公开(公告)号：US20090213377A1

公开(公告)日：2009-08-27

申请号：US12463550

申请日：2009-05-11

Applicant: David SCHEINER ,  Michael Winik ,  Yakov Lyubchik

Inventor： David SCHEINER ,  Michael Winik ,  Yakov Lyubchik

IPC: G01J4/00

CPC classification number: G02B21/16 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/0243 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G02B17/06 ,  G02B17/0605 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B21/04 ,  G02B27/10 ,  G02B27/283

Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.

Abstract translation: 呈现镜头布置。 透镜装置包括具有凹面反射表面并限定透镜装置的光轴的第一元件以及沿着光轴与第一元件间隔开的第二基本平坦且至少部分反射的元件。 第二元件被配置为允许光通过其并且相对于光轴和第一元件定向，使得在输入光束到第二元件的预定入射角度处，输入光束被反射到反射 第一元件的表面并从其反射以穿过第二元件。

公开(公告)号：US07187456B2

公开(公告)日：2007-03-06

申请号：US11053254

申请日：2005-02-08

Applicant: David Scheiner ,  Vladimir Machavariani

Inventor： David Scheiner ,  Vladimir Machavariani

IPC: G01B11/06

CPC classification number: G01J3/42 ,  G01B11/02 ,  G01B11/0625 ,  H01L22/12

Abstract: A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. An optical model is provided, which is based on at least some of the features of the structure defined by a certain process of its manufacturing, and on the relation between a range of the wavelengths of incident radiation to be used for measurements and a space size between the two metal-containing regions in the grid cycle, and a skin depth of said metal. The model is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure. A measurement area is located and spectrophotometric measurements are applied to the measurement area, by illuminating it with incident light of a preset substantially wide wavelength range. A light component substantially specularly reflected from the measurement area is detected, and measured data representative of photometric intensities of each wavelength within the wavelength range is obtained. The measured and theoretical data are analyzed and the optical model is optimized until the theoretical data satisfies a predetermined condition. Upon detecting that the predetermined condition is satisfied, said at least one parameter of the structure is calculated.

Abstract translation: 一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的方法。 该结构表示具有由至少两个含金属区域形成的至少一个周期的格栅，该至少两个金属区域相对于限定波导的入射光被基本上透明的区域隔开。 提供了一种光学模型，其基于由其制造的特定过程定义的结构的至少一些特征以及用于测量的入射辐射的波长范围与空间大小之间的关系 在网格周期中的两个含金属区域之间，以及所述金属的趋肤深度。 该模型能够确定表示从结构镜面反射的不同波长的光分量的光度强度并且计算所述结构的至少一个期望参数的理论数据。 定位测量区域，并且通过用预设的基本上宽的波长范围的入射光照射分光光度测量值到测量区域。 检测从测量区域基本上镜面反射的光分量，并且获得表示波长范围内的每个波长的光度强度的测量数据。 分析测量和理论数据，并优化光学模型，直到理论数据满足预定条件。 在检测到满足预定条件时，计算结构的所述至少一个参数。

公开(公告)号：US06885446B2

公开(公告)日：2005-04-26

申请号：US10309348

申请日：2002-12-04

Applicant: Vladimir Machavariani ,  David Scheiner ,  Amit Weingarten ,  Avi Ravid

Inventor： Vladimir Machavariani ,  David Scheiner ,  Amit Weingarten ,  Avi Ravid

IPC: G01N21/21 ,  G01N21/84 ,  G01N21/95 ,  G01J3/42

CPC classification number: G01N21/95623 ,  G01N21/21 ,  G01N21/8422 ,  G01N21/9501 ,  G01N21/95607

Abstract: A method and system are presented for use in controlling a process of material removal from the surface of a patterned structure, by measuring at least one of residue, erosion, dishing and corrosion effects in the structure induced by this process. The structure is imaged utilizing phase modulation of light reflected from the structure, and a phase map of the structure is thereby obtained. This phase map is analyzed and data indicative of light reflective properties of layer stacks of the structure is utilized to determine a phase difference between light reflected from a selected measured site and at least one reference site spaced-apart from the selected site. The phase difference is thus indicative of the measured effect.

