公开(公告)号：US20180328837A1

公开(公告)日：2018-11-15

申请号：US16042448

申请日：2018-07-23

Applicant: Nova Measuring Instruments Ltd.

Inventor： Dror SHAFIR ,  Gilad BARAK ,  Shay WOLFLING ,  Michal Haim YACHINI ,  Matthew SENDELBACH ,  Cornel BOZDOG

IPC: G01N21/21 ,  G01N21/47

CPC classification number: G01N21/21 ,  G01N2021/4792 ,  G01N2201/061 ,  G01N2201/0683

Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

公开(公告)号：US20180172609A1

公开(公告)日：2018-06-21

申请号：US15845313

申请日：2017-12-18

Applicant: Nova Measuring Instruments Ltd. ,  GLOBALFOUNDRIES Inc.

Inventor： Wei Ti LEE ,  Heath A. POIS ,  Mark KLARE ,  Cornel BOZDOG ,  Alok VAID

IPC: G01N23/2208 ,  G01B15/02 ,  G01B11/06 ,  G01N23/2273 ,  G01N23/223

CPC classification number: G01N23/2273 ,  G01B11/06 ,  G01B15/02 ,  G01N23/2208 ,  G01N23/223 ,  G01N2223/305 ,  G01N2223/61 ,  G01N2223/633 ,  H01L22/12

Abstract: A monitoring system and method are provided for determining at least one property of an integrated circuit (IC) comprising a multi-layer structure formed by at least a layer on top of an underlayer. The monitoring system receives measured data comprising data indicative of optical measurements performed on the IC, data indicative of x-ray photoelectron spectroscopy (XPS) measurements performed on the IC and data indicative of x-ray fluorescence spectroscopy (XRF) measurements performed on the IC. An optical data analyzer module analyzes the data indicative of the optical measurements and generates geometrical data indicative of one or more geometrical parameters of the multi-layer structure formed by at least the layer on top of the underlayer. An XPS data analyzer module analyzes the data indicative of the XPS measurements and generates geometrical and material related data indicative of geometrical and material composition parameters for said layer and data indicative of material composition of the underlayer. An XRF data analyzer module analyzes the data indicative of the XRF measurements and generates data indicative of amount of a predetermined material composition in the multi-layer structure. A data interpretation module generates combined data received from analyzer modules and processes the combined data and determines the at least one property of at least one layer of the multi-layer structure.

公开(公告)号：US09915624B2

公开(公告)日：2018-03-13

申请号：US15385495

申请日：2016-12-20

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor Turovets ,  Cornel Bozdog ,  Dario Elyasi

IPC: G01N21/00 ,  G01N21/95 ,  G01N21/47 ,  G01B11/24 ,  G01B11/06

CPC classification number: G01N21/9501 ,  G01B11/06 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/47 ,  G01N21/8903 ,  G01N2201/12

Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

公开(公告)号：US20180029189A9

公开(公告)日：2018-02-01

申请号：US15108855

申请日：2014-12-31

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor TUROVETS

IPC: B24B37/20 ,  H01L21/321

CPC classification number: B24B37/20 ,  B24B37/015 ,  B24B37/04 ,  H01L21/268 ,  H01L21/31055 ,  H01L21/31111 ,  H01L21/32125 ,  H01L21/67219 ,  H01L22/12 ,  H01L22/26

Abstract: A surface planarization system is presented. The system comprises an external energy source for generating a localized energy distribution within a processing region, and a control unit for operating the external energy source to create, by the localized energy distribution, a predetermined temperature pattern within the processing region such that different locations of the processing region are subjected to different temperatures. This provides that when a sample (e.g. semiconductor wafer) during its interaction with an etching material composition is located in the processing region, the temperature pattern at different locations of the sample's surface creates different material removal rates by the etching material composition (different etch rates).

