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公开(公告)号：US20160278196A1
公开(公告)日：2016-09-22
申请号：US15035983
申请日：2014-10-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Rolf Theodorus Nicolaas BEIJSENS , Kornelis Frits FEENSTRA , Arjen Teake DE JONG , Reinier Theodorus Martinus JILISEN , Niek Antonius Jacobus Maria KLEEMANS , Andrey NIKIPELOV , Pavel SEROGLAZOV , Nicolaas Antonius Allegondus Johannes VAN ASTEN , Harald Ernest VERBRAAK
IPC: H05G2/00
Abstract: A radiation system to generate a radiation emitting plasma, the radiation system include a fuel emitter to provide a fuel target at a plasma formation region, a first laser arranged to provide a first laser beam at the plasma formation region incident on the fuel target to generate a radiation emitting plasma, an imaging device arranged to obtain a first image of the radiation emitting plasma at the plasma formation region, the first image indicating at least one image property of the radiation emitting plasma, and a controller. The controller is arranged to receive the first image, and to generate at least one instruction based on the at least one image property of the radiation emitting plasma to modify operation of at least one component of the radiation system to reduce a detrimental effect of debris.
Abstract translation: 一种用于产生辐射发射等离子体的辐射系统，所述辐射系统包括燃料发射器，以在等离子体形成区域处提供燃料靶;布置成在入射到燃料靶上的等离子体形成区域处提供第一激光束的第一激光器，以产生 辐射发射等离子体，成像装置，被配置为获得等离子体形成区域处的发射等离子体的第一图像，第一图像表示发射等离子体的至少一个图像特性，以及控制器。 控制器布置成接收第一图像，并且基于辐射发射等离子体的至少一个图像特性生成至少一个指令，以修改辐射系统的至少一个分量的操作，以减少碎片的有害影响。
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公开(公告)号：US20240337956A1
公开(公告)日：2024-10-10
申请号：US18578780
申请日：2022-07-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Lucas Christiaan Johan HEIJMANS , Imre Rudolf Richard DEHNER , Raymond Wilhelmus Louis LAFARRE , Cornelis Christiaan OTTENS , Marcus Adrianus VAN DE KERKHOF , Andrey NIKIPELOV , Dennis VANOTTERDIJK , Edwin Johannes Theodorus SMULDERS , Andrei Mikhailovich YAKUNIN , Guido SALMASO , Luc VOORDECKERS , Chaitanya Krishna ANDE , Martinus Jacobus Johannes COENEN
CPC classification number: G03F7/70925 , G03F7/70708 , G03F7/7085 , G03F7/70875 , G03F1/62
Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus including at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules include a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms include: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.
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公开(公告)号：US20240142871A1
公开(公告)日：2024-05-02
申请号：US17768280
申请日：2020-08-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey NIKIPELOV , Dmitry KURILOVICH
Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including: a membrane support for supporting the membrane; and a pressure pulse generating mechanism including one or more laser energy sources configured to generate a pressure pulse in a gas. The one or more energy laser sources may be focused to generate a pressure pulse in a gaseous atmosphere. The pressure pulse serves to dislodge particles on the membrane.
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公开(公告)号：US20220206396A1
公开(公告)日：2022-06-30
申请号：US17606493
申请日：2020-04-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey NIKIPELOV , Antonius Franciscus Johnnes DE GROOT
IPC: G03F7/20 , H01L21/687
Abstract: A method for providing a wear-resistant material on a body. A composite body that may be obtained by the method. The composite body may be a substrate holder or a reticle clamp for use in a lithographic apparatus. The method includes providing a body made of glass, ceramic or glass-ceramic; providing a wear-resistant material having a hardness of more than 20 GPa; and brazing or laser welding the wear-resistant material to the body.
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公开(公告)号：US20210382209A1
公开(公告)日：2021-12-09
申请号：US17282559
申请日：2019-09-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey NIKIPELOV , Marcus Adrianus VAN DE KERKHOF , Pieter-Jan VAN ZWOL , Laurentius Cornelius DE WINTER , Wouter Joep ENGELEN , Alexey Olegovich POLYAKOV
Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.
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Patent Agency Ranking
16.发明申请公开(公告)号：US20210063893A1
公开(公告)日：2021-03-04
申请号：US16983264
申请日：2020-08-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey NIKIPELOV , Patrick Sebastian Uebel , Amir Abdolvand , Sebastian Thomas Bauerschmidt , Peter Maximilian Götz , Natallia Eduardauna Uzunbajakava
IPC: G03F7/20
Abstract: A system and method for providing a radiation source is disclosed. In one arrangement, the radiation source includes a gas cell having a window, an optical fiber that is hollow and has an axial direction, an end thereof being enclosed within the gas cell and optically coupled to the window via an optical path, and a surface, disposed around the end of the optical fiber, and extending past the end of the optical fiber in the axial direction towards the window so as to limit one or more selected from: the exchange of gas between the optical path and the remainder of the gas cell, ingress of plasma towards or into the optical fiber, and/or radical flux towards etch-susceptible surfaces.
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公开(公告)号：US20190129299A1
公开(公告)日：2019-05-02
申请号：US16093537
申请日：2017-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Maxim Aleksandrovich NASALEVICH , Erik Achilles ABEGG , Nirupam BANERJEE , Michiel Alexander BLAUW , Derk Servatius Gertruda BROUNS , Paul JANSSEN , Matthias KRUIZINGA , Egbert LENDERINK , Nicolae MAXIM , Andrey NIKIPELOV , Arnoud Willem NOTENBOOM , Claudia PILIEGO , Mária PÉTER , Gijsber RISPENS , Nadja SCHUH , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Antonius Willem VERBURG , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN , Aleksandar Nikolov ZDRAVICOV
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：US20240377765A1
公开(公告)日：2024-11-14
申请号：US18286486
申请日：2022-03-31
Applicant: ASML Netherlands B.V.
Inventor： Petrus Wilhelmus SMORENBURG , Stephen EDWARD , Sjoerd Nicolaas Lambertus DONDERS , Adrianus Johannes Hendrikus SCHELLEKENS , David Q'DWYER , Andrey NIKIPELOV , Gosse Charies DE VRIES
Abstract: An assembly comprises a space configured for placing a medium to receive a first radiation for generating a second radiation. In operation, the second radiation propagates coaxially with the first radiation after the medium. The assembly further comprises an optical element after the medium for transmitting or reflecting the first radiation with a surface area. The assembly is configured such that, in operation, a cleaning gas is in contact with the surface area. A reactive medium is generated from at least a part of the cleaning gas by the second radiation for removing a contamination from the surface area.
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公开(公告)号：US20230311173A1
公开(公告)日：2023-10-05
申请号：US18206887
申请日：2023-06-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey NIKIPELOV , Dmitry KURILOVICH , Fabio SBRIZZAI , Marcus Adrianus VAN DE KERKHOF , Ties Wouter VAN DER WOORD , Willem Joan VAN DER ZANDE , Jeroen VAN DUIVENBODE , David Ferdinand VLES
Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.
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公开(公告)号：US20220205900A1
公开(公告)日：2022-06-30
申请号：US17563867
申请日：2021-12-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey NIKIPELOV , Saeedeh Farokhipoor , Maarten Van Kampen
Abstract: A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+, which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.
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