Abstract translation: 提供了一种方法和系统，用于通过测量由该方法诱导的结构中的残留物，侵蚀，凹陷和腐蚀效应中的至少一种来控制从图案化结构的表面去除材料的过程。 利用从结构反射的光的相位调制对该结构进行成像，从而获得该结构的相位图。 分析该相位图，并且利用表示该结构的层叠层的光反射特性的数据来​​确定从所选择的测量部位反射的光与至少一个与选定部位间隔开的参考部位的相位差。 因此，相位差表示测量的效果。

公开(公告)号：US06801326B2

公开(公告)日：2004-10-05

申请号：US09942849

申请日：2001-08-31

Applicant: Moshe Finarov ,  David Scheiner ,  Avi Ravid

Inventor： Moshe Finarov ,  David Scheiner ,  Avi Ravid

IPC: G01B1106

CPC classification number: H01L22/34 ,  B24B37/013 ,  B24B49/02 ,  B24B49/12 ,  H01L21/67253 ,  H01L22/12 ,  H01L22/26

Abstract: A method is presented for optical control of the quality of a process of chemical mechanical planarization (CMP) performed by a polishing tool applied to an article having a patterned area. The article contains a plurality of stacks each formed by a plurality of different layers, thereby defining a pattern in the form of spaced-apart metal regions. The method is capable of locating at least one of residues, erosion and dishing conditions on the article. At least one predetermined site on the article is selected for control. This at least one predetermined site is illuminated, and spectral characteristics of light components reflected from this location are detected. Data representative of the detected light components is analyzed for determining at least one parameter of the article within the at least one illuminated site.

Abstract translation: 提出了一种用于光学控制由应用于具有图案化区域的制品的抛光工具执行的化学机械平面化（CMP）工艺的质量的方法。 该物品包含多个由多个不同层形成的堆叠，从而限定了间隔金属区域形式的图案。 该方法能够定位物品上的残留物，侵蚀和凹陷条件中的至少一种。 选择物品上至少一个预定的位置进行控制。 该至少一个预定位置被照亮，并且检测从该位置反射的光分量的光谱特性。 分析表示检测到的光成分的数据，以确定至少一个照明部位内的物品的至少一个参数。

公开(公告)号：US06556947B1

公开(公告)日：2003-04-29

申请号：US09695838

申请日：2000-10-26

Applicant: David Scheiner ,  Avi Ravid

Inventor： David Scheiner ,  Avi Ravid

IPC: G01B1102

CPC classification number: G01B11/30 ,  G01B11/0616 ,  H01L22/12

Abstract: A method for measuring at least one desired characteristic of a patterned article is presented. The article is of a kind containing a plurality of different pattern elements located at different sites, each including a stack of layers. An optical model is provided, which is based on a set of parameters corresponding to predetermined characteristics of the article, and is capable of generating theoretical data indicative of spectral response of the article. The set of parameters includes parameters corresponding to geometrical characteristics of the pattern elements. Reference data is prepared containing a plurality of sets of parameters for at least some of the different pattern elements. A spectral measurement of light response is carried out at a selected site of the patterned article and measured data is generated. By varying said parameters' sets, the optical model is optimized, and then the theoretical spectral responses obtained through the optimized optical model and from the measured data is analyzed to determine therefrom the at least one desired characteristic.

Abstract translation: 提出了一种用于测量图案制品的至少一个期望特性的方法。 该物品是一种包含位于不同位置的多个不同图案元件的物品，每个都包括一叠层。 提供了一种光学模型，其基于对应于物品的预定特征的一组参数，并且能够产生指示物品的光谱响应的理论数据。 该组参数包括对应于图案元素的几何特征的参数。 准备包含用于至少一些不同图案元素的多组参数的参考数据。 在图案化物品的选定位置进行光响应的光谱测量，并产生测量数据。 通过改变所述参数集合，优化光学模型，然后分析通过优化的光学模型和测量数据获得的理论光谱响应，从而确定至少一个期望的特性。

公开(公告)号：US4500552A

公开(公告)日：1985-02-19

申请号：US503816

申请日：1983-06-13

Applicant: Sylvan Kadison ,  David Scheiner

Inventor： Sylvan Kadison ,  David Scheiner

IPC: A23L9/10 ,  A23L29/281 ,  A23L1/04

CPC classification number: A23L9/10 ,  A23L29/284

Abstract: A gelatin dessert product capable of providing a clearly demarcated two-layered, two-colored dessert in a single step.

