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公开(公告)号:US11648639B2
公开(公告)日:2023-05-16
申请号:US17457423
申请日:2021-12-02
Applicant: Applied Materials, Inc.
Inventor: William Ming-ye Lu , Wendell Glenn Boyd, Jr. , Stacy Meyer
IPC: B24B37/04 , B24B37/32 , H01L21/683
CPC classification number: B24B37/044 , B24B37/32 , H01L21/6831
Abstract: Embodiments of the present invention provide a polishing ring assembly suitable for polishing an electrostatic chuck and method of using the same. In one embodiment, the polishing ring assembly has a retaining ring assembly and an electrostatic chuck fixture. The retaining ring assembly includes an inner diameter and a top surface, a plurality of outer drive rings wherein the plurality of outer drive rings are placed on the top surface of the ceramic retaining ring. The electrostatic chuck fixture includes an electrostatic chuck drive plate adjacent to the inner diameter of in the ceramic retaining ring. The electrostatic chuck drive plate has a lock to secure retaining ring assembly with the electrostatic chuck fixture without transferring the weight from one assembly over to the other through the locking mechanism.
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公开(公告)号:US11577361B2
公开(公告)日:2023-02-14
申请号:US17590764
申请日:2022-02-01
Applicant: Applied Materials, Inc.
Inventor: Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey P. Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
Abstract: A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
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公开(公告)号:US09937601B2
公开(公告)日:2018-04-10
申请号:US14927193
申请日:2015-10-29
Applicant: Applied Materials, Inc.
Inventor: Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey P. Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC: B24B37/32
CPC classification number: B24B37/32 , Y10T29/49815
Abstract: A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
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公开(公告)号:US20160136780A1
公开(公告)日:2016-05-19
申请号:US15006622
申请日:2016-01-26
Applicant: Applied Materials, Inc.
Inventor: Stacy Meyer , Young J. Paik , Christopher R. Mahon
IPC: B24B37/32
CPC classification number: B24B37/32 , Y10T29/49826
Abstract: A carrier head includes a base, a substrate mounting surface, a retaining ring secured to the base, and a plurality of stacked shims located between the base and the retaining ring. The retaining ring has a bottom surface for contacting a polishing pad during polishing.
Abstract translation: 承载头包括基座,基板安装表面,固定到基座的保持环以及位于基座和保持环之间的多个堆叠的垫片。 保持环具有用于在抛光期间接触抛光垫的底表面。
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公开(公告)号:US09227297B2
公开(公告)日:2016-01-05
申请号:US14219913
申请日:2014-03-19
Applicant: Applied Materials, Inc.
Inventor: Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Abraham Palaty , Aswathnarayanaiah Ravi , Ashish Bhatnagar , Young J. Paik , Stacy Meyer , Daniel Martin
CPC classification number: B24B37/32
Abstract: A retaining ring includes a generally annular upper portion having a top surface configured to be connected to a base of a carrier head and a lower surface, and a plurality of substantially identical arcuate segments detachably secured to the upper portion to form an annular lower portion. Each of the arcuate segments has an upper surface that abuts the lower surface of the upper portion and a bottom surface for contacting a polishing pad during polishing.
Abstract translation: 保持环包括大致环形的上部,其具有构造成连接到承载头和下表面的基部的顶表面,以及可拆卸地固定到上部以形成环形下部的多个基本相同的弧形段。 每个弧形段具有邻接上部下表面的上表面和用于在抛光过程中接触抛光垫的底表面。
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公开(公告)号:US09168631B2
公开(公告)日:2015-10-27
申请号:US13907658
申请日:2013-05-31
Applicant: Applied Materials, Inc.
Inventor: Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Aswathnarayanaiah Ravi , Abraham Palaty , Young J. Paik , Stacy Meyer , James Klingler , Ashish Bhatnagar
IPC: B24B37/32
CPC classification number: B24B37/32
Abstract: A retaining ring includes an annular lower portion and an annular upper portion. The annular lower portion has a main body with a bottom surface for contacting a polishing pad during polishing, an inner rim projecting upward from the main body, an outer rim projecting upward from the main body and separated from the inner rim by a gap, and a plurality of azimuthally separated interlock features positioned between the inner rim and the outer rim, each interlock feature projecting upwardly from the main body. The annular upper portion has a top surface and a bottom surface and a plurality of azimuthally separated recesses in the bottom surface, the recesses defining thin portions of the upper portion, the plurality of interlock features fitting into the plurality of recesses. The lower portion is a plastic and the upper portion is a material that is more rigid than the plastic.
Abstract translation: 保持环包括环形下部和环形上部。 环形下部具有主体,其具有用于在抛光期间接触抛光垫的底面,从主体向上突出的内边缘,从主体向上突出并与内边缘分开的外缘间隙, 位于内缘和外缘之间的多个方位分离的互锁特征,每个互锁特征从主体向上突出。 环形上部具有顶表面和底表面以及在底表面中的多个方位分离的凹槽,所述凹部限定上部的薄部分,多个互锁特征装配到多个凹部中。 下部是塑料,上部是比塑料更硬的材料。
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公开(公告)号:US20140273776A1
公开(公告)日:2014-09-18
申请号:US14163914
申请日:2014-01-24
Applicant: Applied Materials, Inc.
Inventor: Jamie Stuart Leighton , Stacy Meyer , Young J. Paik
IPC: B24B41/00
CPC classification number: B24B37/30 , B24B41/061
Abstract: A reinforcement ring is for placement in a carrier head to abut an inner surface of a perimeter portion of a flexible membrane. The reinforcement ring includes a substantially vertical cylindrical portion, a first flange projecting inwardly from the bottom of the cylindrical portion, and a second flange projecting outwardly from a bottom of the cylindrical portion. The second flange projects downwardly at a non-zero angle from vertical.
Abstract translation: 加强环用于放置在承载头中以邻接柔性膜的周边部分的内表面。 加强环包括基本上垂直的圆柱形部分,从圆柱形部分的底部向内突出的第一凸缘和从圆柱形部分的底部向外突出的第二凸缘。 第二凸缘与垂直方向成非零角度向下突出。
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公开(公告)号:US20140053981A1
公开(公告)日:2014-02-27
申请号:US14069207
申请日:2013-10-31
Applicant: Applied Materials, Inc.
Inventor: Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey P. Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Daniel Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC: B24B37/32
CPC classification number: B24B37/32 , Y10T29/49815
Abstract: A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
Abstract translation: 保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。 保持环的底面可以包括平坦的,倾斜的和弯曲的部分。 可以使用专用于研磨保持环底面的机器进行研磨。 在研磨期间,可以允许环围绕环的轴线自由旋转。 保持环的底面可以具有弯曲或平坦的部分。
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