METHOD AND SYSTEM FOR IMPLEMENTING CONTROLLED BREAKS BETWEEN FEATURES USING SUB-RESOLUTION ASSIST FEATURES
    11.
    发明申请
    METHOD AND SYSTEM FOR IMPLEMENTING CONTROLLED BREAKS BETWEEN FEATURES USING SUB-RESOLUTION ASSIST FEATURES 有权
    使用分解辅助功能实现特征之间的控制断裂的方法和系统

    公开(公告)号:US20120096414A1

    公开(公告)日:2012-04-19

    申请号:US13335785

    申请日:2011-12-22

    Applicant: Jason Sweis

    Inventor: Jason Sweis

    CPC classification number: G03F1/36 G03F1/70

    Abstract: Disclosed is a method, system, and computer program product for implementing controlled breaks using sub-resolution assist features. Sub-resolution bridging features are added to implement controlled breaks between features on the layout. The bridging features may also be used to facilitate or optimize multiple mask/exposure techniques that split a layout or features on a layout to address pitch problems.

    Abstract translation: 公开了一种使用子分辨率辅助特征来实现受控断点的方法,系统和计算机程序产品。 添加子分辨率桥接功能以实现布局上的功能之间的受控中断。 桥接特征还可以用于促进或优化在布局上分割布局或特征以解决间距问题的多个掩模/曝光技术。

    Method and system for implementing controlled breaks between features using sub-resolution assist features
    13.
    发明授权
    Method and system for implementing controlled breaks between features using sub-resolution assist features 有权
    使用子分辨率辅助功能实现特征间的可控断点的方法和系统

    公开(公告)号:US08438506B2

    公开(公告)日:2013-05-07

    申请号:US13335785

    申请日:2011-12-22

    Applicant: Jason Sweis

    Inventor: Jason Sweis

    CPC classification number: G03F1/36 G03F1/70

    Abstract: Disclosed is a method, system, and computer program product for implementing controlled breaks using sub-resolution assist features. Sub-resolution bridging features are added to implement controlled breaks between features on the layout. The bridging features may also be used to facilitate or optimize multiple mask/exposure techniques that split a layout or features on a layout to address pitch problems.

    Abstract translation: 公开了一种使用子分辨率辅助特征来实现受控断点的方法,系统和计算机程序产品。 添加子分辨率桥接功能以实现布局上的功能之间的受控中断。 桥接特征还可以用于促进或优化在布局上分割布局或特征以解决间距问题的多个掩模/曝光技术。

    Method and system for implementing controlled breaks between features using sub-resolution assist features
    14.
    发明授权
    Method and system for implementing controlled breaks between features using sub-resolution assist features 有权
    使用子分辨率辅助功能实现特征间的可控断点的方法和系统

    公开(公告)号:US08103985B2

    公开(公告)日:2012-01-24

    申请号:US11934662

    申请日:2007-11-02

    Applicant: Jason Sweis

    Inventor: Jason Sweis

    CPC classification number: G03F1/36 G03F1/70

    Abstract: Disclosed is a method, system, and computer program product for implementing controlled breaks using sub-resolution assist features. Sub-resolution bridging features are added to implement controlled breaks between features on the layout. The bridging features may also be used to facilitate or optimize multiple mask/exposure techniques that split a layout or features on a layout to address pitch problems.

    Abstract translation: 公开了一种使用子分辨率辅助特征来实现受控断点的方法,系统和计算机程序产品。 添加子分辨率桥接功能以实现布局上的功能之间的受控中断。 桥接特征还可以用于促进或优化在布局上分割布局或特征以解决间距问题的多个掩模/曝光技术。

    Method of making connections to a semiconductor chip assembly
    16.
    发明授权
    Method of making connections to a semiconductor chip assembly 失效
    连接到半导体芯片组件的方法

    公开(公告)号:US5915752A

    公开(公告)日:1999-06-29

    申请号:US374559

    申请日:1995-05-08

    Abstract: A connection component for electrically connecting a semiconductor chip to support substrate incorporates a preferably dielectric supporting structure (70) defining gaps (40). Leads extend across these gaps so that the leads are supported both sides of the gap (66, 70). The leads therefore can be positioned approximately in registration to contacts on the chip by aligning the connection component with the chip. Each lead is arranged so that one end can be displaced relative to the supporting structure when a downward force is applied to the lead. This allows the leads to be connected to the contacts on the chip by engaging each lead with a tool and forcing the lead downwardly against the contact. Preferably, each lead incorporates a frangible section (72) adjacent one side of the gap and the frangible section is broken when the lead is engaged with the contact. Final alignment of the leads with the contacts on the chip is provided by the bonding tool which has features adapted to control the position of the lead.

    Abstract translation: PCT No.PCT / US93 / 06930 Sec。 371日期1995年5月8日 102(e)日期1995年5月8日PCT提交1993年7月23日PCT公布。 出版物WO94 / 03036 日期1994年2月3日用于将半导体芯片电连接到支撑衬底的连接部件包含限定间隙(40)的优选电介质支撑结构(70)。 引线延伸穿过这些间隙,使得引线被支撑在间隙(66,70)的两侧。 因此,引线可以通过将连接部件与芯片对准而大致对准芯片上的触点。 每个引线被布置成使得当向引线施加向下的力时,一端可相对于支撑结构移位。 这允许引线通过使每个引线与工具接合并将引线向下抵靠接触件而连接到芯片上的触点。 优选地,每个引线包括与间隙的一侧相邻的易碎部分(72),并且当引线与触点接合时,易碎部分断裂。 引线与芯片上的触点的最终对准由具有适于控制引线位置的特征的焊接工具提供。

    System and method for self alignment of pad mask
    17.
    发明授权
    System and method for self alignment of pad mask 有权
    垫面罩自身对准的系统和方法

    公开(公告)号:US08997026B1

    公开(公告)日:2015-03-31

    申请号:US13470080

    申请日:2012-05-11

    Applicant: Jason Sweis

    Inventor: Jason Sweis

    CPC classification number: G06F17/5068 G03F1/70

    Abstract: A system and method provide semiconductor fabrication mask creation techniques that align the device features patterned with a first core mask with one or more pad features patterned with a subsequent pad mask. Shapes representing the pad features may be included in the core mask by reducing on all sides, the shape of the pad feature in the core mask by the width of the spacer material. A pad mask then may be created to include a shape of the pad feature that may overlap a portion of the spacer material pattern created by the shape of the pad feature in the core mask. Data sets may be generated from a circuit design to create the masks that may be fabricated with the described techniques.

    Abstract translation: 系统和方法提供半导体制造掩模创建技术,其将图案化的设备特征与第一核心掩模对准,其中一个或多个衬垫特征与随后的衬垫掩模图案化。 代表焊盘特征的形状可以通过减少所有侧面,将芯掩模中的焊盘特征的形状减小到间隔物材料的宽度来包括在芯掩模中。 然后可以创建焊盘掩模以包括可以与由芯掩模中的焊盘特征的形状产生的间隔材料图案的一部分重叠的焊盘特征的形状。 可以从电路设计产生数据集以创建可以用所述技术制造的掩模。

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