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    METHOD AND SYSTEM FOR IMPLEMENTING CONTROLLED BREAKS BETWEEN FEATURES USING SUB-RESOLUTION ASSIST FEATURES
    2.
    发明申请
    METHOD AND SYSTEM FOR IMPLEMENTING CONTROLLED BREAKS BETWEEN FEATURES USING SUB-RESOLUTION ASSIST FEATURES 有权
    使用分解辅助功能实现特征之间的控制断裂的方法和系统

    公开(公告)号：US20120096414A1

    公开(公告)日：2012-04-19

    申请号：US13335785

    申请日：2011-12-22

    Applicant: Jason Sweis

    Inventor： Jason Sweis

    IPC: G06F17/50

    CPC classification number: G03F1/36 ,  G03F1/70

    Abstract: Disclosed is a method, system, and computer program product for implementing controlled breaks using sub-resolution assist features. Sub-resolution bridging features are added to implement controlled breaks between features on the layout. The bridging features may also be used to facilitate or optimize multiple mask/exposure techniques that split a layout or features on a layout to address pitch problems.

    Abstract translation: 公开了一种使用子分辨率辅助特征来实现受控断点的方法，系统和计算机程序产品。 添加子分辨率桥接功能以实现布局上的功能之间的受控中断。 桥接特征还可以用于促进或优化在布局上分割布局或特征以解决间距问题的多个掩模/曝光技术。

    System and method for self alignment of pad mask
    3.
    发明授权
    System and method for self alignment of pad mask 有权
    垫面罩自身对准的系统和方法

    公开(公告)号：US08997026B1

    公开(公告)日：2015-03-31

    申请号：US13470080

    申请日：2012-05-11

    Applicant: Jason Sweis

    Inventor： Jason Sweis

    IPC: G06F17/50

    CPC classification number: G06F17/5068 ,  G03F1/70

    Abstract: A system and method provide semiconductor fabrication mask creation techniques that align the device features patterned with a first core mask with one or more pad features patterned with a subsequent pad mask. Shapes representing the pad features may be included in the core mask by reducing on all sides, the shape of the pad feature in the core mask by the width of the spacer material. A pad mask then may be created to include a shape of the pad feature that may overlap a portion of the spacer material pattern created by the shape of the pad feature in the core mask. Data sets may be generated from a circuit design to create the masks that may be fabricated with the described techniques.

    Abstract translation: 系统和方法提供半导体制造掩模创建技术，其将图案化的设备特征与第一核心掩模对准，其中一个或多个衬垫特征与随后的衬垫掩模图案化。 代表焊盘特征的形状可以通过减少所有侧面，将芯掩模中的焊盘特征的形状减小到间隔物材料的宽度来包括在芯掩模中。 然后可以创建焊盘掩模以包括可以与由芯掩模中的焊盘特征的形状产生的间隔材料图案的一部分重叠的焊盘特征的形状。 可以从电路设计产生数据集以创建可以用所述技术制造的掩模。

    SHUTTER EYEWEAR
    6.
    发明申请
    SHUTTER EYEWEAR 有权
    快门眼镜

    公开(公告)号：US20140132913A1

    公开(公告)日：2014-05-15

    申请号：US14072784

    申请日：2013-11-05

    Applicant: Jason Sweis ,  Vivian Liane Rice ,  David Chao ,  Zhiyang Guo

    Inventor： Jason Sweis ,  Vivian Liane Rice ,  David Chao ,  Zhiyang Guo

    IPC: G02C7/16 ,  G02C11/00

    CPC classification number: A61H5/00 ,  A61H2205/024 ,  G02C7/08 ,  G02C7/101 ,  G02C11/10

    Abstract: Apparatuses and methods of shuttering glasses are disclosed. One apparatus includes a first lens operable to blank for a first blocking time, a second lens operable to blank for a second blocking time, and a controller for controllably setting at least one of the first blocking time and the second blocking time.

    Abstract translation: 公开了一种用于制作眼镜的装置和方法。 一种装置包括可操作以消除第一阻塞时间的第一透镜，可操作以空白第二阻断时间的第二透镜，以及用于可控地设置第一阻塞时间和第二阻塞时间中的至少一个的控制器。

    Method of forming interface between die and chip carrier
    8.
    发明授权
    Method of forming interface between die and chip carrier 失效
    在芯片和芯片载体之间形成界面的方法

    公开(公告)号：US5477611A

    公开(公告)日：1995-12-26

    申请号：US123882

    申请日：1993-09-20

    Applicant: Jason Sweis ,  Kenneth B. Gilleo

    Inventor： Jason Sweis ,  Kenneth B. Gilleo

    IPC: H01L23/12 ,  G06K19/077 ,  H01L21/54 ,  H01L23/24 ,  H05K3/34

    CPC classification number: G06K19/07745 ,  H01L21/54 ,  H01L23/24 ,  H01L2924/0002 ,  Y10T29/49144

    Abstract: A method for creating an interface between a chip and chip carrier includes spacing the chip a given distance above the chip carrier, and then introducing a liquid in the gap between the chip and carrier. Preferably, the liquid is an elastomer which is hardened into a resilient layer after its introduction into the gap. In another preferred embodiment, the terminals on a chip carrier are planarized or otherwise vertically positioned by deforming the terminals into set vertical locations with a plate, and then hardening a liquid between the chip carrier and chip.

    Abstract translation: 用于在芯片和芯片载体之间创建接口的方法包括将芯片与芯片载体之上的给定距离间隔开，然后在芯片和载体之间的间隙中引入液体。 优选地，液体是在其引入间隙之后被硬化成弹性层的弹性体。 在另一个优选实施例中，芯片载体上的端子被平坦化或以其它方式垂直定位，通过使端子变形成具有板的设定的垂直位置，然后在芯片载体和芯片之间固化液体。

    Method and system for implementing controlled breaks between features using sub-resolution assist features
    10.
    发明授权
    Method and system for implementing controlled breaks between features using sub-resolution assist features 有权
    使用子分辨率辅助功能实现特征间的可控断点的方法和系统

    公开(公告)号：US08438506B2

    公开(公告)日：2013-05-07

    申请号：US13335785

    申请日：2011-12-22

    Applicant: Jason Sweis

    Inventor： Jason Sweis

    IPC: G06F17/50

    CPC classification number: G03F1/36 ,  G03F1/70

    Abstract: Disclosed is a method, system, and computer program product for implementing controlled breaks using sub-resolution assist features. Sub-resolution bridging features are added to implement controlled breaks between features on the layout. The bridging features may also be used to facilitate or optimize multiple mask/exposure techniques that split a layout or features on a layout to address pitch problems.

    Abstract translation: 公开了一种使用子分辨率辅助特征来实现受控断点的方法，系统和计算机程序产品。 添加子分辨率桥接功能以实现布局上的功能之间的受控中断。 桥接特征还可以用于促进或优化在布局上分割布局或特征以解决间距问题的多个掩模/曝光技术。

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