公开(公告)号：US20170363970A1

公开(公告)日：2017-12-21

申请号：US15534187

申请日：2015-12-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Oded COHEN ,  Gilad BARAK ,  Igor TUROVETS

IPC: G03F7/20 ,  H01L21/66

CPC classification number: G03F7/70625 ,  G03F7/70466 ,  G03F7/70683 ,  H01L22/30 ,  H01L22/34

Abstract: A test structure and method of its manufacture are presented for use in metrology measurements of a sample pattern. The test structure comprises a test pattern comprising a portion of the sample pattern including at least one selected feature and a blocking layer at least partially covering regions of the test structure adjacent to the at least one selected region

公开(公告)号：US09651498B2

公开(公告)日：2017-05-16

申请号：US14412479

申请日：2013-07-02

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Elad Dotan ,  Alon Belleli

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/95 ,  H01L21/66 ,  G01N21/55

CPC classification number: G01N21/8806 ,  G01N21/55 ,  G01N21/9501 ,  G01N2021/8825 ,  G01N2201/12 ,  H01L22/12

Abstract: A method and system are presented for use in inspection of via containing structures. According to this technique, measured data indicative of a spectral response of a via-containing region of a structure under measurements is processed, and, upon identifying a change in at least one parameter of the spectral response with respect to a spectral signature of the via-containing region, output data is generated indicative of a possible defect at an inner surface of the via.

公开(公告)号：US20170089842A1

公开(公告)日：2017-03-30

申请号：US15285892

申请日：2016-10-05

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Danny GROSSMAN ,  Guy SELICKTER

IPC: G01N21/88 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/956 ,  G01N2021/8848

Abstract: A control system and method are provided for use in managing optical measurements on target structures. The control system comprises: data input utility for receiving input data indicative of a size of a target structure to be measured and input data indicative of illumination and collection channels of an optical measurement system; data processing utility for analyzing the input data, and an interplay of Point Spread Functions (PSFs) of the illumination and collection channels, and determining data indicative of optional tailoring of apertures to be used in the optical measurement system for optimizing ensquared energy for measurements on the given target structure, the optimal tailoring composing at least one of the following: an optimal ratio between numerical apertures of the illumination and collection channels; and an optimal orientation offset of physical apertures in the illumination and collection channels.

公开(公告)号：US09528946B2

公开(公告)日：2016-12-27

申请号：US14422190

申请日：2013-08-15

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor Turovets ,  Cornel Bozdog ,  Dario Elyasi

IPC: G01N21/00 ,  G01N21/95 ,  G01B11/24 ,  G01N21/47 ,  G01N21/89

CPC classification number: G01N21/9501 ,  G01B11/06 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/47 ,  G01N21/8903 ,  G01N2201/12

Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

Abstract translation: 提出了一种方法和系统，用于控制应用于具有不同层叠叠层区域的图案化结构的工艺。 该方法包括：在预定处理时间内顺序地接收指示正在处理的结构的光学响应的​​测量数据，并产生随时间测量的相应的数据片段序列; 以及分析和处理所述数据段的序列并确定所述结构的至少一个主要参数。 分析和处理包括：处理所述数据片段的一部分并获得指示所述结构的一个或多个参数的数据; 利用表示所述结构的所述一个或多个参数的所述数据，以及描述所述结构的光学响应与所述结构的一个或多个参数之间的关系的最优化模型数据; 利用优化的模型数据来处理测量数据段的序列的至少一部分，以及确定表征应用于结构的所述过程的结构的至少一个参数，以及生成指示其的数据。

公开(公告)号：US20160139065A1

公开(公告)日：2016-05-19

申请号：US14903629

申请日：2014-07-08

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Shay WOLFLING ,  Cornel BOZDOG ,  Matthew SENDELBACH

IPC: G01N23/20

CPC classification number: G01N23/20 ,  G01N2223/607 ,  G01N2223/611

Abstract: A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.

Abstract translation: 呈现用于测量样品的一个或多个参数的控制系统。 控制系统包括输入实用程序和处理器实用程序。 输入实用程序被配置用于接收包括第一数据的输入数据，所述第一数据包括指示样本中的材料分布的样本的X射线衍射或高分辨率X射线衍射（XRD）响应数据，第二数据包括光学响应数据 样品至入射光，指示样品的至少几何形状。 处理器实用程序被配置和操作用于处理和分析第一和第二数据之一以优化第一和第二数据中的另一个数据，并且利用优化数据来确定样本的所述一个或多个参数，包括应变分布 例子。

公开(公告)号：US09310192B2

公开(公告)日：2016-04-12

申请号：US14594627

申请日：2015-01-12

Applicant: Nova Measuring Instruments Ltd.

Inventor： Boaz Brill ,  Moshe Finarov ,  David Schiener

IPC: G01B11/27 ,  G01B11/14 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20 ,  H01L21/66

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.