Abstract translation: 一种明胶甜点产品，能够在一个步骤中提供清晰划分的两层双色甜点。

公开(公告)号：US08531679B2

公开(公告)日：2013-09-10

申请号：US12746528

申请日：2008-12-10

Applicant: David Scheiner

Inventor： David Scheiner

IPC: G01B11/00

CPC classification number: G01B11/00 ,  G01B11/02 ,  G01B11/08 ,  G01B11/12 ,  G01B11/22 ,  G01B11/24 ,  G01B2210/56 ,  G01R31/2853 ,  G01R31/311 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The present invention provides a novel system and method for obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by non-destructive technique. The optical system comprises an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole; a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole; and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.

Abstract translation: 本发明提供了一种用于通过非破坏性技术获得通孔的横截面轮廓，深度，宽度，斜率，底切和其它参数中的至少一个的新颖系统和方法。 光学系统包括用于产生至少一个光束并将其引导到包含至少一个通孔的结构的区域中的样品的照明系统; 检测系统，被配置和可操作以收集从所述被照射区域反射的光的图案，所述光图案指示所述通孔的一个或多个参数; 以及连接到所述检测系统的控制系统，所述控制系统包括用于存储预定理论模型的存储器实用程序，所述预定理论模型包括表示描述通孔反射模式的一组参数的数据，以及配置和可操作的数据处理和分析实用程序 接收和分析指示检测到的光图案的图像数据，并确定所述通孔的一个或多个参数。

公开(公告)号：US07123366B2

公开(公告)日：2006-10-17

申请号：US10919823

申请日：2004-08-17

Applicant: David Scheiner ,  Vladimir Machavariani

Inventor： David Scheiner ,  Vladimir Machavariani

IPC: G01B11/14

CPC classification number: G01J3/42 ,  G01B11/02 ,  G01B11/0625 ,  H01L22/12

Abstract: An apparatus and a method are disclosed for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing, wherein the structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. The method utilizes an optical model based on at least some of the features of the structure defined by a certain process of its manufacturing, and is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure.

Abstract translation: 公开了一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的装置和方法，其中该结构表示具有由至少两个金属 - 相对于限定波导的入射光，基本上透明的区域间隔开。 该方法基于由其制造的某个过程定义的结构的至少一些特征而使用光学模型，并且能够确定表示从结构和镜像反射的不同波长的光分量的光度强度的理论数据， 计算所述结构的所述至少一个期望参数。

公开(公告)号：US20060102830A1

公开(公告)日：2006-05-18

申请号：US11271773

申请日：2005-11-14

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: H01J40/14 ,  G02F1/01 ,  G01N21/86

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements comprise at least two measurements with different polarization states of incident light, each measurement including illuminating eh measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between eth diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

公开(公告)号：US20050280906A1

公开(公告)日：2005-12-22

申请号：US11003012

申请日：2004-12-03

Applicant: David Scheiner ,  Michael Winik ,  Yakov Lyubchik

Inventor： David Scheiner ,  Michael Winik ,  Yakov Lyubchik

IPC: G01N21/21 ,  G01N21/47 ,  G01N21/956 ,  G02B20060101 ,  G02B17/00 ,  G02B17/06 ,  G02B21/04 ,  G02B21/16

CPC classification number: G02B21/16 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/0243 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G02B17/06 ,  G02B17/0605 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B21/04 ,  G02B27/10 ,  G02B27/283

Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.

Abstract translation: 呈现镜头布置。 透镜装置包括具有凹面反射表面并限定透镜装置的光轴的第一元件以及沿着光轴与第一元件间隔开的第二基本平坦且至少部分反射的元件。 第二元件被配置为允许光通过其并且相对于光轴和第一元件定向，使得在输入光束到第二元件的预定入射角度处，输入光束被反射到反射 第一元件的表面并从其反射以穿过第二元件。