A color filter array is formed on the first planarization layer in the pixel array region. A second planarization layer is formed to cover the color filter array and filled into the opening. A plurality of microlens is formed above the color filter array on the second planarization layer. A capping layer is conformally formed on the microlens and the second planarization layer. An etching step is performed to remove the capping layer and the second planarization layer in the opening so as to expose the patterned metal layer in the pad region.
Abstract translation: 提供一种制造图像传感器装置的方法。 首先，提供包括像素阵列区域和衬垫区域的衬底。 图案化金属层和具有露出焊盘区域中的图案化金属层的开口的第一平坦化层依次形成在基板上。 在像素阵列区域中的第一平坦化层上形成滤色器阵列。 形成第二平坦化层以覆盖滤色器阵列并填充到开口中。 在第二平坦化层上的滤色器阵列上方形成多个微透镜。 覆盖层保形地形成在微透镜和第二平坦化层上。 执行蚀刻步骤以去除开口中的覆盖层和第二平坦化层，以暴露焊盘区域中的图案化金属层。
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公开(公告)号：US20090294888A1
公开(公告)日：2009-12-03
申请号：US12128600
申请日：2008-05-28
Applicant: Hsin-Ting Tsai , Cheng-Hung Yu
Inventor： Hsin-Ting Tsai , Cheng-Hung Yu
IPC: H01L31/0216 , G03F7/20
CPC classification number: H01L27/14685 , G03F7/2022 , H01L27/14627 , H01L27/14643
Abstract: A method for fabricating an image sensor is disclosed. First, a semiconductor substrate is provided, in which a photosensitive region is defined on the semiconductor substrate. At least one photosensitive material is then formed on the semiconductor substrate, and a first exposure process is performed to form a tapered pattern in the photosensitive material. A second exposure process is performed to form a straight foot pattern in the photosensitive material, and a developing process is performed to remove the tapered pattern and straight foot pattern to form the photosensitive material into a plurality of photosensitive blocks. A reflow process is conducted thereafter to form the photosensitive blocks into a plurality of microlenses.
Abstract translation: 公开了一种用于制造图像传感器的方法。 首先，提供半导体衬底，其中光敏区被限定在半导体衬底上。 然后在半导体衬底上形成至少一种感光材料，并进行第一曝光处理以在感光材料中形成锥形图案。 执行第二曝光处理以在感光材料中形成直脚图案，并且进行显影处理以去除锥形图案和直脚图案以将感光材料形成为多个感光块。 此后进行回流处理以将感光块形成多个微透镜。
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公开(公告)号：US08707974B2
公开(公告)日：2014-04-29
申请号：US12635710
申请日：2009-12-11
Applicant: Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Ming-Hsin Lee , Wei-Hong Chuang , Kuei-Chang Tung , Yan-Yi Lu , Chin-Chin Wang
Inventor： Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Ming-Hsin Lee , Wei-Hong Chuang , Kuei-Chang Tung , Yan-Yi Lu , Chin-Chin Wang
IPC: B08B3/02
CPC classification number: B08B3/04 , B08B3/02 , H01L21/67051 , H01L21/6708
Abstract: A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.
Abstract translation: 一种晶片清洗装置，包括用于保持具有待清洗表面的晶片的晶片台，位于晶片上方的第一喷嘴，位于晶片上方的第二喷嘴。 第一高度在第一喷嘴和表面之间，第二高度在第二喷嘴和表面之间，其中第一高度比第二高度短。
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公开(公告)号：US08084289B2
公开(公告)日：2011-12-27
申请号：US12714093
申请日：2010-02-26
Applicant: Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Kun-Yen Hsu
Inventor： Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Kun-Yen Hsu
IPC: H01L21/00
CPC classification number: H01L27/14687 , H01L27/14636 , H01L27/14685
Abstract: A method of fabricating an image sensor device is provided. First, a substrate comprising a pixel array region and a pad region is provided. A patterned metal layer and a first planarization layer having an opening exposing the patterned metal layer in the pad region are sequentially formed on the substrate. A color filter array is formed on the first planarization layer in the pixel array region. A second planarization layer is formed to cover the color filter array and filled into the opening. A plurality of microlens is formed above the color filter array on the second planarization layer. A capping layer is conformally formed on the microlens and the second planarization layer. An etching step is performed to remove the capping layer and the second planarization layer in the opening so as to expose the patterned metal layer in the pad region.
