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公开(公告)号:US20240116849A1
公开(公告)日:2024-04-11
申请号:US17920921
申请日:2022-06-07
Applicant: TOKUYAMA CORPORATION
Inventor: Akihiro SAITO , Naoto MOCHIZUKI
IPC: C07C209/68 , B01J19/02 , B01J19/24
CPC classification number: C07C209/68 , B01J19/02 , B01J19/243 , B01J2219/00033 , B01J2219/00166 , B01J2219/0295 , B01J2219/182
Abstract: Provided are a manufacturing method and a manufacturing apparatus for efficiently manufacturing a halogen oxoacid solution with a high quality and excellent industrial properties. Specifically, a manufacturing method and a manufacturing apparatus of a halogen oxoacid are provided. The manufacturing method and the manufacturing apparatus include continuously supplying an organic alkaline solution and a halogen from a first end to a second end of a reaction tube so that liquid phase parts and/or gas phase parts are alternately and repeatedly provided in a transfer passage of the reaction tube, to perform gas-liquid mixing of the organic alkaline solution and the halogen at the liquid phase parts and/or gas phase parts.
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公开(公告)号:US20240101751A1
公开(公告)日:2024-03-28
申请号:US18274188
申请日:2022-01-27
Applicant: TOKUYAMA CORPORATION
Inventor: Yasutomo SHIMIZU , Kazuishi FUKUDA , Takayoshi KAWASAKI
CPC classification number: C08G18/4883 , B24B37/24 , C08G18/7621 , C08L29/04
Abstract: The hollow microballoon of the invention includes a resin produced by polymerizing a polymerizing composition that contains a cyclic molecule having at least three side chains with a polymerizable functional group introduced into the terminal thereof and a polymerizable monomer other than the cyclic molecule having at least three side chains with a polymerizable functional group introduced into the terminal thereof. According to the invention, there are provided hollow microballoon capable of imparting not only polishing characteristics but also excellent durability to a CMP polishing pad using the hollow microballoon.
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公开(公告)号:US11932964B2
公开(公告)日:2024-03-19
申请号:US17601452
申请日:2020-04-02
Applicant: Tokuyama Corporation
Inventor: Takuya Asano , Kouichi Saiki , Miki Emoto , Tooru Onoda
Abstract: A polycrystalline silicon material for producing silicon single crystal, containing a plurality of polycrystalline silicon chunks, in which assuming that a total concentration of donor elements present inside a bulk body of the polycrystalline silicon material is Cd1 [ppta], a total concentration of acceptor elements present inside the bulk body of the polycrystalline silicon material is Ca1 [ppta], a total concentration of the donor elements present on a surface of the polycrystalline silicon material is Cd2 [ppta], and a total concentration of the acceptor elements present on the surface of the polycrystalline silicon material is Ca2 [ppta], Cd1, Ca1, Cd2, and Ca2 satisfy a relation of 5 [ppta]≤(Ca1+Ca2)−(Cd1+Cd2)≤26 [ppta].
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公开(公告)号:US11905499B2
公开(公告)日:2024-02-20
申请号:US17281712
申请日:2019-09-30
Applicant: TOKUYAMA CORPORATION
Inventor: Shunsuke Hosaka , Masanari Ishizuki
CPC classification number: C11D7/261 , C07C29/80 , C11D7/5022 , C11D11/0047
Abstract: Provided is a high-purity isopropyl alcohol in which the concentration of a C7-12 acetal compound is 100 ppb or less on a mass basis, the concentration of the acetal compound in an accelerated test involving heating for 4 hours at 80° C. in a nitrogen atmosphere is increased by a factor of 30 or less with respect to the value thereof prior to heating, and the concentration of the acetal compound is maintained at a value of 100 ppb or less on a mass basis. Also provided is a method for manufacturing said high-purity isopropyl alcohol.
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公开(公告)号:US11884596B2
公开(公告)日:2024-01-30
申请号:US17256114
申请日:2019-06-24
Applicant: TOKUYAMA CORPORATION
Inventor: Hironobu Fujimoto , Tsuyoshi Ikeda
IPC: C04B35/626 , C04B35/581 , B01D1/18 , B01J2/04
CPC classification number: C04B35/62695 , C04B35/581 , C04B35/62625 , B01D1/18 , B01J2/04 , C04B2235/5436
Abstract: The present invention aims to provide a method for producing granules for ceramic production, the method having high productivity and making it possible to obtain a ceramic which, when produced by press molding the granules and firing the resulting press molded product, has physical properties kept from lowering. The present invention is characterized by including: a slurry preparation step of preparing a slurry including a mixture containing a powder of an inorganic compound, a binder, and a solvent; a granulation step of introducing the slurry into a spray drying device to form a granulated substance containing the inorganic compound; an exhaust step of exhausting an atmospheric gas within the spray drying device via a cyclone having a surface made of ceramic; and a step of mixing a fine powder, which has been recovered by the cyclone during the exhaust step, with the granulated substance obtained in the granulation step.
