公开(公告)号：US20190212655A1

公开(公告)日：2019-07-11

申请号：US16279001

申请日：2019-02-19

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Ferry ZIJP ,  Sander Bas ROOBOL

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7085

Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

公开(公告)号：US20190025706A1

公开(公告)日：2019-01-24

申请号：US16028917

申请日：2018-07-06

Applicant: ASML Netherlands B.V.

Inventor： Teis Johan COENEN ,  Sander Bas ROOBOL ,  Sipke Jacob BIJLSMA

IPC: G03F7/20 ,  G01N21/88 ,  G03F9/00 ,  G01N21/47

Abstract: In a method of determining an edge roughness parameter of a periodic structure, the periodic structure is illuminated (602) in an inspection apparatus. The illumination radiation beam may comprise radiation with a wavelength in the range 1 nm to 100 nm. A scattering signal (604) is obtained from a radiation beam scattered from the periodic structure. The scattering signal comprises a scattering intensity signal that is obtained by detecting an image of a far-field diffraction pattern in the inspection apparatus. An edge roughness parameter, such as Lined Edge Roughness and/or Line Width Roughness is determined (606) based on a distribution of the scattering intensity signal around a non-specular diffraction order. This may be done for example using a peak broadening model.

公开(公告)号：US20180267411A1

公开(公告)日：2018-09-20

申请号：US15903392

申请日：2018-02-23

Applicant: ASML Netherlands B.V.

Inventor： Sudhir SRIVASTAVA ,  Sander Bas ROOBOL ,  Simon Gijsbert Josephus MATHIJSSEN ,  Nan LIN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Krijn Frederik BUSTRAAN ,  Petrus Wilhelmus SMORENBURG ,  Gerrit Jacobus Hendrik BRUSSAARD

IPC: G03F7/20

Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.

公开(公告)号：US20180254597A1

公开(公告)日：2018-09-06

申请号：US15902454

申请日：2018-02-22

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Sander Bas ROOBOL ,  Pavel EVTUSHENKO

IPC: H01S3/0959 ,  H01S3/00 ,  G03F7/20 ,  H01L21/263 ,  H01S3/109 ,  H01J47/02 ,  H01S3/0971

CPC classification number: H01S3/0959 ,  G03F7/70033 ,  G03F7/70641 ,  G03F7/70683 ,  H01J47/026 ,  H01L21/2636 ,  H01S3/0085 ,  H01S3/0092 ,  H01S3/09716 ,  H01S3/1095 ,  H05G2/003 ,  H05G2/008

Abstract: A radiation source arrangement causes interaction between pump radiation (340) and a gaseous medium (406) to generate EUV or soft x-ray radiation by higher harmonic generation (HHG). The operating condition of the radiation source arrangement is monitored by detecting (420/430) third radiation (422) resulting from an interaction between condition sensing radiation and the medium. The condition sensing radiation (740) may be the same as the first radiation or it may be separately applied. The third radiation may be for example a portion of the condition sensing radiation that is reflected or scattered by a vacuum-gas boundary, or it may be lower harmonics of the HHG process, or fluorescence, or scattered. The sensor may include one or more image detectors so that spatial distribution of intensity and/or the angular distribution of the third radiation may be analyzed. Feedback control based on the determined operating condition stabilizes operation of the HHG source.

公开(公告)号：US20170315055A1

公开(公告)日：2017-11-02

申请号：US15494056

申请日：2017-04-21

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Simon Gijsbert Josephus MATHIJSSEN ,  Sander Bas ROOBOL ,  Nan LIN

IPC: G01N21/47 ,  G01N21/88 ,  G03F7/20

CPC classification number: G03F7/70616 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/4704 ,  G01N2021/4735 ,  G01N2021/8822 ,  G01N2021/95615 ,  G01N2201/12 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70683 ,  G03F9/7003 ,  H01L22/12

Abstract: A structure of interest (T) is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector (19, 274, 908, 1012). A processor (PU) calculates a property such as linewidth (CD) or overlay (OV), for example by simulating (S16) interaction of radiation with a structure and comparing (S17) the simulated interaction with the detected radiation. The method is modified (S14a, S15a, S19a) to take account of changes in the structure which are caused by the inspection radiation. These changes may be for example shrinkage of the material, or changes in its optical characteristics. The changes may be caused by inspection radiation in the current observation or in a previous observation.