Abstract translation: 提供一种制造图像传感器装置的方法。 首先，提供包括像素阵列区域和衬垫区域的衬底。 图案化金属层和具有露出焊盘区域中的图案化金属层的开口的第一平坦化层依次形成在基板上。 在像素阵列区域中的第一平坦化层上形成滤色器阵列。 形成第二平坦化层以覆盖滤色器阵列并填充到开口中。 在第二平坦化层上的滤色器阵列上方形成多个微透镜。 覆盖层保形地形成在微透镜和第二平坦化层上。 执行蚀刻步骤以去除开口中的覆盖层和第二平坦化层，以暴露焊盘区域中的图案化金属层。
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公开(公告)号：US6132113A
公开(公告)日：2000-10-17
申请号：US306260
申请日：1999-05-06
Applicant: Cheng-Hung Yu , Hsin-Min Lee , Yung-Chi Wu , Hsin-Ting Tsai
Inventor： Cheng-Hung Yu , Hsin-Min Lee , Yung-Chi Wu , Hsin-Ting Tsai
IPC: G03F7/30 , H01L21/00 , H01L21/687 , G03D5/00
CPC classification number: H01L21/68785 , G03F7/3021 , H01L21/6715 , H01L21/68792
Abstract: A developer cup. The developer cup includes a bed. A central spindle is vertically and rotatably coupled to a center of the bed through an end of the central spindle. A chuck is vertically coupled to an end of the central spindle opposite to the bed end. An upper coupling is coupled to the central spindle between the chuck and the bed, wherein the chuck. A lower coupling is moveably coupled to the central spindle between the upper coupling and the bed. The annular cup has an upper wheel and a lower wheel, wherein the upper wheel is aligned with the lower wheel, the upper wheel is coupled to the lower wheel through a plurality of the brackets, and the lower wheel is smaller than the upper wheel.
Abstract translation: 开瓶杯 显影杯包括一张床。 中心主轴通过中心主轴的一端垂直并可旋转地联接到床的中心。 卡盘垂直联接到与床端相对的中心轴的端部。 上连接件联接到卡盘和床之间的中心轴，其中卡盘。 下联接件可移动地联接到上联接器和床之间的中心主轴。 环形杯具有上轮和下轮，其中上轮与下轮对准，上轮通过多个托架联接到下轮，并且下轮小于上轮。
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Patent Agency Ranking
公开(公告)号：US08137901B2
公开(公告)日：2012-03-20
申请号：US12128600
申请日：2008-05-28
Applicant: Hsin-Ting Tsai , Cheng-Hung Yu
Inventor： Hsin-Ting Tsai , Cheng-Hung Yu
IPC: G03F7/20
CPC classification number: H01L27/14685 , G03F7/2022 , H01L27/14627 , H01L27/14643
Abstract: A method for fabricating an image sensor is disclosed. First, a semiconductor substrate is provided, in which a photosensitive region is defined on the semiconductor substrate. At least one photosensitive material is then formed on the semiconductor substrate, and a first exposure process is performed to form a tapered pattern in the photosensitive material. A second exposure process is performed to form a straight foot pattern in the photosensitive material, and a developing process is performed to remove the tapered pattern and straight foot pattern to form the photosensitive material into a plurality of photosensitive blocks. A reflow process is conducted thereafter to form the photosensitive blocks into a plurality of microlenses.
Abstract translation: 公开了一种用于制造图像传感器的方法。 首先，提供半导体衬底，其中光敏区被限定在半导体衬底上。 然后在半导体衬底上形成至少一种感光材料，并进行第一曝光处理以在感光材料中形成锥形图案。 执行第二曝光处理以在感光材料中形成直脚图案，并且进行显影处理以去除锥形图案和直脚图案以将感光材料形成为多个感光块。 此后进行回流处理以将感光块形成多个微透镜。
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公开(公告)号：US20110139188A1
公开(公告)日：2011-06-16
申请号：US12635710
申请日：2009-12-11
Applicant: Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Ming-Hsin Lee , Wei-Hong Chuang , Kuei-Chang Tung , Yan-Yi Lu , Chin-Chin Wang
Inventor： Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Ming-Hsin Lee , Wei-Hong Chuang , Kuei-Chang Tung , Yan-Yi Lu , Chin-Chin Wang
IPC: B08B3/00
CPC classification number: B08B3/04 , B08B3/02 , H01L21/67051 , H01L21/6708
Abstract: A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.