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公开(公告)号:US20230365739A1
公开(公告)日:2023-11-16
申请号:US18019153
申请日:2021-08-04
Applicant: TOKUYAMA CORPORATION
Inventor: Yasutomo SHIMIZU , Kazuishi FUKUDA , Takayoshi KAWASAKI
IPC: C08G18/42 , C08G18/12 , B24B37/22 , B24B37/24 , C09K9/02 , C08G18/64 , C08K7/22 , C08G18/08 , C08G18/32
CPC classification number: C08G18/42 , C08G18/12 , B24B37/22 , B24B37/24 , C09K9/02 , C08G18/64 , C08K7/22 , C08G18/14 , C08G18/3243 , C08K2201/003 , C08G2101/00
Abstract: The present invention relates to a curable composition containing (A) a side chain-containing cyclic molecule in which three or more side chains each having a polymerizable functional group introduced at a terminal are introduced ((A) cyclic polyfunctional monomer), and (B) a polymerizable monomer having a polymerizable functional group polymerizable with the side chain-containing cyclic molecule ((B) another polymerizable monomer). The present invention provides a curable composition from which a cured article having high abrasion resistance and enabling exhibition of excellent mechanical properties and photochromic properties is obtained. In particular, the present invention can provide a curable composition from which a cured article suitable for use as a polishing pad or a photochromic spectacle lens can be obtained.
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17.
公开(公告)号:US20230313413A1
公开(公告)日:2023-10-05
申请号:US18022417
申请日:2022-08-17
Applicant: TOKUYAMA CORPORATION
Inventor: Masayuki FUKUDA , Reo YAMAMOTO
CPC classification number: C30B33/00 , B08B3/08 , B08B3/12 , C11D7/24 , C11D7/30 , C30B23/02 , C30B29/403
Abstract: Provided are a method of cleaning a group III nitride single crystal substrate which enables the roughness of a nitrogen-polar face of the group III nitride single crystal substrate to be suppressed to remove foreign substances, and a method of producing a group III nitride single crystal substrate. The method of cleaning a group III nitride single crystal substrate having a group III element-polar face, and the nitrogen-polar face opposite the group III element-polar face includes: cleaning the nitrogen-polar face with a detergent including a fluoroorganic compound.
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公开(公告)号:US11767467B2
公开(公告)日:2023-09-26
申请号:US17258375
申请日:2019-07-18
Applicant: TOKUYAMA CORPORATION
Inventor: Takao Noguchi , Junji Takenaka , Junji Momoda , Takayoshi Kawasaki , Yasutomo Shimizu , Masayuki Miyazaki
IPC: C09K9/02 , C08G65/333 , G02B1/04
CPC classification number: C09K9/02 , C08G65/33396 , C09K2211/1475 , G02B1/04
Abstract: The present invention relates to a photochromic compound including a polyvalent residue on which at least one group having a photochromic moiety is substituted, and at least one long-chain group not containing a photochromic moiety and having a molecular weight of 300 or more is further substituted; and a curable composition containing the same. In accordance with the present invention, it is possible to provide a photochromic compound which has high solubility in a polymerizable compound serving as a matrix while retaining high photochromic characteristics and is hardly affected by the matrix; and a curable composition containing the same.
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19.
公开(公告)号:US20230265053A1
公开(公告)日:2023-08-24
申请号:US17927182
申请日:2021-05-27
Applicant: TOKUYAMA CORPORATION
Inventor: Yasutomo SHIMIZU , Takayoshi KAWASAKI
IPC: C07C309/18 , C07D233/58 , C08G18/38 , C08G18/08 , C08G18/10 , B24B37/24
CPC classification number: C07C309/18 , B24B37/24 , C07D233/58 , C08G18/10 , C08G18/0828 , C08G18/3857
Abstract: The polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt of the present invention is a polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt having at least two active hydrogen groups in a molecule, and the polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt has a quaternary ammonium salt skeleton of the polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt that includes an imidazole skeleton. According to the present invention, a polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt that is excellent in solubility and dispersibility in a polyurethane (urea) resin raw material, and a high effect of the hydrophilization of a polyurethane (urea) resin can be provided.
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20.
公开(公告)号:US20230257277A1
公开(公告)日:2023-08-17
申请号:US18012100
申请日:2021-04-19
Applicant: Tokuyama Corporation
Inventor: Shingo HIRANAKA , Kentarou MATSUO
IPC: C01F11/46 , C02F11/125 , B09B3/32 , B03B5/48
CPC classification number: C01F11/468 , C02F11/125 , B09B3/32 , B03B5/48
Abstract: Aqueous slurry which includes solid foreign matter and paper dust is pressed by means of a screw press, provided with a mesh having openings not less than 1.5 mm and not greater than 3 mm, to separate the aqueous slurry into the solid foreign matter and the paper dust, and liquid component passing through the mesh. Then, the liquid component is sieved by means of a sieve having openings not greater than 1 mm to separate from the liquid component the solid foreign matter and the paper dust.
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