Abstract translation: 一种晶片清洗装置，包括用于保持具有待清洗表面的晶片的晶片台，位于晶片上方的第一喷嘴，位于晶片上方的第二喷嘴。 第一高度在第一喷嘴和表面之间，第二高度在第二喷嘴和表面之间，其中第一高度比第二高度短。
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8.发明授权Color filter array having hybrid color filters and manufacturing method thereof 有权具有混合滤色器的滤色器阵列及其制造方法公开(公告)号：US08765333B2
公开(公告)日：2014-07-01
申请号：US13561103
申请日：2012-07-30
Applicant: Cheng-Hung Yu
Inventor： Cheng-Hung Yu
CPC classification number: G02B5/201 , G03F7/0007
Abstract: A method for manufacturing a color filter array having hybrid color filters includes providing a high-grade photoresist and a low-grade photoresist, forming a plurality of first color filters on a substrate, and forming a plurality of second color filters and a plurality of third color filters on the substrate. The first color filters include the high-grade photoresist, and the second color filters and the third color filters include the low-grade photoresist. The high-grade photoresist of the first color filters includes a first amount of large size pigments in one unit area and the low-grade photoresists of the second color filters and the third color filters include a second amount of large size pigments in one unit area. A ratio of the second amount to the first amount is equal to or larger than 1.
Abstract translation: 一种制造具有混合滤色器的滤色器阵列的方法，包括提供高级光致抗蚀剂和低等级光致抗蚀剂，在衬底上形成多个第一滤色器，以及形成多个第二滤色器和多个第三滤色器 基底上的滤色器。 第一滤色器包括高级光致抗蚀剂，第二滤色器和第三滤色器包括低等级光致抗蚀剂。 第一滤色器的高级光致抗蚀剂包括在一个单位面积中的第一量的大尺寸颜料和第二滤色器的低等级光致抗蚀剂和第三滤色器在一个单位面积中包括第二量的大尺寸颜料 。 第二量与第一量的比例等于或大于1。
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公开(公告)号：US20110253435A1
公开(公告)日：2011-10-20
申请号：US13166133
申请日：2011-06-22
Applicant: Han-Pei Huang , Cheng-Hung Yu
Inventor： Han-Pei Huang , Cheng-Hung Yu
CPC classification number: H05K3/4644 , B33Y10/00 , B33Y80/00 , H05K1/0284 , H05K3/046 , H05K3/06 , H05K3/185 , H05K3/205 , H05K3/386 , H05K2201/0236 , H05K2201/09118 , H05K2203/0108 , H05K2203/013 , H05K2203/107 , Y10T29/49126 , Y10T29/49128 , Y10T29/49155 , Y10T29/49165
Abstract: A multilayer three-dimensional circuit structure and a manufacturing method thereof are provided in the present invention. The manufacturing method includes following steps. First, a three-dimensional insulating structure is provided. A first three-dimensional circuit structure is then formed on a surface of the three-dimensional insulating structure. Next, an insulating layer covering the first three-dimensional circuit structure is formed. Thereafter, a second three-dimensional circuit structure is formed on the insulating layer. Subsequently, at least a conductive via penetrating the insulating layer is formed for electrically connecting the second three-dimensional circuit structure and the first three-dimensional circuit structure.
Abstract translation: 本发明提供了一种多层三维电路结构及其制造方法。 制造方法包括以下步骤。 首先，提供三维绝缘结构。 然后在三维绝缘结构的表面上形成第一三维电路结构。 接下来，形成覆盖第一三维电路结构的绝缘层。 此后，在绝缘层上形成第二三维电路结构。 随后，至少形成了穿过绝缘层的导电通孔，用于电连接第二三维电路结构和第一三维电路结构。
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10.发明授权Wafer for manufacturing image sensors, test key layout for defects inspection, and methods for manufacturing image sensors and for forming test key 有权用于制造图像传感器的晶片，用于缺陷检查的测试键布局，以及用于制造图像传感器和形成测试键的方法公开(公告)号：US08003983B2
公开(公告)日：2011-08-23
申请号：US11379229
申请日：2006-04-19
Applicant: Cheng-Hung Yu
Inventor： Cheng-Hung Yu
IPC: H01L23/544
CPC classification number: H01L27/14627
Abstract: A wafer for manufacturing image sensors is disclosed. The wafer includes an image sensor and a test key. The image sensor includes a plurality of micro-lenses; the test key includes a plurality of micro-lens samples for defects inspection. The arrangement of the micro-lens samples on the test key is substantially different from the arrangement of the micro-lenses on the image sensor. The arrangement of the micro-lens samples on the test key allows defects inspection to become less complicated.
Abstract translation: 公开了一种用于制造图像传感器的晶片。 晶片包括图像传感器和测试键。 图像传感器包括多个微透镜; 测试键包括用于缺陷检查的多个微透镜样本。 微透镜样品在测试键上的布置与图像传感器上的微透镜的布置显着不同。 微透镜样品在测试键上的布置使得缺陷检查变得不那么复杂。
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